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WO/2024/058135A1 |
Provided is a technology for reducing residue in developed patterns. Provided is a substrate processing method. This method comprises: (a) a step for providing a substrate having a base film and a metal-containing resist film formed on...
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WO/2024/056296A1 |
Disclosed is a dark-field metrology method. A first partial electric field is determined from a measurement parameter of first diffracted radiation data relating to a first portion of a diffraction order and a second partial electric fie...
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WO/2024/058243A1 |
The present invention provides a manufacturing method for a conductive film having high accuracy in detecting a defect. The manufacturing method includes an examination step for irradiating a conductive film with a laser beam to examine ...
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WO/2024/057701A1 |
This radiation-sensitive composition comprises a polymer having an acid-dissociable group and a compound represented by formula (1). In formula (1), R5 is a group obtained by removing (m+n+2) hydrogen atoms from a monocyclic or condensed...
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WO/2024/058000A1 |
Provided is a photosensitive composition comprising an infrared absorbent, a polymerizable compound, a photopolymerization initiator, and a solvent, wherein the infrared absorbent comprises a compound represented by formula (SQ-1). Provi...
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WO/2024/056501A1 |
The invention relates to a method (10) for processing a reference element (14) for an interferometer configured to measure a surface shape of a test object, wherein the reference element (14) is transmissive in relation to a measurement ...
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WO/2024/057751A1 |
Provided are: a radioactive-ray-sensitive resin composition that can exhibit sufficient levels of sensitivity and CDU performance when a next-generation technology is applied to the composition; and a pattern formation method. The radioa...
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WO/2024/056552A1 |
A patterning device voltage biasing system for use in a lithographic apparatus, the patterning device voltage biasing system comprising: a patterning device configured to impart a pattern to a beam of radiation, the patterning device com...
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WO/2024/058334A1 |
The present disclosure relates to a photosensitive resin composition, a photosensitive resin film manufactured using same, and a color filter. Specifically, provided in one implementation is a photosensitive resin composition comprising:...
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WO/2024/057622A1 |
The present invention relates to an optical device that shifts the path of light, and an exposure device and exposure method that use said optical device. The purpose of the present invention is to adjust the shift amount while minimizin...
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WO/2024/058075A1 |
The present invention employs a resist composition that contains: a base material component, the solubility of which in a developer solution is changed by the action of an acid; and a compound which is represented by general formula (d0)...
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WO/2024/053689A1 |
The present invention can provide: a resist composition which can form a resist pattern having both of improved sensitivity and lithographic properties; and a resist pattern formation method. The present invention relates to a resist com...
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WO/2024/053722A1 |
One embodiment of the present invention relates to a polymer, a composition, a cured product, or a display element. The composition comprises a polymer having a structural unit represented by formula (1). [In formula (1), A is a divalent...
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WO/2024/052300A1 |
The invention relates to an illumination system (30) for a lithography system, in particular for a projection exposure apparatus (100, 200), for illuminating a reticle (106, 203) of the lithography system with a used radiation (2) from a...
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WO/2024/053564A1 |
This photosensitive resin composition contains a polyimide (A) having an imide ring structure in the molecule, and a photosensitizer (B), and the water content measured by the Karl Fischer method is 0.30-10 mass% inclusive.
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WO/2024/052172A1 |
The invention relates to a micromirror array (10) having a number of individual mirror elements (12) which are actuatable independently of one another, which are arranged as a field and which are each movable by way of an actuator system...
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WO/2024/052057A1 |
Disclosed is a method for monitoring proper functioning of one or more components of a lithography system. The method comprises determining a frequency response function for each of said one or more components during production activity ...
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WO/2024/052041A1 |
A method of providing an additional EUV radiation exposure of part of a die on a substrate at a level of EUV radiation power which compensates for a previous low exposure, the method using EUV radiation power incident upon a patterning d...
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WO/2024/053718A1 |
The present invention employs a resist composition that contains a resin component having a constituent unit represented by general formula (a0-1). In formula (a0-1), R01 is a divalent linking group or a single bond. R02 is an acid-disso...
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WO/2024/052059A1 |
The invention relates to a fiber strand (60) for a sector heater (50) of a projection device (20) for microlithography, and also to a sector heater (50), an arrangement (60) and a projection device (20), each for or comprising such a fib...
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WO/2024/053655A1 |
A photosensitive resin composition comprising: at least one resin A selected from the group consisting of polyimides and polyimide precursors; a photosensitizer B; and a solvent C, wherein the water content is 0.01-5.0% by mass based on ...
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WO/2024/052031A1 |
A method of determining a parameter of interest of a structure comprising at least one first feature oriented along a first axis of a structure coordinate system and at least one second feature oriented along a second axis of the structu...
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WO/2024/052084A1 |
The invention relates to an arrangement (100) for calibrating a mirror array (30) having a plurality of mirror elements (34). The arrangement (100) comprises a detection light device (40) and a detection device (60). The detection light ...
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WO/2024/053194A1 |
This light irradiation device, which combines laser light beams generated using a plurality of light sources into a single beam, suppresses the dissipation of light emitted from a plurality of laser light sources without increasing the l...
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WO/2024/053609A1 |
The purpose of the present invention is to provide: an alkali-soluble resin able to yield a cured product having a high refractive index; a photosensitive resin composition; and a cured product. The present invention is an alkali-soluble...
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WO/2024/054050A1 |
The present invention provides a quality control slide of a cell counting device, comprising: a base layer which is capable of transmitting light therethrough; a thin film layer which is formed on top of the base layer; a fluorescent lay...
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WO/2024/054311A1 |
Various embodiments of methods are provided for forming a moisture barrier layer on an EUV-active photoresist film before patterning the EUV-active photoresist film with EUV lithography. According to one embodiment, the methods disclosed...
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WO/2024/054537A1 |
A method and apparatus for performing post-exposure bake operations is described herein. After exposure of photoresist on a substrate, the substrate is heated during a baking process to facilitate protection of the resist. The baking pro...
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WO/2024/052033A1 |
The disclosure relates to a method for preparing an object having a curved surface to be etched, the resulting etched surface being useable as a mold for manufacturing an optical article. The method comprises illuminating the curved surf...
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WO/2024/053579A1 |
The present invention provides: a photosensitive resin composition which is capable of forming a resin film that has excellent photolithographic characteristics and excellent chemical resistance; a cured product of this photosensitive re...
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WO/2024/052012A1 |
Disclosed is a method of determining at least one parameter of interest relating to a structure formed in at least one respective layer on a substrate, the method comprising: obtaining a measured metrology data relating to a measurement ...
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WO/2024/053470A1 |
This coloring composition comprises a coloring agent including a pigment, a polymerizable compound, a photopolymerization initiator, and a compound represented by formula (1), wherein the photopolymerization initiator includes an oxime c...
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WO/2024/052061A1 |
A method can include directing radiation toward at least two targets using an optical scanning system so as to generate first and second portions of scattered radiation. A first target can include a plurality of first grating line struct...
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WO/2024/052260A1 |
The invention relates to a heating assembly as well as an optical system and a method for heating an optical element in an optical system, in particular in a microlithographic projection exposure system. The heating assembly according to...
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WO/2024/052081A1 |
The invention relates to a method for calibrating a mirror array (100) having a plurality of mirror elements (20). For each of the plurality of mirror elements (20), a displacement device (40) for tilting the mirror element (20), at leas...
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WO/2024/048282A1 |
The present invention pertains to: active-ray-sensitive or radiation-sensitive resin composition that contains a compound represented by formula (Z-1) set forth in the description and a resin in which the polarity increases when being br...
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WO/2024/048625A1 |
Provided is a method for treating an aqueous developer waste liquid that is generated due to development of a flexographic printing original plate using an aqueous developer liquid, the method including: a first filtration step in which ...
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WO/2024/048387A1 |
The purpose of the present invention is to provide a reflection-type mask blank that prevents electrostatic damage from occurring, while suppressing CD changes during a dry etching process. A reflection-type mask blank 100 comprises a ...
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WO/2024/048296A1 |
The present invention addresses the problem of providing a photosensitive composition wherein photolithography properties are excellent and a cured film obtained therefrom has a low coefficient of linear expansion, as well as a transfer ...
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WO/2024/048892A1 |
Provided are a compound represented by chemical formula 1, a photosensitive resin composition including the compound, and a color filter manufactured using the photosensitive resin composition. An embodiment provides a compound represent...
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WO/2024/048451A1 |
An objective of the present invention is to provide an on-press development type planographic printing plate precursor which suppresses color development failure after time has elapsed, and which has excellent visibility. Another objecti...
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WO/2024/048397A1 |
Provided are: an actinic-ray-sensitive or radiation-sensitive resin composition having excellent resolution, LWR performance, and PED stability; an actinic-ray-sensitive or radiation-sensitive film that uses the actinic-ray-sensitive or ...
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WO/2024/048893A1 |
The present invention relates to a photosensitive resin composition, a photosensitive resin layer manufactured using same, and a color filter. Specifically, one embodiment provides a photosensitive resin composition comprising: (A) a bin...
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WO/2024/046107A1 |
The present invention relates to Zn-based organically-coordinated nanoparticles, a photoresist composition, a preparation method therefor, and the use thereof. The nanoparticles have a metal-organic one-dimensional repeatedly-arranged ch...
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WO/2024/048281A1 |
The present invention provides: an active-ray-sensitive or radiation-sensitive resin composition comprising a resin (A), which includes a repeating unit represented by formula (1) and a main chain of which is decomposed by irradiation wi...
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WO/2024/047871A1 |
A narrow-band laser apparatus according to the present invention comprises: a laser resonator that includes an output coupling mirror and a narrow-band module, the narrow-band module including a prism and a grating, a reflecting surface ...
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WO/2024/045525A1 |
The present invention relates to the technical field of nanomaterials and optical etching, and provides a photoresist-free optical patterning method for colloidal nanocrystals in a green solvent. A photosensitive ligand structurally simi...
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WO/2024/048464A1 |
Provided are: an actinic ray-sensitive or radiation-sensitive resin composition; and an actinic ray-sensitive or radiation-sensitive film, a pattern formation method, and an electronic device manufacturing method which use said actinic r...
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WO/2024/048463A1 |
This actinic ray-sensitive or radiation-sensitive resin composition comprises a resin which includes a repeating unit represented by specific general formula (1) and a repeating unit represented by specific general formula (2), and in wh...
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WO/2024/048487A1 |
A composition for forming a gap-filling material, the composition comprising: a compound and/or a polymer each having a structure represented by formula (1) and a carbonyl bond; and a solvent. (In formula (1), R1 and R2 each independentl...
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