Title:
DIFFRACTION GRATING FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2024/084965
Kind Code:
A1
Abstract:
Provided is a technique for forming a diffraction grating using a high-refractive-index material. This method for forming a diffraction grating on a substrate having permeability includes: (a) a step for forming, on the substrate, a first structure including recessed portions corresponding to protruding portions of the diffraction grating using a first material; (b) a step for providing a second material to the recessed portions of the first structure on the substrate to form a second structure including the diffraction grating; and (3) a step for removing the first structure.
Inventors:
HIGUCHI TAKUYA (JP)
TANAKA FUMIAKI (JP)
MAEHARA HIROKI (JP)
TANAKA FUMIAKI (JP)
MAEHARA HIROKI (JP)
Application Number:
PCT/JP2023/036136
Publication Date:
April 25, 2024
Filing Date:
October 04, 2023
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
G02B5/18; B81C1/00; G03F7/20; H01L21/027
Foreign References:
| JP2021504736A | 2021-02-15 | |||
| JP2021530730A | 2021-11-11 | |||
| JP2021530862A | 2021-11-11 | |||
| JP2011519071A | 2011-06-30 | |||
| JP2011221518A | 2011-11-04 | |||
| US20200333527A1 | 2020-10-22 |
Attorney, Agent or Firm:
SATO, Atsushi et al. (JP)
Download PDF: