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WO/2023/233895A1 |
Provided are a polyimide resin precursor that yields a polyimide resin having a low dielectric loss tangent and yields a photosensitive resin composition having exceptional photolithography properties, a photosensitive resin composition ...
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WO/2023/232397A1 |
Disclosed is a method of determining an illumination-detection system alignment of an illumination- detection system describing alignment of at least one detector and/or measurement illumination of a metrology apparatus in terms of two o...
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WO/2023/228926A1 |
[Problem] The present invention provides a polymer for resists, the polymer having excellent storage stability, high sensitivity and high resolution. [Solution] A polymer according to the present invention comprises a structural unit tha...
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WO/2023/229951A1 |
A digital lithography system may adjust a wavelength of the light source to compensate for tilt errors in micromirrors while maintaining a perpendicular direction for the reflected light. Adjacent pixels may have a phase shift that is de...
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WO/2023/229985A1 |
The current application discloses zwitterion materials useful in EUV photolithographic resist compositions. The compositions provide improvements in photodefined line geometires as well as increased lithographic photospeed. Also provided...
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WO/2023/228841A1 |
Provided are: a radiation-sensitive resin composition, from which a resist film capable of exhibiting satisfactory levels of sensitivity, LWR performance, DOF performance, pattern rectangularity, CDU performance and pattern circularity c...
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WO/2023/227397A1 |
A catadioptric projection objective for reproducing a pattern arranged in an object plane (OS) of the projection objective in an image plane of the projection objective parallel to the object plane comprises a plurality of optical elemen...
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WO/2023/227374A1 |
The invention relates to a mirror, in particular for a microlithographic projection exposure system, having an active optical surface, a reflective layer system for reflecting electromagnetic radiation of a working wavelength which is in...
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WO/2023/228716A1 |
Provided is a light source device capable of mitigating entry of debris in a direction in which radiation is taken out. A light source device according to an embodiment of the present invention is provided with a disc-shaped rotating b...
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WO/2023/228675A1 |
A multi charged-particle beam irradiation device according to an aspect of the present invention is characterized by comprising: a shaping aperture array substrate that forms multi-beam arrays of a charged-particle beam; a limiting apert...
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WO/2023/228847A1 |
Provided are: a radiation-sensitive resin composition with which it is possible to form a resist film that is capable of exhibiting sensitivity, LWR performance, water repellency, and development defect inhibitory ability at satisfactory...
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WO/2023/228842A1 |
Provided are: a radiation-sensitive resin composition from which a resist film capable of exhibiting satisfactory levels of sensitivity, LWR performance, DOF performance, pattern rectangularity, CDU performance, and pattern circularity c...
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WO/2023/227550A1 |
An optical element (OE) for incorporation into a holding device for the purpose of forming an assembly (BG) for constructing an optical system comprises a body (K) which is transparent to light from a used wavelength range, on which a fi...
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WO/2023/227564A1 |
A developable resist overlayer composition as well as a method for manufacturing a resist overlayer pattern and a resist pattern are provided.
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WO/2023/228629A1 |
Short circuiting between an electrode housing and a chamber due to debris solidification is minimized. A light source device according to one embodiment of the present invention comprises a light source unit, a chamber, and a shielding...
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WO/2023/228843A1 |
Provided are: a radiation-sensitive resin composition, from which a resist film capable of exhibiting satisfactory levels of sensitivity, LWR performance, DOF performance and pattern rectangularity can be formed in the formation of a res...
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WO/2023/228692A1 |
The purpose of the present invention is to provide a copolymer capable of raising the pattern collapse resistance while maintaining the clarity of a resist pattern. The present invention is a copolymer having a monomer unit (I) represent...
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WO/2023/229853A1 |
Modem two-photon lithography (TPL) technologies provide convenient methods for 3D printing of sub- micron-sized features in photopolymers. The ability to tune optical properties of the resin material used for TPL is highly desired as it ...
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WO/2023/228662A1 |
A composition for forming a protective film against a wet etchant for semiconductors, said composition containing: (A) a compound or a polymer having a reactive group capable of undergoing a cross-linking reaction in the presence of a cu...
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WO/2023/230406A1 |
Examples are disclosed that relate to use of extreme ultraviolet (EUV)-absorbing photoelectron-emissive dopants that are bonded to atoms in a hydrogen-contributing photosensitive underlayer for a photoresist. One example provides a metho...
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WO/2023/228661A1 |
The present invention provides a composition for forming a protective film against a wet etching liquid for semiconductor, the composition containing: (A) a compound or a polymer having a reactive group capable of undergoing a crosslinki...
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WO/2023/227396A1 |
An illumination system (ILL) for a microlithography projection illumination facility for illuminating a sample arranged in a region of an object plane (OS) of a downstream projection lens (PO) with illumination light generated from light...
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WO/2023/230389A1 |
A reverse nanoimprint lithography approach is described to create biomimetic transparent nanoplasmonic microporous mesh (BTNMM) devices, nanolaminated plasmonic nanoantenna (NLPNA) arrays, and related structures. The NLPNAs can be formed...
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WO/2023/228568A1 |
According to the present disclosure, there are provided: a photosensitive resin composition which has low dielectric properties, low cure shrinkage, good storage stability, and reduced phase separation during coating, and with which a cu...
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WO/2023/227950A1 |
Disclosed and claimed herein are novel non-polymeric, aromatic-based core molecules containing oxygen bearing, acid or base reactive, crosslinking functionalities with improved sensitivity (photospeed), resolution (Line Width Roughness) ...
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WO/2023/228845A1 |
Provided are: a radiation-sensitive resin composition, from which a resist film capable of exhibiting satisfactory levels of sensitivity, CDU performance, pattern circularity and LWR performance can be formed in the formation of a resist...
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WO/2023/228691A1 |
The purpose of the present invention is to provide a positive-type resist composition that can form a resist pattern having excellent clarity. The present invention is a positive-type resist composition comprising a copolymer A, a copoly...
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WO/2023/222328A1 |
Disclosed is an illumination module for a metrology device. The illumination module comprises a configurable illumination module operable to provide measurement illumination over a configurable range of illumination angles, a grating lig...
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WO/2023/223768A1 |
The purpose of the present invention is to provide a substrate processing method capable of more efficiently detaching or removing a resist from a substrate. This substrate processing method comprises: a step for supplying hydrogen per...
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WO/2023/222349A1 |
A method for generation a structure comprising a first grating at a first pitch in a first layer of a multi- layer stack structure; and a second grating at a second pitch in a second layer of the multi-layer stack structure, wherein, whe...
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WO/2023/225046A1 |
Organotin compositions having the formula RSnL3 and corresponding synthetic methods are described. R includes aromatic, cyclic and/or halogenated ether moieties, or polyethers, and L includes hydrolysable groups. The organotin compositio...
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WO/2023/225330A1 |
A system for nanoimprint lithography includes a master holder, a spacer, and a stamp support. The spacer supports the stamp support as a stamp material is cured to create a stamp. A method of forming an optical device using the nanoimpri...
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WO/2023/222368A1 |
Methods, apparatuses, and software are disclosed for optimization of a source and/or mask as used in lithographic manufacturing and patterning processes. One method includes determining a first pupil having a central obscuration (CO), de...
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WO/2023/223624A1 |
The present invention provides a radiation sensitive resin composition, a pattern forming method, etc., capable of achieving, at sufficient levels, sensitivity, LWR performance, and process window when next-generation technology is appli...
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WO/2023/222740A1 |
Provided is a substrate coating resist composition containing a polymer (A) having a specific structure and a photoacid generator (B) having a specific structure.
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WO/2023/223919A1 |
This disclosure provides a flexographic printing plate having at least: a region (A1) in which a support body and a relief layer are sequentially stacked, and the storage elastic modulus at a frequency of 2,000 Hz is 100 MPa to 500 MPa, ...
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WO/2023/223935A1 |
Provided is a plasma treatment method implemented in a plasma treatment device having a chamber. This method comprises: (a) a step for preparing, on a substrate support part in a chamber, a substrate having a film to be etched and a meta...
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WO/2023/223865A1 |
Provided is a resist composition which generates an acid upon exposure to light and of which the solubility in a developing solution changes due to the action of an acid. The resist composition contains a resin component (A1) of which th...
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WO/2023/224746A1 |
A photocurable composition can comprise a polymerizable material and at least one photoinitiator, wherein the polymerizable material comprises a multi-functional vinylbenzene monomer in an amount of at least 30 wt% based on the total wei...
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WO/2023/222317A1 |
Passive integrated optical systems and methods are described. The present systems and methods facilitate reduction of spatial optical coherence in source radiation used for metrology, for example. Current coherence scramblers used for me...
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WO/2023/223917A1 |
Provided is a flexographic printing original plate in which at least a support (a) and a photosensitive resin composition layer (b) are laminated, wherein the photosensitive resin composition layer (b) contains a naphthenic hydrocarbon c...
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WO/2023/222342A1 |
A method for determination of a parameter of interest in a manufacturing process is described. For measurement structure comprising a first grating with a first pitch and a second grating with a second pitch a sensitivity of a Moiré int...
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WO/2023/223897A1 |
Provided is a resist composition comprising a resin component (A1) that has a constituent unit (a0) which is derived from a compound represented by general formula (a0-1). In the formula, R is a hydrogen atom, a C1-5 alkyl group, or a C1...
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WO/2023/222310A1 |
Disclosed is a method of optimizing maintenance of a lithographic apparatus. The method comprises obtaining productivity data relating to a productivity of a lithographic apparatus and error metric data relating to the effect of a mainte...
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WO/2023/218970A1 |
Provided are, inter alia, an active-ray-sensitive or radiation-sensitive resin composition containing a resin that increases in polarity under the action of acid and a compound having a specified structure, an active-ray-sensitive or rad...
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WO/2023/219357A1 |
The present invention relates to a stretchable anisotropic conductive film containing liquid metal particles and a manufacturing method therefor. The stretchable anisotropic conductive film according to the present invention includes: a ...
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WO/2023/219356A1 |
The present invention relates to a flexible anisotropic conductive film including conductive balls and a manufacturing method therefor. The flexible anisotropic conductive film according to the present invention includes: a flexible base...
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WO/2023/217243A1 |
A photolithography method for preparing a semiconductor vertical cross-sectional structure. A partition member (3) is designed according to a photolithographic pattern, the partition member (3) comprises a cover plate (31), the cover pla...
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WO/2023/217553A1 |
A lithographic apparatus includes an illumination system, a projection system, and a stage. The illumination system illuminates a pattern of a patterning device. The projection system projects an image of the pattern onto a substrate. Th...
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WO/2023/219987A1 |
Described herein are methods, apparatus, and systems for removing photoresist scum from a substrate. The substrate may be electroplated following photoresist scum removal. In various embodiments, the method involves receiving the substra...
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