Title:
POSITIVE-TYPE RESIST COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2023/228691
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a positive-type resist composition that can form a resist pattern having excellent clarity. The present invention is a positive-type resist composition comprising a copolymer A, a copolymer B, and a solvent, wherein the copolymer A has a surface free energy lower than that of the copolymer B, the difference in surface free energies between the copolymer B and the copolymer A is at least 3 mJ/m2, and the EUV absorption coefficient of the copolymer A is at least 55,000 cm-1.
Inventors:
HOSHINO MANABU (JP)
Application Number:
PCT/JP2023/017090
Publication Date:
November 30, 2023
Filing Date:
May 01, 2023
Export Citation:
Assignee:
ZEON CORP (JP)
International Classes:
G03F7/039; C08F20/10; C08F220/22
Domestic Patent References:
| WO2018123667A1 | 2018-07-05 |
Foreign References:
| JPS6064432A | 1985-04-13 | |||
| JPS6029745A | 1985-02-15 | |||
| JP2021134283A | 2021-09-13 | |||
| JP2020052144A | 2020-04-02 | |||
| JPH01217020A | 1989-08-30 |
Attorney, Agent or Firm:
SUGIMURA Kenji (JP)
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