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WO/2024/002578A1 |
Disclosed herein is a method of forming a pattern of 2D material on a surface (401), the method comprising: depositing a precursor material (402a) on a surface, wherein the precursor material comprises one or more constituents for formin...
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WO/2024/000641A1 |
The present disclosure relates to the technical field of semiconductor photolithography, and provides a control method and apparatus for a beam energy adjusting device, a medium, and a wafer processing device. The beam energy adjusting d...
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WO/2024/004381A1 |
The present invention provides a debris reduction device that enables the enhancement of debris capturing probability, and a light source device provided with the debris reduction device. The debris reduction device according to an emb...
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WO/2024/004462A1 |
A negative photosensitive resin composition comprising: a polymer (A); a crosslinking agent (B); and a photo-cation generator (C), wherein the polymer (A) has a structural unit represented by formula (a2) and has, at a terminal, a reacti...
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WO/2024/004790A1 |
The present invention provides an active-ray-sensitive or radiation-sensitive resin composition containing: a resin (A) having a repeating unit (i) represented by a specific general formula (1) and a repeating unit (ii) represented by a ...
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WO/2024/002688A1 |
A method for operating a multichannel acousto-optical modulator comprises obtaining (S20) of print data for a multitude of channels of the multichannel acousto-optical modulator. Radio-frequency signals for each of the multitude of chann...
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WO/2024/005021A1 |
The present invention addresses the problem of providing: a composition capable of forming a film which exhibits excellent thermal cycle properties; a transfer film; a method for producing a laminate; a laminate; and a method for produci...
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WO/2024/004461A1 |
Provided is a method for producing a ceramic green sheet with a conductive pattern, the ceramic green sheet having a highly fine conductive pattern and the occurrence of disconnection therein being suppressed. This method for producing a...
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WO/2024/004318A1 |
The purpose of the present invention is to provide a method for manufacturing a substrate with a wiring electrode, wherein an opaque wiring electrode pattern is not easily visible, and processability is excellent. The present invention r...
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WO/2024/000636A1 |
A measurement pattern and a preparation method therefor, a measurement method and apparatus, and a device and a medium. The measurement pattern comprises a body layer, which comprises an array region (202), which is located in the middle...
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WO/2024/003429A1 |
The invention relates to a hydrolysable crosslinker of formula I, to resins obtained using this type of crosslinker, to polymerised products derived from these materials and to the use thereof in industry; for example in additive manufac...
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WO/2024/004430A1 |
Provided are: a transfer film including a temporary support and a transfer layer disposed on the temporary support, the temporary support having a thermal deformation rate of 1.0% or less; and a use for said transfer film.
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WO/2024/000708A1 |
A workpiece batch exposure method and device (1). The method and device (1) are applicable to workpieces (2), the surface of which has no positioning mark. In the provided workpiece batch exposure method and device (1), a fixed camera gr...
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WO/2024/004732A1 |
This photosensitive composition comprises a coloring material, a polymerizable compound, and a photopolymerization initiator. The amount of coloring material contained in the total solid content of the photosensitive composition is 40% b...
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WO/2024/004619A1 |
An embodiment of the present invention provides: a curable composition containing a radical polymerization initiator represented by formula (1) and a radically polymerizable compound; a method for producing a cured product; a film; an op...
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WO/2024/004802A1 |
The present invention provides: an active-ray-sensitive or radiation-sensitive resin composition comprising (A) a resin which contains a repeating unit (a) represented by a specific general formula (a) and having a group capable of being...
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WO/2024/002277A1 |
The embodiments of the present application provide an anti-reflective coating material, an integrated circuit and a preparation method therefor, and an electric device. The anti-reflective coating material comprises: a polyhydroxystyrene...
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WO/2024/005194A1 |
A film-forming composition for lithography which contains a polyphenol compound represented by formula (1). (In formula (1), A, Ar1, Ar2, X, P1, P2, j, k, l1, and l2 are as defined in the specification.)
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WO/2024/004598A1 |
Provided are: an active ray-sensitive or radiation-sensitive resin composition containing a resin (A) comprising repeating units (i) represented by a specific general formula, repeating units (ii) that have a cyano group and a lactone st...
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WO/2024/000740A1 |
A photoresist cleaning solution, as well as a preparation method therefor and a cleaning method thereof in the technical field of photoresist cleaning. The photoresist cleaning solution comprises: a cleaning agent, a metal corrosion inhi...
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WO/2024/002546A1 |
Disclosed is a wedge arrangement comprising a plurality of wedge elements, arranged around an optical axis, the plurality of wedge elements comprising at least a first wedge element, a second wedge element and a third wedge element; wher...
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WO/2024/004426A1 |
A curable composition containing a radical polymerization initiator represented by formula (1) and a radically polymerizable compound; a method for producing a cured product of the curable composition; a method for producing a cured prod...
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WO/2024/000635A1 |
A semiconductor measurement accuracy monitoring method and apparatus, and a device and a medium. A measurement pattern comprises a target layer, and a first measurement mark pattern (11), a second measurement mark pattern (21), a plurali...
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WO/2024/004412A1 |
The purpose of the present invention is to provide a development brush, a development device, a flexographic printing plate production method and a light-sensitive resin flexographic printing original plate development method with which ...
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WO/2024/006938A1 |
Provided are processes for development of photopatterned metal or metal oxide-based thin film photoresists post-EUV exposure for removal of non-volatile species and deterring etch stop. Repeated cycles of alternating treatment with an et...
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WO/2024/003608A1 |
Positioning apparatus by determining multiple candidate paths for positioning the apparatus at multiple locations, where the positioning requires moving the apparatus in a sequence of movements along multiple axes, selecting a shortest o...
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WO/2023/249309A1 |
The present invention relates to an electrical potential barrier module having a heat transfer prevention function and a lithography device comprising same, and specifically relates to an electrical potential barrier module capable of pe...
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WO/2023/246811A1 |
The present application provides a negative photosensitive resin composition, a cured film and a preparation method therefor, an EL element, and a display apparatus. The negative photosensitive resin composition comprises (A) an alkali-s...
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WO/2023/249308A1 |
The present invention relates to an electrical potential barrier module and a lithography apparatus comprising same, and, specifically, to an electrical potential barrier module and a lithography apparatus comprising same, the module ena...
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WO/2023/248976A1 |
The present invention provides: a polymer that has excellent storage stability and can yield a cured product having excellent solvent resistance even under low-temperature curing conditions; a photosensitive resin composition that contai...
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WO/2023/245624A1 |
Disclosed in the present invention is a silver nanowire photoresist, comprising a silver nanowire and a dispersion resin. The dispersion resin is represented by formula (1): (Z-A)n-Rm(1); in the formula (1), n=1-5, m=1-5, and n+m≤6; Z ...
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WO/2023/246243A1 |
An ultraviolet photoresist, and an ultraviolet photoresist patterning method and use. The ultraviolet photoresist comprises an organic solvent, a photosensitizer, and a zirconia nanocluster. The chemical formula of the zirconia nanoclust...
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WO/2023/247125A1 |
A method of determining a physical quantity is disclosed. The method uses a sensor system configured to sample a plurality of positions in parallel, wherein sampling each position uses radiation incident on an object plane patterning dev...
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WO/2023/248569A1 |
Provided is a radiation-sensitive resin composition comprising: a polymer which has a first structural unit represented by formula (1) and of which the solubility in a developing solution is changed by the action of an acid; a radiation-...
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WO/2023/247238A1 |
An imaging EUV optical unit (10) serves for imaging an object field (5) into an image field (11). The optical unit has a plurality of mirrors (M1 to M6) for guiding EUV imaging light (16) at a wavelength shorter than 30 nm along an imagi...
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WO/2023/245625A1 |
The present invention provides a dispersion resin, a method for preparing same, and a low-temperature-cured photoresist composition. The dispersion resin is represented by formula (2): (Z-A)n-Rm(2), n = 1-5, m = 1-5, and n + m ≤ 6; Z r...
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WO/2023/248878A1 |
The present invention addresses the problem of providing: a pattern forming method with which it is possible to form a pattern that has excellent limiting resolution; and a method for producing an electronic device. A pattern forming met...
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WO/2023/248887A1 |
The purpose of the present invention is to provide a highly sensitive positive type photosensitive resin composition that exhibits less amount of film reduction during alkaline developing, and that can shorten the exposure time. A positi...
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WO/2023/246549A1 |
Provided in the present invention are a cationic photocurable composition and the use thereof. The composition comprises, in parts by weight: 10-30 parts of a first cationic polymerizable compound, 10-65 parts of a second cationic polyme...
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WO/2023/246762A1 |
Embodiments of the present application provide a photosensitive resin composition, comprising a resin, a cross-linking agent, an initiator, and an epoxy compound containing a benzocyclobutene structure. According to the photosensitive re...
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WO/2023/247170A1 |
An imaging EUV optical unit (24) serves for imaging an object field (5) into an image field (11). The EUV optical unit (24) has a plurality of mirrors (M1 to M4) for guiding EUV imaging light (16) at a wavelength of shorter than 30 nm al...
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WO/2023/247496A1 |
The invention relates to a device (100) for treating the surface (102) of an optical element (101) of a lithography system (1), in particular an EUV lithography system, in an atomic layer treatment process, comprising: a sample holder (1...
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WO/2023/249070A1 |
This photosensitive resin composition contains (a) an alkali-soluble resin, (b) a photoinitiator, and (c) an ethylenically unsaturated compound, and is characterized in that the mass ratio ((a) alkali-soluble resin / (c) ethylenically un...
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WO/2023/249606A1 |
The problem of stitching together multiple exposure regions in a maskless photolithography system is addressed by systems and methods that utilize high-speed data paths between critical maskless photolithography components and a master c...
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WO/2023/248933A1 |
The present invention addresses a first problem of providing a pattern forming method that makes it possible to form a pattern having excellent in resolution. Moreover, the present invention addresses a first problem of providing a metho...
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WO/2023/249045A1 |
Provided are: a photosensitive composition for an organic EL display device, the photosensitive composition being excellent in preservation stability as a photosensitive composition, being excellent in curing properties at low temperatur...
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WO/2023/243586A1 |
This electronic device manufacturing method includes: a layering step in which a resist film and a topcoat film are provided in this order on a substrate to obtain a layered body; an exposure step in which the result is irradiated with a...
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WO/2023/245047A1 |
The present disclosure relates to precursor compositions for forming irradiation sensitive films. In particular, the disclosure is directed to use of metal-containing precursors having haloaliphatic or unsaturated substituents, or other ...
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WO/2023/242060A1 |
The invention relates to: a method for heating an optical element in an optical system, in particular in a microlithographic projection exposure system; and an optical system. In a method according to the invention, a heating power is in...
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WO/2023/243184A1 |
Provided is a cooling device for cooling an object to be cooled, the cooling device being characterized by having a circulation system for circulating a refrigerant for cooling the object to be cooled, wherein: the circulation system is ...
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