| Document |
Document Title |
|
WO/2023/238762A1 |
This method for producing a blue cured film includes: a step for forming, on a substrate, a coating film of a blue photosensitive composition that contains a colorant, an alkali-soluble resin, a photopolymerizable compound, and a photoin...
|
|
WO/2023/237452A1 |
The invention relates to a component (50, 70) for a projection exposure apparatus (1, 101) for semiconductor lithography comprising at least two structural parts (51, 55, 71, 75) which are connected to one another, it being possible for ...
|
|
WO/2023/238286A1 |
Provided is a photosensitive resin composition by which can be formed, at a relatively low temperature, an insulating coating that excels in adhesion to a substrate of an electronic device such as a touch panel, resistance (chemical resi...
|
|
WO/2023/238732A1 |
[Problem] To provide a layered structure that includes a resin layer with which a cured product with a high dielectric constant can be obtained and having both good image formation after development and before heat curing and good image ...
|
|
WO/2023/237282A1 |
The invention relates to a method for operating a projection exposure system for microlithography, comprising: heating at least one optical element of the projection exposure system by applying heat radiation to a surface (30) of the opt...
|
|
WO/2023/238202A1 |
This photosensitive element comprises a support body and a photosensitive layer formed on the support body using a photosensitive resin composition containing a binder polymer, a photopolymerizable compound, a photopolymerization initiat...
|
|
WO/2023/238200A1 |
Provided is a drawing data generating method, said data representing a drawing pattern to be formed by a spatial light modulator in order to form a predetermined exposure pattern atop a substrate by means of exposure light. In order to s...
|
|
WO/2023/238814A1 |
This photosensitive element comprises: a support body; and, on the support body, a photosensitive layer formed by using a photosensitive resin composition that contains a binder polymer, a photopolymerizable compound, a photopolymerizati...
|
|
WO/2023/236255A1 |
The present disclosure relates to an exposure method and apparatus, a computer device, a storage medium, and a computer program product. The method comprises: acquiring a reference diffraction light intensity which is used for exposing a...
|
|
WO/2023/238920A1 |
A composition for forming a resist underlayer film contains a first component, a second component, and a solvent. The second component is a water-soluble polymer, the mass ratio of the first component and the second component (first comp...
|
|
WO/2023/237992A1 |
Microcapsules (208, 209) including a polymeric shell (116) and an internal phase (118) including a non-photopolymerizable reactive diluent are provided for use in microcapsule imaging sheets. Imaging sheets including microcapsules (209) ...
|
|
WO/2023/232387A1 |
The invention provides a flexible supply structure for connecting a first movable object with a second object, wherein the flexible supply structure comprises a first permanent magnet having a first magnetic field orientation, wherein th...
|
|
WO/2023/234561A1 |
The present invention relates to a display device and a photo-sensitive resin composition that can be applied thereto, and the photo-sensitive resin composition has excellent sensitivity, coatability, bubble defoaming properties, liquid ...
|
|
WO/2023/233896A1 |
Provided are: a photosensitive resin composition that provides a polyimide resin with a low dielectric loss tangent and that has excellent stability during storage; a patterned resin membrane using the photosensitive resin composition; a...
|
|
WO/2023/232360A1 |
Disclosed is a method for determining a failure event on a lithography system. The method comprises decomposing at least one signal generated within the lithography system into a plurality of component signals, each component signal rela...
|
|
WO/2023/234999A1 |
A system includes first and second sections. The first section includes an elongated plate including a squared edge, a tapered edge, a first surface, a second surface, and first and second extensions extending from the second surface. Th...
|
|
WO/2023/232652A1 |
The invention relates to a method (12) for monitoring a laser lens system (16). At least one sensor (24) measures the vibrations, the structure-borne sound and/or the sound emitted by the laser lens system (16). The measurement can be li...
|
|
WO/2023/232478A1 |
Disclosed is a method comprising: obtaining measured data relating to at least one measurement by a measurement apparatus configured to irradiate radiation onto each of one or more structures on a substrate; decomposing the measured data...
|
|
WO/2023/232408A1 |
Disclosed is a pellicle membrane comprising three or more layers, the three or more layers comprising at least one inner layer and at least one outer layer on either side of said at least one inner layer, wherein the at least one inner l...
|
|
WO/2023/233895A1 |
Provided are a polyimide resin precursor that yields a polyimide resin having a low dielectric loss tangent and yields a photosensitive resin composition having exceptional photolithography properties, a photosensitive resin composition ...
|
|
WO/2023/232397A1 |
Disclosed is a method of determining an illumination-detection system alignment of an illumination- detection system describing alignment of at least one detector and/or measurement illumination of a metrology apparatus in terms of two o...
|
|
WO/2023/228926A1 |
[Problem] The present invention provides a polymer for resists, the polymer having excellent storage stability, high sensitivity and high resolution. [Solution] A polymer according to the present invention comprises a structural unit tha...
|
|
WO/2023/229951A1 |
A digital lithography system may adjust a wavelength of the light source to compensate for tilt errors in micromirrors while maintaining a perpendicular direction for the reflected light. Adjacent pixels may have a phase shift that is de...
|
|
WO/2023/229985A1 |
The current application discloses zwitterion materials useful in EUV photolithographic resist compositions. The compositions provide improvements in photodefined line geometires as well as increased lithographic photospeed. Also provided...
|
|
WO/2023/228841A1 |
Provided are: a radiation-sensitive resin composition, from which a resist film capable of exhibiting satisfactory levels of sensitivity, LWR performance, DOF performance, pattern rectangularity, CDU performance and pattern circularity c...
|
|
WO/2023/227397A1 |
A catadioptric projection objective for reproducing a pattern arranged in an object plane (OS) of the projection objective in an image plane of the projection objective parallel to the object plane comprises a plurality of optical elemen...
|
|
WO/2023/227374A1 |
The invention relates to a mirror, in particular for a microlithographic projection exposure system, having an active optical surface, a reflective layer system for reflecting electromagnetic radiation of a working wavelength which is in...
|
|
WO/2023/228716A1 |
Provided is a light source device capable of mitigating entry of debris in a direction in which radiation is taken out. A light source device according to an embodiment of the present invention is provided with a disc-shaped rotating b...
|
|
WO/2023/228675A1 |
A multi charged-particle beam irradiation device according to an aspect of the present invention is characterized by comprising: a shaping aperture array substrate that forms multi-beam arrays of a charged-particle beam; a limiting apert...
|
|
WO/2023/228847A1 |
Provided are: a radiation-sensitive resin composition with which it is possible to form a resist film that is capable of exhibiting sensitivity, LWR performance, water repellency, and development defect inhibitory ability at satisfactory...
|
|
WO/2023/228842A1 |
Provided are: a radiation-sensitive resin composition from which a resist film capable of exhibiting satisfactory levels of sensitivity, LWR performance, DOF performance, pattern rectangularity, CDU performance, and pattern circularity c...
|
|
WO/2023/227550A1 |
An optical element (OE) for incorporation into a holding device for the purpose of forming an assembly (BG) for constructing an optical system comprises a body (K) which is transparent to light from a used wavelength range, on which a fi...
|
|
WO/2023/227564A1 |
A developable resist overlayer composition as well as a method for manufacturing a resist overlayer pattern and a resist pattern are provided.
|
|
WO/2023/228629A1 |
Short circuiting between an electrode housing and a chamber due to debris solidification is minimized. A light source device according to one embodiment of the present invention comprises a light source unit, a chamber, and a shielding...
|
|
WO/2023/228843A1 |
Provided are: a radiation-sensitive resin composition, from which a resist film capable of exhibiting satisfactory levels of sensitivity, LWR performance, DOF performance and pattern rectangularity can be formed in the formation of a res...
|
|
WO/2023/228692A1 |
The purpose of the present invention is to provide a copolymer capable of raising the pattern collapse resistance while maintaining the clarity of a resist pattern. The present invention is a copolymer having a monomer unit (I) represent...
|
|
WO/2023/229853A1 |
Modem two-photon lithography (TPL) technologies provide convenient methods for 3D printing of sub- micron-sized features in photopolymers. The ability to tune optical properties of the resin material used for TPL is highly desired as it ...
|
|
WO/2023/228662A1 |
A composition for forming a protective film against a wet etchant for semiconductors, said composition containing: (A) a compound or a polymer having a reactive group capable of undergoing a cross-linking reaction in the presence of a cu...
|
|
WO/2023/230406A1 |
Examples are disclosed that relate to use of extreme ultraviolet (EUV)-absorbing photoelectron-emissive dopants that are bonded to atoms in a hydrogen-contributing photosensitive underlayer for a photoresist. One example provides a metho...
|
|
WO/2023/228661A1 |
The present invention provides a composition for forming a protective film against a wet etching liquid for semiconductor, the composition containing: (A) a compound or a polymer having a reactive group capable of undergoing a crosslinki...
|
|
WO/2023/227396A1 |
An illumination system (ILL) for a microlithography projection illumination facility for illuminating a sample arranged in a region of an object plane (OS) of a downstream projection lens (PO) with illumination light generated from light...
|
|
WO/2023/230389A1 |
A reverse nanoimprint lithography approach is described to create biomimetic transparent nanoplasmonic microporous mesh (BTNMM) devices, nanolaminated plasmonic nanoantenna (NLPNA) arrays, and related structures. The NLPNAs can be formed...
|
|
WO/2023/228568A1 |
According to the present disclosure, there are provided: a photosensitive resin composition which has low dielectric properties, low cure shrinkage, good storage stability, and reduced phase separation during coating, and with which a cu...
|
|
WO/2023/227950A1 |
Disclosed and claimed herein are novel non-polymeric, aromatic-based core molecules containing oxygen bearing, acid or base reactive, crosslinking functionalities with improved sensitivity (photospeed), resolution (Line Width Roughness) ...
|
|
WO/2023/228845A1 |
Provided are: a radiation-sensitive resin composition, from which a resist film capable of exhibiting satisfactory levels of sensitivity, CDU performance, pattern circularity and LWR performance can be formed in the formation of a resist...
|
|
WO/2023/228691A1 |
The purpose of the present invention is to provide a positive-type resist composition that can form a resist pattern having excellent clarity. The present invention is a positive-type resist composition comprising a copolymer A, a copoly...
|
|
WO/2023/222328A1 |
Disclosed is an illumination module for a metrology device. The illumination module comprises a configurable illumination module operable to provide measurement illumination over a configurable range of illumination angles, a grating lig...
|
|
WO/2023/223768A1 |
The purpose of the present invention is to provide a substrate processing method capable of more efficiently detaching or removing a resist from a substrate. This substrate processing method comprises: a step for supplying hydrogen per...
|
|
WO/2023/222349A1 |
A method for generation a structure comprising a first grating at a first pitch in a first layer of a multi- layer stack structure; and a second grating at a second pitch in a second layer of the multi-layer stack structure, wherein, whe...
|
|
WO/2023/225046A1 |
Organotin compositions having the formula RSnL3 and corresponding synthetic methods are described. R includes aromatic, cyclic and/or halogenated ether moieties, or polyethers, and L includes hydrolysable groups. The organotin compositio...
|
