Title:
RADIOACTIVE-RAY-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2024/090041
Kind Code:
A1
Abstract:
Provided are a radioactive-ray-sensitive resin composition and a pattern formation method that make it possible to form a resist film that has satisfactory storage stability, and also has excellent sensitivity and LWR performance when next-generation technology is applied. The radioactive-ray-sensitive resin composition comprises at least one onium salt having an organic acid anion moiety and an onium cation moiety, a resin containing a structural unit having an acid dissociable group, and a solvent, in which at least a part of the onium cation moiety in the onium salt is a fluorinated onium cation moiety containing a fluorine atom, and at least a part of the organic acid anion moiety in the onium salt is an organic acid anion moiety (1) represented by formula (1). (In formula (1), R1 represents an organic group having a valency of (q2+1) or, when there are a plurality of R1's, two of the R1's are bonded to each other to form a 5- to 20-membered cyclic structure in conjunction with a carbon atom bonded to them and located on a benzene ring in formula (1); R2 represents a halogen atom, a hydroxy group, an alkyl group, an alkoxy group, a cyano group, a nitro group or an amino group; q1 represents an integer of 1 to 4; when q1 is 2 or more, a plurality of R1's are the same as or different from each other; when q1 is 1, q2 represents an integer of 1 to 4; when q1 is 2 or more, a plurality of q2's each independently represent an integer of 0 to 4, in which at least one of q2's is 1 or more; q3 represents an integer of 0 to 3; when q3 is 2 or more, a plurality of R2's are same as or different from each other; and q1 and q3 satisfy the formula q1+q3 ≤ 4.)
Inventors:
SHIRATANI MOTOHIRO (JP)
HACHIYA ASUKA (JP)
HACHIYA ASUKA (JP)
Application Number:
PCT/JP2023/032340
Publication Date:
May 02, 2024
Filing Date:
September 05, 2023
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
G03F7/004; C07C65/105; C07C65/24; C07C65/28; C07C233/87; C07C381/12; C09K3/00; G03F7/039; G03F7/20
Foreign References:
| JP2022115072A | 2022-08-08 | |||
| JP2022025610A | 2022-02-10 |
Attorney, Agent or Firm:
UNIUS PATENT ATTORNEYS OFFICE (JP)
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