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WO/2024/090384A1 |
Provided is a technology by which a chemical can be effectively fixed to the surface of a substrate. A substrate treatment device 1 comprises: an activating device 40 configured so that, in a state where a liquid is supplied to a surfa...
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WO/2024/090126A1 |
The purpose of the present invention is to effectively perform learning in order to determine a parameter value of a neural network and to improve control accuracy in the control of a control target using the neural network. This contr...
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WO/2024/090019A1 |
Provided are: a raw material supply device that can stably supply a plasma source; and a light source device. A raw material supply device according to an aspect of the present invention is a raw material supply device for supplying a ...
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WO/2024/090063A1 |
A drawing device according to one aspect of the present disclosure comprises a light source unit and a scanning unit. The scanning unit irradiates a surface of a recording medium with a plurality of laser beams generated by the light sou...
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WO/2024/090694A1 |
The present invention relates to a method for manufacturing a polymer-based microneedle patch designed to maximize skin penetration performance. The polymer-based microneedle patch of the present disclosure can be manufactured to have en...
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WO/2024/090486A1 |
The present invention provides a photosensitive resin composition which contains (A) a polyimide precursor that has a repeating structure represented by formula (1), and (B) a photoradical initiator. (In formula (1), X1 represents a tetr...
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WO/2024/090264A1 |
The present invention uses a negative-type photosensitive resin composition that includes a bisphenol novolac epoxy resin and a cationic polymerization initiator. The invention is characterized in that the weight-average molecular weight...
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WO/2024/090041A1 |
Provided are a radioactive-ray-sensitive resin composition and a pattern formation method that make it possible to form a resist film that has satisfactory storage stability, and also has excellent sensitivity and LWR performance when ne...
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WO/2024/088727A1 |
A metrology system is described. Active or passive metasurfaces are used to replace (or to augment) an existing objective lens to focus radiation such as light, tune a focal length, and/or correct aberrations in the metrology system. The...
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WO/2024/088666A1 |
Methods, computer programs, and systems are disclosed, with one method including characterizing a depth variation of a predicted result within a feature of a pattern from a lithography simulation. The method evaluates the depth variation...
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WO/2024/090327A1 |
A substrate processing device (1) comprises: a workpiece support (25) configured to be able to support a workpiece (W); and a plurality of light sources (41, 42) that transmit illuminating beams (L1, L2) that include vacuum ultraviolet r...
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WO/2024/087158A1 |
The preset invention belongs to the technical field of lithography, and particularly relates to a high-etching-resistance silicon-containing molecular glass photoresist compound, and a preparation method therefor and the use thereof. The...
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WO/2024/090442A1 |
A hydrostatic gas bearing device according to the present disclosure comprises: a movable member; and a fixed member. A recess is located on a bearing surface of a base of the movable member or the fixed member, and an opening of a gas s...
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WO/2024/087355A1 |
A quantum dot color photosensitive resin composition and a preparation method therefor. The quantum dot color photosensitive resin composition is prepared from the following raw materials in parts by weight: 1-10 parts of a quantum dot m...
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WO/2024/090510A1 |
[Problem] The present invention provides a multilayer body which is capable of efficiently forming an insulating layer that has achieved a good balance between excellent via formability and high dielectric characteristics. [Solution] D...
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WO/2024/088665A1 |
A method for training a prediction model to generate a high-resolution image representing defects on a substrate from a low-resolution image of the substrate. The method includes inputting a first image and a reference image of defects o...
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WO/2024/087679A1 |
A position measurement apparatus, a semiconductor device manufacturing device, a semiconductor device manufacturing method, and a method for measuring the reference position of a movable worktable, which relate to the technical field of ...
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WO/2024/088708A1 |
Disclosed is an illumination configuration module comprising: a polarizing and wavelength separation arrangement operable to separate input broadband illumination into at least first dispersed illumination comprising a first polarization...
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WO/2024/088663A1 |
Disclosed is metrology method comprising: obtaining metrology data relating to a measurement of at least one target, each said at least one target comprising a plurality of features; said metrology data describing a placement error of on...
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WO/2024/082896A1 |
An alkali-soluble resin, a photosensitive resin composition, and a photosensitive cured film. The alkali-soluble resin has a structure represented by general formula (1), wherein Ar1 represents a dianhydride residue; R1 represents H or a...
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WO/2024/083404A1 |
A lithographic apparatus comprising a reflector for reflecting radiation. The reflector comprises a body, a reflective surface arranged on the body, and a channel formed in the body for conveying a fluid. The lithographic apparatus compr...
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WO/2024/085389A1 |
The present invention is provided to increase reliability and a lifespan as a display having vivid colors and high resolution by implementing a colored pattern on an electrode substrate. The present invention provides a method for manufa...
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WO/2024/083437A1 |
Described herein is a method for die-to-die (D2D) image alignment using a defect map associated with an image. The method includes accessing a set of images of a substrate, which correspond to different image capture conditions. The loca...
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WO/2024/085388A1 |
The present invention relates to a display with not only vivid colors but also high resolution by implementing a colored pattern on an electrode substrate, so as to improve reliability and lifespan. The present invention relates to a met...
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WO/2024/083559A1 |
A source selection module comprising an adjustable diffraction element comprising multiple pixels. The source selection module further comprises a light dispersive element configured for receiving a first and a second light. The light di...
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WO/2024/085055A1 |
The purpose of the present invention is to, when a substrate (or substrates) is (are) disposed on a substrate holder for holding the substrate(s), detect the position(s) of the substrate(s) disposed in various forms, in which, for exampl...
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WO/2024/085292A1 |
The present invention relates to a chemically amplified positive photoresist composition for improving a pattern profile and enhancing adhesion, the photoresist composition being exposable by a light source with a wavelength of 248 nm, a...
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WO/2024/086571A1 |
Embodiments of the present disclosure generally relate to lithography systems. More particularly, embodiments of the present disclosure relate to a method, a system, and a software application for a lithography process to control transmi...
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WO/2024/085390A1 |
The purpose of the present invention is to improve the reliability and lifespan of a display having not only vivid colors but also high resolution by implementing a colored pattern on an electrode substrate. The present invention relates...
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WO/2024/084993A1 |
A radiation-sensitive composition comprising a polymer having: a side chain including an acid-dissociable group; and a side chain including one or more radiation-sensitive onium cation structures and two or more iodo groups.
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WO/2024/083470A1 |
A particle transfer system, including: a particle trap apparatus configured to trap a plurality of particles; and a particle conveyance structure configured to convey the particles in parallel from the particle trap apparatus to a substr...
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WO/2024/084040A1 |
The disclosure relates to an aqueous bioink solution for use in light-based bioprinting applications, comprising: (a) 0.5-95 wt % water-soluble prepolymer; (b) 0.001-5 wt % biocompatible metal acylphosphinate photoinitiator; (c) 0.001-10...
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WO/2024/083435A1 |
Described is a method for predicting a parameter of interest of a manufacturing process for manufacturing integrated circuits. The method comprises: obtaining metrology data relating to the parameter of interest; applying a first predict...
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WO/2024/084636A1 |
A photosensitive resin composition contains a polyamic acid ester and a polymerizable monomer, the polyamic acid ester includes a structural unit (A) derived from tetracarboxylic dianhydride and a structural unit (B) derived from a diami...
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WO/2024/085016A1 |
Provided is a substrate treatment method including a step for developing a substrate wherein a negative-type metal-containing resist film is formed and subjected to an exposure treatment and a heat-treatment after the exposure treatment,...
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WO/2024/086042A1 |
Embodiments of the present disclosure relate to a system, a software application, and methods of digital lithography for semiconductor packaging. The method includes comparing positions of vias and via locations, generating position data...
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WO/2024/085030A1 |
The purpose of the present invention is to provide: a method for producing a semiconductor substrate, the method using a composition which is capable of forming a film that has excellent bending resistance and excellent solubility during...
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WO/2024/084615A1 |
Provided is a photoresist that can form a photoresist layer having both developability and polar solvent resistance while having excellent peel removability as a positive photoresist layer. This composition for forming a photoresist comp...
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WO/2024/082657A1 |
A chip preparation method and system, and a chip, which relate to the technical field of micro-nano fabrication. The method comprises: by means of an exposure mode of laser direct writing, preparing a first bottom circuit of an impedance...
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WO/2024/084970A1 |
Provided are: an active-ray-sensitive or radiation-sensitive resin composition capable of forming a pattern having excellent resolution, LWR performance, and pattern shape; and an active-ray-sensitive or radiation-sensitive film, a patte...
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WO/2024/084796A1 |
Provided are a light source device and a raw material supply unit which can inhibit the impact of debris. This light source device uses energy beam (EB) irradiation to convert a liquid raw material (23) into plasma and extract radiatio...
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WO/2024/085293A1 |
The present invention relates to a photoresist composition that can be exposed with a light source having a wavelength of 248 nm, and to a chemically-amplified positive photoresist composition for pattern profile improvement and etch res...
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WO/2024/084965A1 |
Provided is a technique for forming a diffraction grating using a high-refractive-index material. This method for forming a diffraction grating on a substrate having permeability includes: (a) a step for forming, on the substrate, a fi...
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WO/2024/085254A1 |
The present disclosure relates to a photosensitive resin composition, a photosensitive resin multilayer body, and a method for forming a resist pattern. This photosensitive resin composition contains the following components: (A) an alka...
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WO/2024/085181A1 |
This resist composition contains a resin component (A1) having a structural unit (a0) derived from a compound represented by general formula (a0-1) (In the formula, R is a hydrogen atom, a C1-5 alkyl group, or a C1-5 alkyl halide group; ...
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WO/2024/078813A1 |
An optical arrangement for aberration correction, comprising: a beam dispersing element for spatially dispersing a broadband radiation beam in a first transverse direction; a focusing lens for focusing the broadband radiation beam subseq...
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WO/2024/078895A1 |
There is provided a mirror layer for a lithographic apparatus comprising at least one element which forms a chemical bond with silicon having a bond dissociation energy of at least 447 kJ mol-1. Also provided is a method of manufacturing...
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WO/2024/079925A1 |
The present invention relates to a resin composition comprising a maleimide resin that is compatible even when main skeletons are different from each other. The objective of the present invention is to provide: a curable resin compositio...
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WO/2024/080200A1 |
Provided are: an active-ray-sensitive or radiation-sensitive resin composition comprising a resin (A) that includes an acid-decomposable group and a phenolic hydroxyl group, a resin (B) that does not contain an acid-decomposable group, a...
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WO/2024/078792A1 |
Disclosed is a method of reading out a detection arrangement, said detection arrangement defining a detection area in terms of plurality of pixels. The method comprises receiving scattered radiation on said detection arrangement; dividin...
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