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Title:
COMPOSITION AND METHOD FOR MANUFACTURING LIGHT-EMITTING ELEMENT USING SAME
Document Type and Number:
WIPO Patent Application WO/2024/084615
Kind Code:
A1
Abstract:
Provided is a photoresist that can form a photoresist layer having both developability and polar solvent resistance while having excellent peel removability as a positive photoresist layer. This composition for forming a photoresist comprises a water-soluble resin, a positive photosensitive agent, and a solvent, the water-soluble resin comprising a copolymer includuing a vinyl alcohol monomer unit.

Inventors:
ADACHI TAKAHIRO
KIDA SENTARO
ASAOKA YASUSHI
Application Number:
PCT/JP2022/038895
Publication Date:
April 25, 2024
Filing Date:
October 19, 2022
Export Citation:
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Assignee:
SHARP DISPLAY TECHNOLOGY CORP (JP)
International Classes:
G03F7/021; G03F7/022; G03F7/033
Domestic Patent References:
WO2021241458A12021-12-02
Foreign References:
JP2007256537A2007-10-04
JP2003107692A2003-04-09
Attorney, Agent or Firm:
HARAKENZO WORLD PATENT & TRADEMARK (JP)
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