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WO/2024/061645A1 |
The invention relates to a mirror device for a microlithographic projection exposure system (10, 22), comprising a frame structure (29) and a mirror body (23) with a plurality of cooling channels (27) which are formed in the mirror body ...
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WO/2024/063997A1 |
An embodiment etching tool includes an etch chamber for plasma etching a first wafer to be processed; a transfer chamber coupled to the etch chamber; a first run path between the transfer chamber and the etch chamber, the first run path ...
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WO/2024/063968A1 |
Systems and methods disclosed herein relate to a digital lithography system and method for alignment resolution with the digital lithography system. The digital lithography system includes a metrology system configured to improve overlay...
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WO/2024/061938A1 |
The present invention relates to a ceramics element, in particular a tile or bathroom ceramics, having at least one cover layer with at least a first outer surface, wherein the first outer surface is formed by a structured and an unstruc...
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WO/2024/061869A1 |
A bipod (202, 202A, 202B, 204, 206) for adjusting an optical element (102, 102') of an optical system (100) for a projection exposure apparatus (1), having a mechanism (224) which is couplable to the optical element (102, 102') in order ...
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WO/2024/062680A1 |
According to the present invention, a regenerated developing liquid is produced from a waste developing liquid for a water-developable flexographic printing original plate, the regenerated developing liquid having high performance in reg...
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WO/2024/058943A1 |
In certain embodiments, a method includes depositing a photoresist layer over a semiconductor wafer to be patterned by photolithography, the photoresist layer having a first height, and exposing the photoresist layer to a pattern of acti...
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WO/2024/056548A1 |
A pellicle for use in a lithographic apparatus, the pellicle include: a membrane, the membrane having a first portion and a second portion; and a protective portion at the second portion on at least one side of the membrane. A method for...
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WO/2024/056318A1 |
An illumination adjustment apparatus includes a plate, actuators, and finger structures. The actuators include coils disposed on the plate. The finger structures include beryllium alloy material. Ones of the finger structures are coupled...
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WO/2024/057623A1 |
The present invention relates to an exposure method and an exposure device, the purpose of which is to enable exposure in both acceleration and deceleration periods during relative movement between an exposure part and a substrate holdin...
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WO/2024/057536A1 |
This gas laser apparatus comprises: a monitor module that includes an optical plate housed in a housing unit and an incident region on which light is incident, the monitor module being slidable on the optical plate; a positioning member ...
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WO/2024/056771A1 |
Provided are a resist composition, a method for manufacturing a resist film, and a method for manufacturing a device.
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WO/2024/057730A1 |
The present invention addresses the problem of providing an organic EL display device exhibiting high sensitivity and excellent reliability. Proposed as a solution is an organic EL display device comprising at least a substrate, a first ...
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WO/2024/057999A1 |
This coloring composition contains a coloring agent, a resin, a radically polymerizable monomer, a radical polymerization initiator, at least one generator which is selected from the group consisting of an acid generator and a base gener...
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WO/2024/055712A1 |
The present invention provides a double-sided superlens processing method. The method comprises: providing a first structural layer on a first surface of a substrate, and performing a first photolithography operation on the first structu...
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WO/2023/224652A9 |
A method of forming a bioactive pattern on a substrate can include contacting a substrate comprising a prepolymer ink coated thereon with a beam pen lithography pen array. The prepolymer ink can include a photoinitiator, an acrylate, and...
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WO/2024/055485A1 |
The present disclosure provides a method and device for determining a pre-compensation amount of an overlay error, and a storage medium. The determining method comprises: in the wafer manufacturing process, when a first preset condition ...
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WO/2024/057778A1 |
[Problem] To provide a multilayer polyester film for dry film resists, the multilayer polyester film having excellent lamination adequacy at high temperatures, while having excellent resist characteristics and excellent sliding propertie...
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WO/2024/056600A1 |
A method is presented to adjust an illumination beam path within an illumination optics (4) having a first facet mirror (20) with a plurality of mirror facets (21) being tiltable via respective actuators and further having a second facet...
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WO/2024/058135A1 |
Provided is a technology for reducing residue in developed patterns.　Provided is a substrate processing method. This method comprises: (a) a step for providing a substrate having a base film and a metal-containing resist film formed on...
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WO/2024/056296A1 |
Disclosed is a dark-field metrology method. A first partial electric field is determined from a measurement parameter of first diffracted radiation data relating to a first portion of a diffraction order and a second partial electric fie...
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WO/2024/058243A1 |
The present invention provides a manufacturing method for a conductive film having high accuracy in detecting a defect. The manufacturing method includes an examination step for irradiating a conductive film with a laser beam to examine ...
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WO/2024/057701A1 |
This radiation-sensitive composition comprises a polymer having an acid-dissociable group and a compound represented by formula (1). In formula (1), R5 is a group obtained by removing (m+n+2) hydrogen atoms from a monocyclic or condensed...
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WO/2024/058000A1 |
Provided is a photosensitive composition comprising an infrared absorbent, a polymerizable compound, a photopolymerization initiator, and a solvent, wherein the infrared absorbent comprises a compound represented by formula (SQ-1). Provi...
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WO/2024/056501A1 |
The invention relates to a method (10) for processing a reference element (14) for an interferometer configured to measure a surface shape of a test object, wherein the reference element (14) is transmissive in relation to a measurement ...
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WO/2024/057751A1 |
Provided are: a radioactive-ray-sensitive resin composition that can exhibit sufficient levels of sensitivity and CDU performance when a next-generation technology is applied to the composition; and a pattern formation method. The radioa...
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WO/2024/056552A1 |
A patterning device voltage biasing system for use in a lithographic apparatus, the patterning device voltage biasing system comprising: a patterning device configured to impart a pattern to a beam of radiation, the patterning device com...
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WO/2024/058334A1 |
The present disclosure relates to a photosensitive resin composition, a photosensitive resin film manufactured using same, and a color filter. Specifically, provided in one implementation is a photosensitive resin composition comprising:...
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WO/2024/057622A1 |
The present invention relates to an optical device that shifts the path of light, and an exposure device and exposure method that use said optical device. The purpose of the present invention is to adjust the shift amount while minimizin...
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WO/2024/058075A1 |
The present invention employs a resist composition that contains: a base material component, the solubility of which in a developer solution is changed by the action of an acid; and a compound which is represented by general formula (d0)...
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WO/2024/053689A1 |
The present invention can provide: a resist composition which can form a resist pattern having both of improved sensitivity and lithographic properties; and a resist pattern formation method. The present invention relates to a resist com...
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WO/2024/053722A1 |
One embodiment of the present invention relates to a polymer, a composition, a cured product, or a display element. The composition comprises a polymer having a structural unit represented by formula (1). [In formula (1), A is a divalent...
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WO/2024/052300A1 |
The invention relates to an illumination system (30) for a lithography system, in particular for a projection exposure apparatus (100, 200), for illuminating a reticle (106, 203) of the lithography system with a used radiation (2) from a...
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WO/2024/053564A1 |
This photosensitive resin composition contains a polyimide (A) having an imide ring structure in the molecule, and a photosensitizer (B), and the water content measured by the Karl Fischer method is 0.30-10 mass% inclusive.
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WO/2024/052172A1 |
The invention relates to a micromirror array (10) having a number of individual mirror elements (12) which are actuatable independently of one another, which are arranged as a field and which are each movable by way of an actuator system...
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WO/2024/052057A1 |
Disclosed is a method for monitoring proper functioning of one or more components of a lithography system. The method comprises determining a frequency response function for each of said one or more components during production activity ...
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WO/2024/052041A1 |
A method of providing an additional EUV radiation exposure of part of a die on a substrate at a level of EUV radiation power which compensates for a previous low exposure, the method using EUV radiation power incident upon a patterning d...
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WO/2024/053718A1 |
The present invention employs a resist composition that contains a resin component having a constituent unit represented by general formula (a0-1). In formula (a0-1), R01 is a divalent linking group or a single bond. R02 is an acid-disso...
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WO/2024/052059A1 |
The invention relates to a fiber strand (60) for a sector heater (50) of a projection device (20) for microlithography, and also to a sector heater (50), an arrangement (60) and a projection device (20), each for or comprising such a fib...
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WO/2024/053655A1 |
A photosensitive resin composition comprising: at least one resin A selected from the group consisting of polyimides and polyimide precursors; a photosensitizer B; and a solvent C, wherein the water content is 0.01-5.0% by mass based on ...
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WO/2024/052031A1 |
A method of determining a parameter of interest of a structure comprising at least one first feature oriented along a first axis of a structure coordinate system and at least one second feature oriented along a second axis of the structu...
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WO/2024/052084A1 |
The invention relates to an arrangement (100) for calibrating a mirror array (30) having a plurality of mirror elements (34). The arrangement (100) comprises a detection light device (40) and a detection device (60). The detection light ...
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WO/2024/053194A1 |
This light irradiation device, which combines laser light beams generated using a plurality of light sources into a single beam, suppresses the dissipation of light emitted from a plurality of laser light sources without increasing the l...
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WO/2024/053609A1 |
The purpose of the present invention is to provide: an alkali-soluble resin able to yield a cured product having a high refractive index; a photosensitive resin composition; and a cured product. The present invention is an alkali-soluble...
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WO/2024/054050A1 |
The present invention provides a quality control slide of a cell counting device, comprising: a base layer which is capable of transmitting light therethrough; a thin film layer which is formed on top of the base layer; a fluorescent lay...
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WO/2024/054311A1 |
Various embodiments of methods are provided for forming a moisture barrier layer on an EUV-active photoresist film before patterning the EUV-active photoresist film with EUV lithography. According to one embodiment, the methods disclosed...
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WO/2024/054537A1 |
A method and apparatus for performing post-exposure bake operations is described herein. After exposure of photoresist on a substrate, the substrate is heated during a baking process to facilitate protection of the resist. The baking pro...
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WO/2024/052033A1 |
The disclosure relates to a method for preparing an object having a curved surface to be etched, the resulting etched surface being useable as a mold for manufacturing an optical article. The method comprises illuminating the curved surf...
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WO/2024/053579A1 |
The present invention provides: a photosensitive resin composition which is capable of forming a resin film that has excellent photolithographic characteristics and excellent chemical resistance; a cured product of this photosensitive re...
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WO/2024/052012A1 |
Disclosed is a method of determining at least one parameter of interest relating to a structure formed in at least one respective layer on a substrate, the method comprising: obtaining a measured metrology data relating to a measurement ...
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