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WO/2024/029204A1 |
The present invention addresses the problem of providing a colored curable resin composition comprising a resin, which has excellent adhesiveness or is useful for increasing the amount of colorant.　The present invention relates to a co...
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WO/2024/030478A1 |
Apparatus for and methods of rapidly achieving a target peak wavelength separation in a system for producing laser radiation at more than one wavelength (color) in which one or more actuators control wavelength in response to being suppl...
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WO/2024/030211A1 |
Embodiments of methods are provided to form an EUV-active photoresist film for use in EUV photolithographic processes. The methods disclosed herein may generally include forming an extreme ultraviolet (EUV)-active photoresist film on a s...
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WO/2024/028046A1 |
A sensor module is disclosed for a metrology apparatus. The sensor module comprises an illumination device for illuminating a structure on a substrate, said illumination device comprising at least a first set of illuminators and a second...
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WO/2024/030271A1 |
Systems and methods for generating volumetric data are disclosed. Such systems and methods may include scanning a sample at a plurality of focal planes located along a depth direction of the sample. Such systems and methods may include g...
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WO/2024/029292A1 |
The purpose of the present invention is to provide a method for manufacturing a semiconductor substrate using a composition capable of forming a film having excellent etching resistance; and to provide said composition. The composition a...
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WO/2024/028147A1 |
Disclosed herein is a shielding system for use in a surface treatment process, comprising a first disk and a second disk. The first disk and second disk being arranged substantially parallel to each other. The first disk comprises a slit...
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WO/2024/029445A1 |
Provided is a resist underlayer film forming composition that satisfies not only characteristics such as etching resistance and heat resistance but also satisfies various other characteristics such as curability, amount of generated subl...
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WO/2024/026952A1 |
A motion table acceleration safety protection method, and an apparatus. The method comprises: acquiring vertical acceleration data and height data of a motion table (S102); according to the vertical acceleration data and the height data,...
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WO/2024/029384A1 |
[Problem] To provide a biaxially aligned polyester film for a dry film resist support body, the biaxially aligned polyester film having: excellent processing suitability when subjected to a high-temperature laminating process with respec...
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WO/2024/029475A1 |
Provided is a wavelength conversion film forming composition that has excellent curability in air and that provides a wavelength conversion film having good light resistance. The wavelength conversion film forming composition contains (A...
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WO/2024/030275A1 |
A method for processing a substrate includes forming a metal oxide resist over the substrate, exposing the metal oxide resist to an extreme ultraviolet light pattern, and flowing a selective gas over the metal oxide resist. The selective...
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WO/2024/027999A1 |
A reflective member for use in an EUV lithographic apparatus, the reflective member comprising a multilayer stack which comprises a plurality of layers arranged in pairs, wherein: each pair comprises a first layer and a second layer; the...
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WO/2024/029548A1 |
Provided is a resist underlayer film formation composition comprising: a solvent; and a polymer (A) having, in a sidechain, one or more polymerizable multiple bonds selected from the group consisting of carbon-carbon double bonds, carbon...
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WO/2024/028327A1 |
A method of determining contamination of an optical sensor in a lithographic apparatus, the method comprising illuminating a pattern on a patterning device using EUV radiation, projecting patterned reflected EUV radiation towards the opt...
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WO/2024/027782A1 |
The present invention relates to a photolithography method and a photolithography system. The method comprises the following steps: (1) forming a negative photoresist layer on a substrate material by means of using a negative photoresist...
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WO/2024/022673A1 |
Disclosed is a method of determining an orthonormalized structure of interest reference image, the orthonormalized structure of interest reference image for applying to a measured image of the structure of interest to correct for the eff...
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WO/2024/024801A1 |
This radiation-sensitive composition comprises a polymer having an acid-dissociable group and a compound represented by formula (1). L1 represents a group having a (thio)acetal ring or the like. W1 represents a single bond or a (b+1)-val...
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WO/2024/023010A1 |
An optical system (100) for a lithography machine (1), comprising a circuit board (200) that is made of a composite material (210), wherein a vacuum-tight housing (220) is formed by the composite material (210) in an interior of the circ...
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WO/2024/025517A1 |
A method for detecting particles in a gas of a process environment present in a process chamber, the method comprising the steps of : guiding the gas with the particles into an ionization and charging unit (11) being in fluid communicati...
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WO/2024/024501A1 |
[Problem] The purpose of the present invention is to provide a positive photosensitive resin composition capable of forming a cured film which is used for liquid-crystal display elements, organic EL display elements, and the like and has...
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WO/2024/022796A1 |
Degradation of the reflectivity of one or more reflective optical elements in a system for generating EUV radiation is reduced by the introduction of a small amount of a first gas into a vacuum chamber containing the optical element, wit...
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WO/2024/024612A1 |
The present invention addresses the problem of providing an original plate for a flexographic printing plate that, when made into a flexographic printing plate, achieves good reproducibility of microcells and good durability of independe...
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WO/2024/024703A1 |
The present invention relates to a resist composition that generates an acid by exposure to light, and that exhibits a change in solubility to a liquid developer through the action of the acid. The resist composition contains a base mate...
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WO/2024/024820A1 |
The present invention addresses the problem of providing a photosensitive composition having excellent photolithographic properties and a small linear expansion coefficient in an obtained cured film. The photosensitive composition accord...
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WO/2024/022835A1 |
The invention relates to a method for inspecting a component (2), in particular a component (2) of a lithography system, wherein - at least one inspection area (6) of the component (2) is illuminated with a search beam (5) in a darkroom ...
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WO/2024/022839A1 |
An inspection system includes a radiation source, first and second optical structures, and a detection system. The radiation source generates beams of radiation. An image formed by the beams includes radiation spots corresponding to the ...
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WO/2024/022843A1 |
A method of training a generator model comprising: using the generator model to generate the predictive data based on the first measured data, wherein the first measured data and the predictive data can be used to form images of the samp...
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WO/2024/024195A1 |
Provided are a photosensitive resin composition and a photosensitive coloring composition which exhibit excellent developability and favorable low-temperature curability, and which can be used to form a cured resin film having sufficient...
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WO/2024/024691A1 |
This actinic ray-sensitive or radiation-sensitive resin composition comprises a resin (A) having a group that is decomposed by action of an acid to have an increased polarity, and a salt (B). The resin (A) includes a repeating unit havin...
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WO/2024/022854A1 |
Described herein are methods and systems for training a prediction model to predict a mask image in which mask rule check (MRC) violations or process violations (e.g., edge placement error, sub-resolution assist feature (SRAF) printing) ...
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WO/2024/024864A1 |
Provided are a photosensitive transfer material, a method for manufacturing the same, a method for manufacturing a resin pattern using the photosensitive transfer material, and a method for manufacturing circuit wiring, the photosensitiv...
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WO/2024/024657A1 |
A first problem addressed by the present invention is to provide a curable composition with which a cured film that is obtained by curing same exhibits excellent adhesiveness and exhibits excellent low-reflectivity with respect to infrar...
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WO/2024/025411A1 |
According to the disclosure, a positioning system for positioning an object within an XYZ-system of coordinates is proposed, with the positioning system comprising a supporting structure, an object table for supporting the object and a p...
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WO/2024/024833A1 |
Provided are: a resin composition containing a cyclized resin precursor and a compound B in which the thermal decomposition start temperature at which an amine is generated is equal to or less than 200°C, as measured by means of the sim...
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WO/2024/022773A1 |
A method of determining contamination of an optical sensor of a sensing system in a lithographic apparatus, the method comprising directing EUV radiation through an opening in a reticle masking blade (26) and onto a patterning device, pr...
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WO/2024/024692A1 |
Provided are a resist film, a pattern formation method, an electronic device manufacturing method that includes the pattern formation method, and an active light-sensitive or radiation-sensitive resin composition satisfying the following...
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WO/2024/024484A1 |
This resist pattern inspection method comprises an appearance inspection step for inspecting the appearance of a resist pattern on the basis of light emitted from a substrate whereon the resist pattern is formed. This resist pattern manu...
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WO/2024/021979A1 |
The present application provides an oxime ester photoinitiator, and a preparation method therefor and the use thereof. The oxime ester photoinitiator has a structure as shown in general formula (I), wherein R1 and R2 are each independent...
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WO/2024/025773A1 |
Methods of depositing a conformal carbon-containing film on an EUV photoresist to reduce line edge roughness (LER) are described. Exemplary processing methods may include flowing a first precursor over a patterned EUV surface to form a f...
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WO/2024/024502A1 |
[Problem] The purpose of the present invention is to provide a positive-type photosensitive resin composition that is for use in liquid-crystal display elements, organic EL display elements, and the like, that provides high water repelle...
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WO/2024/022586A1 |
The present invention relates to, a curable photochromic composition that includes: (a) a photochromic compound; (b) a hydrazide functional material having at least two hydrazide groups that are reactive with carbonyl groups selected fro...
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WO/2024/024373A1 |
Provided is a method for processing a substrate. The method for processing a substrate includes (a) a step in which a substrate is provided on a substrate support in a processing chamber, the substrate having a base film and a resist fil...
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WO/2024/024494A1 |
The present invention provides a photosensitive composition that suppresses development residue and makes it possible to form a cured film that has excellent substrate adhesion. This photosensitive composition includes a resin, a coloran...
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WO/2024/024441A1 |
Provided is a silicone-containing copolymer that can reduce environmental load, and that provides an effect of suppressing generation of foreign matter attributed to sublimation of pigments on the surface of a coating film. Specifically,...
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WO/2024/024783A1 |
A first problem addressed by the present invention is to provide a transfer film in which step coverage is excellent when adhered to an adherend after storage, the peeling properties of a temporary carrier are excellent, and the linear e...
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WO/2024/023885A1 |
An exposure apparatus according to the present invention causes reflection light from a selected on-state micromirror in a spatial light modulation element to enter a projection unit and projects and exposes a pattern corresponding to dr...
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WO/2024/022899A1 |
A facet mirror assembly (20) has a carrier body (39) for a plurality of individual mirrors (28i). Reflection surfaces of the individual mirrors (28i) are individually tiltable, by means of assigned tilt actuators, about at least one tilt...
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WO/2024/024844A1 |
The present invention provides: a method for producing an active ray-sensitive or radiation-sensitive resin composition, the method comprising a step (X) for mixing a specified onium salt compound (1) with a specified salt compound (2) i...
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WO/2024/024842A1 |
Provided is a laminate manufacturing method that is able to efficiently manufacture a laminate which includes a plurality of light-emitting elements and in which the leakage of light from adjacent light-emitting elements is suppressed.ã€...
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