Title:
RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND RADIATION-SENSITIVE ACID GENERATOR
Document Type and Number:
WIPO Patent Application WO/2024/024801
Kind Code:
A1
Abstract:
This radiation-sensitive composition comprises a polymer having an acid-dissociable group and a compound represented by formula (1). L1 represents a group having a (thio)acetal ring or the like. W1 represents a single bond or a (b+1)-valent organic group having 1 to 40 carbon atoms. R1, R2, and R3 each independently represent a hydrogen atom, a hydrocarbon group having 1 to 10 carbon atoms, a fluorine atom, or a fluoroalkyl group. Rf represents a fluorine atom, or a fluoroalkyl group. a represents an integer of 0 to 8. b represents an integer of 1 to 4. d represents 1 or 2. When a represents 2 or more, a plurality of R1 are same or different, and a plurality of R2 are same or different. When d represents 2, a plurality of W1are same or different, and a plurality of b are same or different. M+ represents a monovalent cation.
Inventors:
NEMOTO RYUICHI (JP)
MIYAKE MASAYUKI (JP)
MITA MICHIHIRO (JP)
MIYAO KENSUKE (JP)
OKAZAKI SATOSHI (JP)
MIYAKE MASAYUKI (JP)
MITA MICHIHIRO (JP)
MIYAO KENSUKE (JP)
OKAZAKI SATOSHI (JP)
Application Number:
PCT/JP2023/027258
Publication Date:
February 01, 2024
Filing Date:
July 25, 2023
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
G03F7/004; C07C381/12; C09K3/00; G03F7/038; G03F7/039; G03F7/20
Foreign References:
| JP2015024989A | 2015-02-05 | |||
| JP2020181064A | 2020-11-05 | |||
| JP2018135321A | 2018-08-30 |
Attorney, Agent or Firm:
YAMADA, Tsuyoshi (JP)
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