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WO/2023/105894A1 |
Provided is a silicon nitride film forming method with which a silicon nitride film having a relatively strong tensile stress can be formed by reactive sputtering. In this silicone nitride film forming method, a silicon target 3 and a ...
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WO/2023/099757A1 |
The process according to the invention is a process for depositing a coating on a substrate by means of physical vapor deposition methods, comprising a step of depositing said coating on said substrate by the simultaneous use of high-pow...
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WO/2023/100452A1 |
Provided is a vacuum processing device that holds a stage configured so as to be able to offset the phase of a substrate to be treated without causing positional deviation of the substrate. A vacuum processing device SM, according to t...
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WO/2023/100891A1 |
This solid molten mixture contains a first organic compound and a second organic compound, and can be used in vapor deposition. The solid molten mixture satisfies formula (A1) (however, the first organic compound is different from the se...
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WO/2023/098706A1 |
Provided in the present invention are a zinc-doped indium oxide powder, a sputtering target material, and preparation methods therefor, belonging to the technical field of new materials. In the present invention, a precursor powder of a ...
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WO/2023/101862A1 |
According to at least one feature of the present disclosure, a method of forming an optical element, includes: Depositing an aluminum layer atop a glass substrate via a physical deposition process; depositing a first fluorine containing ...
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WO/2023/099045A1 |
The invention relates to an endoprosthesis (30) comprising a cap component (20) and an insert component (10), the sliding surface of the insert component (10) being in sliding contact with the sliding surface of the cap component (20). T...
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WO/2023/099281A1 |
The invention relates to a composite pane (100), at least comprising an outer pane (1), a thermoplastic intermediate layer (3), an inner pane (2), a masking layer (4) which is arranged in a region of the composite pane (100), an adhesive...
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WO/2023/101983A1 |
Implementations disclosed describe a method of obtaining a first image of a sample using a first light, wherein the sample has been subjected to a processing operation associated with a change of a thickness of the sample. The method fur...
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WO/2023/097583A1 |
A doped nickel oxide target material, which comprises a nickel oxide substrate and a doping substance doped in the nickel oxide substrate, wherein the doping substance comprises at least one of compounds containing one or more elements o...
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WO/2023/101544A1 |
A metal electrode patterning method using a metal pattern formation control material, according to one embodiment of the present invention, comprises the steps of: preparing a substrate; printing, on the substrate, a pattern formation co...
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WO/2023/097939A1 |
A ruby (2) plating process for a beauty instrument, and a beauty instrument. The process comprises: a primary processing step: when primary processing is performed on the shape of a ruby (2), processing the ruby (2) into a shape that is ...
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WO/2023/093104A1 |
Disclosed in the present application are a mask and a mask assembly. The mask comprises an evaporation area and a peripheral area, wherein the evaporation area comprises at least one evaporation opening; and the peripheral area comprises...
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WO/2023/095648A1 |
The present invention provides a titanium material for fuel cell separators, the titanium material being used for a fuel cell separator and being capable of decreasing the contact resistance between separators, while being also capable o...
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WO/2023/095102A1 |
Object of the present invention is a transparent composite material having antimicrobial properties in particular antibacterial, antiviral, anti-fungal and anti-protozoal activities, a method for its preparation and use in articles, surf...
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WO/2023/093011A1 |
The present invention discloses a copper alloy thin film, and a protective layer based on the service of the copper alloy thin film and a preparation method therefor. The copper alloy thin film is a binary alloy and comprises Cu and an a...
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WO/2023/095181A1 |
Roll (10) for industrial processes and related apparatus and method for producing it. The roll (10) is provided with a central body (11) on which is disposed, by means of at least one of a PVD, CVD and PECVD technique, a thick-film surfa...
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WO/2023/093089A1 |
Embodiments of the present application provide a mask. The mask is used for depositing a substrate to be deposited; the mask comprises a panel region; the panel region comprises a deposition portion and a non-deposition portion; at least...
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WO/2023/097079A1 |
There is provided markers, systems, and methods for creating and utilizing a marker containing identification information. The embodiments include an identifying marker comprised of high temperature material for tracking a component in a...
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WO/2023/095769A1 |
The purpose of the present disclosure is to provide a reflective photomask blank and a reflective photomask that maximize the effectiveness of a phase shift effect and that possess high transferability (especially resolution). A reflecti...
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WO/2023/096022A1 |
The present invention provides a vanadium oxide thin film as a thermochromic material that does not contain impurities and has high transmittance, wherein the vanadium oxide thin film is formed by using a rapid thermal process (RTP) tech...
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WO/2023/096187A1 |
A method for manufacturing a fine metal mask by using dry etching according to the present invention comprises: a metal film attachment step of attaching a metal film to the top of a glass substrate; a photoresist laminating step of lami...
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WO/2023/095872A1 |
This sputtering device is provided with a cathode unit for emitting sputter particles toward a surface to be treated of a substrate on which a film is to be formed. The cathode unit has a target, a magnet unit, a magnet scanning unit, an...
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WO/2023/087577A1 |
The present invention relates to a nano-cutter coating and a preparation method therefor. The nano-cutter coating of the present invention comprises a cutter base body, and a transition layer, a support layer, an interface layer, and a f...
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WO/2023/089388A1 |
This invention deal with a flaky effect pigment comprising as optical active layer a single platelet consisting of a semiconductor material with a band gap in a range of 0.1 to 2.5 eV and having an average atomic composition of: a) Si(1-...
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WO/2023/091595A1 |
Medium to high entropy alloys and methods for producing the same are disclosed herein. In accordance with a first aspect, provided is a method for producing a medium to high entropy alloy. The method may comprise mixing a feed compositio...
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WO/2023/090275A1 |
The present invention provides a solid lubricant material which has high durability. This solid lubricant material has a material that has a hexagonal crystal structure. The ratio of planes other than the (002) plane to the (002) plane a...
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WO/2023/090249A1 |
In this sputtering target material comprising a sintered body of an oxide containing potassium, sodium, niobium, and oxygen, when the volume resistivity at 25ºC is less than 6.0×1011 Ω·cm, the Vickers hardness is 460 or greater and t...
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WO/2023/091196A1 |
Embodiments of substrate supports for use in substrate processing chambers are provided herein. In some embodiments, a substrate support includes: an upper assembly having a base plate assembly coupled to a lower surface of a cooling pla...
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WO/2023/090835A1 |
A plasma sputtering apparatus is disclosed. The plasma sputtering apparatus comprises: a target having a cylindrical shape and provided to be rotatable; a bar magnet arranged to correspond to the base of an imaginary isosceles triangle i...
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WO/2023/087310A1 |
Provided in the present application are a method for forming a hole transport layer on the surface of a substrate, and a hole transport layer, a solar cell and a preparation method therefor, and a photovoltaic module. The method for form...
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WO/2023/089813A1 |
The following are layered in an alternating manner in this superlattice structure: a first crystal layer (101) in which Ca2Fe2O with a brownmillerite structure serves as a unit lattice; and a second crystal layer (102) in which CaCuO2 wi...
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WO/2023/090957A1 |
The main objective of the present invention is to provide an electron-beam-assisted sputtering device and a method therefor, the device adding, as an electron supply means, an electron beam supply module to a conventional plasma sputteri...
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WO/2023/087205A1 |
Embodiments of the present application relate to the technical field of semiconductors, and provide vapor deposition equipment and a method for depositing a thin film, which can solve the problem that, when depositing a thin film by mean...
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WO/2023/091330A1 |
A composite includes a substrate and a target material, wherein the target material includes indium oxide (In2O3), tin oxide (SnO2), and gallium oxide (Ga2O3), and a method for making the same. The method includes positioning the substra...
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WO/2023/088130A1 |
Provided in the present invention is a semiconductor cavity. The semiconductor cavity comprises a cavity body, and a first shielding member and a liftable base assembly, which are arranged in the cavity body, wherein the first shielding ...
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WO/2023/090777A1 |
The present invention relates to a method for manufacturing a pellicle for extreme ultraviolet lithography. More specifically, the present invention relates to a method for manufacturing a pellicle for extreme ultraviolet lithography, th...
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WO/2023/090620A1 |
The present invention provides a cutting tool having a hard coating capable of satisfying various physical properties such as wear resistance, toughness, oxidation resistance, and heat crack resistance in a well-balanced manner. In order...
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WO/2023/087307A1 |
Provided are a preparation method for a perovskite thin film, and a perovskite thin film, a solar cell and a solar cell device related thereto. The preparation method comprises the following steps: (1) providing a target material contain...
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WO/2023/082855A1 |
A vapor deposition device capable of rotating and lifting in a reciprocating manner comprises a vapor deposition cavity, a base table, a base shaft, a telescopic assembly, a passive lifting and rotating component, a rotating mechanism an...
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WO/2023/082790A1 |
The present application relates to an anti-contamination device, an ionization cavity, and a radio frequency ion source. The anti-contamination device is applied to an ionization cavity of a radio frequency ion source, and comprises a su...
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WO/2023/082540A1 |
A light-emitting device, an aluminum nitride product, an aluminum nitride single crystal, and a manufacturing method therefor and the use thereof, which belong to the field of semiconductor materials. The manufacturing method for the alu...
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WO/2023/084932A1 |
The present invention provides a mask chuck device which is capable of holding a mask member and a substrate in close contact without a gap therebetween, without limitations on the constituent materials of the substrate, and a vapor depo...
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WO/2023/085527A1 |
The present invention relates to a method for manufacturing a separator. The method for manufacturing a separator according to the present invention, which is a method for manufacturing a separator used for a polymer electrolyte membrane...
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WO/2023/079857A1 |
Provided is a Fe-Pt-C-based sputtering target member which is prevented from the formation of particles during sputtering. The Fe-Pt-C-based sputtering target member has a magnetic phase containing Fe and Pt and a non-magnetic phase, the...
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WO/2023/077737A1 |
The present application discloses a carrier plate cleaning method and a use thereof, relating to the technical field of carrier plate cleaning. The carrier plate cleaning method comprises: S100, performing pre-coating treatment on a carr...
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WO/2023/080937A1 |
Methods and apparatus for generating a magnetic field external to a physical vapor deposition (PVD) chamber to improve etch or deposition uniformity on a substrate disposed inside of the PVD chamber are provided herein. In some embodimen...
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WO/2023/079771A1 |
This invention is provided with: a film formation chamber (11) for forming a film on a substrate (S), the film formation chamber (11) being capable of being depressurized and having a discharge gas introduced thereinto; a substrate holde...
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WO/2023/079584A1 |
A vapor deposition mask according to the present invention is provided with: a housing sheet (13); and a mask sheet (15) that is superposed on the housing sheet (13), while being provided with a plurality of opening parts (151, 152). The...
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WO/2023/079770A1 |
The present invention is provided with: a light source (42) that irradiates a substrate (S), which is arranged on a rotor (25), with light; a light-receiving unit (46) that receives light transmitted through a thin film layer, which is f...
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