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WO/2024/017807A1 |
Systems, methods, and computer software are disclosed for optimizing a metrology mark. One method includes simulating an etch process based on one or more of a pattern density, a microloading effect induced intra-mark variation, or a sen...
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WO/2024/019937A1 |
Disclosed is an apparatus for and method of permitting automatic alignment of optical components in the beam path of a laser. Images of the beam are obtained at one or more positions in the beam path. Alignment and possibly other informa...
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WO/2024/012128A1 |
A mask assembly (10), a photolithographic device, and a photolithographic method. By means of a double exposure process, a process window is improved. The mask assembly (10) comprises a first mask (11) and a second mask (12). The first m...
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WO/2024/014462A1 |
This resist composition comprises a resin component (A1) that exhibits change in solubility in a developing solution due to the action of an acid. The resin component (A1) has a constitution unit (a0) derived from a compound represented ...
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WO/2024/015168A1 |
Embodiments disclosed herein include a method of patterning a metal oxo photoresist. In an embodiment, the method comprises depositing the metal oxo photoresist on a substrate, treating the metal oxo photoresist with a first treatment, e...
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WO/2024/012772A1 |
Disclosed is a substrate comprising at least one target. The target comprises a plurality of sub-targets, the plurality of sub-targets comprising at least a first sub-target and second sub-target, each of the plurality of sub-targets com...
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WO/2024/012768A1 |
A substrate holding system for supporting a substrate, the substrate holding system comprising a substrate holder and an evacuation conduit, wherein: the substrate holder comprises: a main body having a surface; a plurality of burls proj...
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WO/2024/013161A1 |
A method is proposed of using low-resolution images of at least one product produced by one or more imaging processes, and imaging models characterizing the imaging processes, to determine values for plurality of numerical parameters whi...
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WO/2024/013038A1 |
A method for stochastic-aware source mask optimization is described. A probability distribution for edge placement which accounts for stochasticity is determined. Based on the probability distribution, the source configuration, mask conf...
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WO/2024/014689A1 |
Provided is a photosensitive resin composition, of which both flexibility and sensitivity performance are improved. In general formulas 1 and 2 according to the present invention, at least one of R1 and R2 includes a molecular structure ...
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WO/2024/015173A1 |
Embodiments disclosed herein include a method of optimizing a post deposition bake of a photoresist layer. In an embodiment, the method comprises depositing the photoresist layer on a substrate, baking the photoresist layer, and measurin...
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WO/2024/014330A1 |
According to the present invention, it is possible to provide a resist auxiliary film composition containing a resin (A) and a solvent (B), the solvent (B) including a compound (B1) represented by general formula (b-1) below, wherein the...
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WO/2024/014331A1 |
The present invention provides a thinner composition containing a solvent (B) that includes a compound (B1) represented by general formula (b-1) below. (In formula (b-1) above, R0 is an alkyl group having 1-10 carbon atoms, an aryl group...
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WO/2024/014346A1 |
A substrate processing device that processes a substrate, comprising: a retaining/rotating part that retains and rotates the substrate; a supply unit including at least one gas nozzle that supplies an inert gas to the substrate after a d...
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WO/2024/013190A1 |
An apparatus (100) for providing sensor data from a number N, with N ≥ 1, of sensors (301-30N) of an optical system (4, 10) of a lithography apparatus (1), comprising an analogue-to-digital converter (500), which is configured to conve...
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WO/2024/012965A1 |
Disclosed herein is a system, comprising: a charged-particle beam inspection apparatus configured to scan a sample that comprises a target with a plurality of pattern layers; and a controller including circuitry, configured to: obtain de...
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WO/2024/013177A1 |
The invention relates to a projection exposure apparatus (1, 101) having a heating device (40) for heating at least one element (Mx, 117) of the projection exposure ap- paratus (1, 101) by means of electromagnetic radiation, the heating ...
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WO/2024/014329A1 |
The present invention provides a resist composition which contains a resin (A) and a solvent (B) containing a compound (B1) represented by general formula (b-1), and which contains an active ingredient in an amount of 45 mass% or less wi...
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WO/2024/012820A1 |
The invention relates to a lens element for a microlithographic projection exposure apparatus designed for operation in the DUV, and a method and an arrangement for forming an antireflection layer. In accordance with one aspect, in the c...
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WO/2024/012756A1 |
An assembly for movably supporting a mirror comprises: a mirror; and one or more deformable members. A first end of the or each deformable member defines a support portion and a second end of the or each deformable member is attached (ei...
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WO/2024/013273A1 |
Described herein are methods and systems for determining mask rule check (MRC) violations associated with mask features based on local feature dimension (LFD) of mask features. A detector is placed at a first location of a mask feature a...
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WO/2024/012800A1 |
Described herein is a method for predicting post-etch stochastic variation in transferring a target layout onto a substrate using a lithographic apparatus. The method includes predicting a stochastic variation in transferring a target la...
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WO/2024/012978A1 |
A mirror for a projection exposure apparatus has a spectral filter, embodied as a grating structure (30), for light reflected by the mirror. The grating structure (30) has at least two grating levels and hence specifies at least two opti...
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WO/2024/008394A1 |
A method of determining a parasitic force of an actuator (320) of an optical component (300) is described, whereby the actuator is mounted to a first frame (310) and is configured to control a position of the optical component relative t...
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WO/2024/009674A1 |
A film for manufacturing a flexographic printing plate has a base material and an abrasion layer that is layered on the base material, the abrasion layer contains a resin having a structure unit (1) represented by general formula (1) bel...
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WO/2024/007501A1 |
Provided in the embodiments of the present disclosure is an acousto-optic scanning super-resolution optical fiber lithography machine, comprising a control device, a super-resolution optical fiber laser light source, an optical scanning ...
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WO/2024/009432A1 |
Provided is a photosensitive resin composition containing (A) a binder polymer, (B) a photopolymerizable compound having an ethylenically unsaturated bond, and (C) a photopolymerization initiator, wherein the photosensitivity resin compo...
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WO/2024/008732A1 |
The invention relates to a method for controlling a position of an optical component (102) of a lithography system (1) comprising the following steps: a) determining (S3) a first control variable (ur) based on a deviation (e) of an actua...
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WO/2024/008360A1 |
The invention relates to an optical element (Mx, 117) for a projection exposure system for semiconductor lithography (1, 101) comprising a base element (30) and at least one actuator (40) connected to the base element (30), wherein the a...
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WO/2024/007502A1 |
Provided in the embodiments of the present disclosure is a non-mechanical optical scanning fiber photolithography machine, comprising a control apparatus, a laser light source, an optical scanning system and an electrically driven workpi...
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WO/2024/009993A1 |
This method of manufacturing a laminate that has a surface-modified layer and a semiconductor substrate comprises: a first step in which a semiconductor substrate is coated with a surface modifier containing a polymer and a solvent, and ...
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WO/2024/008674A1 |
The invention relates to a base element (30) for an optical element (Mx, 117), characterised in that the base element (30) comprises a linking shape (49,80,88,89,90,91,92,93) produced by means of an additive manufacturing method. The inv...
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WO/2024/009611A1 |
[Problem] To provide a multi-charged particle beam irradiation device in which a blanking aperture array mounting board can be appropriately replaced while suppressing the reduction in an operating rate, a multi-charged particle beam irr...
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WO/2024/008677A1 |
The invention relates to an optical element (Mx, 117) with a base element (30) and at least one fluid line (32), formed in the base element (30), for guiding a temperature-control fluid (38). At least some sections of the fluid line (32)...
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WO/2024/009732A1 |
A positive-acting photosensitive resin composition containing: a hydrophobic resin (A), which is an addition (co)polymer; an alkali-soluble resin (B) having a structural unit represented by formula (1); a quinone diazide compound (C); a ...
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WO/2024/009870A1 |
This photosensitive resin composition contains (A) a binder polymer, (B) a photopolymerizable compound having an ethylenically unsaturated bond, and (C) a photopolymerization initiator, wherein the absorbance of the photosensitive resin ...
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WO/2024/010026A1 |
The present invention provides: a resin composition which contains a solvent and at least one resin that is selected from the group consisting of a polyimide precursor, a polyimide, a polyamide-imide precursor, a polyamide-imide and a po...
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WO/2024/010706A1 |
The current application discloses novel zwitterion materials which provide unexpected results useful in photolithographic resist compositions. In particular the compounds and photoresists made therefrom provide improvements in EUV photo ...
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WO/2024/008367A1 |
Disclosed herein is a fluid handling system for a lithographic apparatus, wherein the fluid handling system is configured to confine immersion fluid to a liquid confinement space between a part of a projection system and a surface of a s...
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WO/2024/008359A1 |
A substrate holding system comprises a substrate support configured to support a substrate, a gas source, and a plurality of conduits. The substrate support comprises a first port and a plurality of second ports radially outwards of the ...
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WO/2024/008805A1 |
The invention relates to heteroaromatic ketones of formula (I) for radical and cationic polymerization (I), wherein the substituents A, B, C and D can be the same or different and are nitrogen or carbon, while R1 and R2, independently of...
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WO/2024/010520A1 |
Various embodiments may relate to an optical system. The optical system may include a laser source for emitting one or more laser beams. The optical system may also include a metalens, a first stage mounting the metalens, a first motor c...
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WO/2024/008352A1 |
The invention relates to an optical assembly (30) comprising an optical element (Mx, 117), wherein the optical element (Mx, 117) has a base element (31), and wherein at least one actuator (35) is arranged on the rear side of the base ele...
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WO/2024/006037A1 |
A system and method for cleaning an optical element of an EUV optical system is disclosed. The system and method may include receiving design data of one or more samples. The system and method may include simulating a plurality of irradi...
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WO/2024/004492A1 |
Provided are: a photosensitive composition comprising a coloring material precursor that develops a black color through stimulation; a transfer film; a laminate; a method for manufacturing a laminate; and a micro LED display which use th...
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WO/2024/004390A1 |
A curable composition containing a radical polymerization initiator represented by formula (1), and a radically curable compound, a method for producing a cured product, a film, an optical element, an image sensor, a solid-state imaging ...
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WO/2024/005049A1 |
This composition comprises a compound (A) represented by formula (1) below and a compound (B) represented by formula (2) below. (The definitions of the elements in formula (1) are indicated in the description.) (In formula (2), the eleme...
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WO/2024/002672A1 |
An EUV collector for an EUV projection exposure apparatus is used to transfer usable EUV light emerging from a source volume (19) into a collection volume (28) which is separated from the source volume (19). The source volume (19) has a ...
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WO/2024/006453A1 |
The present disclosure includes the preparation of mixed-ligand compounds, such as tin(II) cyclopentadienylide complexes. The compounds of the present disclosure can be used as atomic layer deposition (ALD) precursors for extreme ultravi...
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WO/2024/004425A1 |
A curable composition containing a radical polymerization initiator represented by formula (1) and a radically polymerizable compound; a method for producing a cured product of the curable composition; a method for producing a cured prod...
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