Title:
CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING PATTERN PROFILE AND ENHANCING ADHESION
Document Type and Number:
WIPO Patent Application WO/2024/085292
Kind Code:
A1
Abstract:
The present invention relates to a chemically amplified positive photoresist composition for improving a pattern profile and enhancing adhesion, the photoresist composition being exposable by a light source with a wavelength of 248 nm, and comprising, on the basis of the total amount of the composition, 1-5 wt% of a polyhydric alcohol additive represented by chemical formulas 1-8 in order to implement a vertical profile without pattern collapse.
Inventors:
CHOI YOUNG CHEOL (KR)
LEE SU JIN (KR)
LEE SEUNG HUN (KR)
LEE SEUNG HYUN (KR)
LEE SU JIN (KR)
LEE SEUNG HUN (KR)
LEE SEUNG HYUN (KR)
Application Number:
PCT/KR2022/016245
Publication Date:
April 25, 2024
Filing Date:
October 24, 2022
Export Citation:
Assignee:
YOUNG CHANG CHEMICAL CO LTD (KR)
International Classes:
G03F7/004; C08F212/14; C08F220/18; C08K5/092; G03F7/039; G03F7/20
Foreign References:
| KR20220114584A | 2022-08-17 | |||
| KR102374293B1 | 2022-03-17 | |||
| JPH0792679A | 1995-04-07 | |||
| KR101977886B1 | 2019-05-13 | |||
| KR20160088813A | 2016-07-26 |
Attorney, Agent or Firm:
HAEDAM IP GROUP (KR)
Download PDF: