Title:
RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLYMER
Document Type and Number:
WIPO Patent Application WO/2024/084993
Kind Code:
A1
Abstract:
A radiation-sensitive composition comprising a polymer having: a side chain including an acid-dissociable group; and a side chain including one or more radiation-sensitive onium cation structures and two or more iodo groups.
Inventors:
MARUYAMA KEN (JP)
NISHIKORI KATSUAKI (JP)
KIRIYAMA KAZUYA (JP)
NISHIKORI KATSUAKI (JP)
KIRIYAMA KAZUYA (JP)
Application Number:
PCT/JP2023/036474
Publication Date:
April 25, 2024
Filing Date:
October 06, 2023
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
G03F7/039; C08F220/10; G03F7/20
Foreign References:
| JP2018197853A | 2018-12-13 | |||
| JP2022028614A | 2022-02-16 |
Attorney, Agent or Firm:
IKEDA Yoshinori (JP)
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