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WO/2023/151812A1 |
A calibration assembly for a lithium deposition process is described. The calibration assembly includes a carrier, and a piezoelectric resonator coupled to the carrier. The calibration assembly is configured for being processed in the li...
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WO/2023/150882A1 |
Herein are described processes for and machines adapted for the production of lithium coated conductive substrates having conductive substrate planar surfaces. The process can include providing a lithium coated conductive substrate and t...
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WO/2023/149321A1 |
Provided is a sputtering device which can increase plasma density near a target. A sputtering device (1) comprises: a target (Tr) which is disposed inside a vacuum container (2) and has a facing surface (Tr1) that faces an article to be ...
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WO/2023/149320A1 |
Provided is a sputtering device capable of increasing plasma density in the vicinity of the target. The sputtering device (1) comprises: a target (Tr) disposed inside a vacuum vessel (2) so as to face an object being treated (H1) that is...
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WO/2023/149339A1 |
Provided are: a surface treatment agent that exhibits superior long-term storage stability and is capable of forming a surface layer exhibiting superior light-resistance properties; an article that has a surface layer; and a production m...
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WO/2023/149340A1 |
Provided are: a surface treatment agent that exhibits superior long-term storage stability and is capable of forming a surface layer exhibiting superior acid resistance; an article that has a surface layer; and a production method for an...
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WO/2023/149007A1 |
An electroconductive film for a circuit substrate, comprising a base material and a laminate provided to at least one surface of the base material. The laminate has a thin-film copper layer and an anti-corrosion layer in the stated order...
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WO/2023/144223A1 |
The invention relates to a transparent substrate provided on one of its main surfaces with a stack of thin layers, said stack of layers consisting of the following layers starting from the substrate: - a first dielectric module of one or...
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WO/2023/146232A1 |
Provided is a lateral type vacuum evaporation source comprising a rear heater disposed at a rear surface of a crucible in order to uniformly apply a temperature to an evaporation material inside the crucible. The lateral type vacuum evap...
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WO/2023/145950A1 |
The deposition mask according to the present disclosure comprises: a mask substrate containing silicon; a mask layer having a first surface and a second surface that is located on the opposite side from the first surface and that faces t...
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WO/2023/145497A1 |
The present invention provides a field effect transistor which comprises a base material that has a glass transition temperature of 250°C or less and an oxide semiconductor layer that is provided on the base material. The oxide semicond...
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WO/2023/144221A1 |
The invention relates to a transparent substrate provided on one of its main surfaces with a stack of thin layers, said stack of layers consisting of the following layers starting from the substrate: - a first dielectric module of one or...
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WO/2023/143952A1 |
The invention concerns a physical vapor deposition machine for depositing a coating onto at least one article, comprising: - an article support member disposed within a chamber and configured to receive a plurality of articles disposed t...
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WO/2023/143899A1 |
The invention relates to a method for coating a substrate (1), at least comprising the following steps: a) providing the substrate (1); and b) coating a surface (2) of the substrate (1) with a coating (3), wherein the coating process tak...
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WO/2023/145955A1 |
A mask according to the present invention comprises: a first layer which comprises a first surface, a second surface that is positioned on the reverse side of the first surface, at least one first opening that penetrates the first layer ...
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WO/2023/143719A1 |
A method of operating a coating system provided in a vacuum chamber is described. The coating system includes a coating drum for transporting a substrate, at least one electron beam gun for evaporating a coating material, and an electron...
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WO/2023/145440A1 |
The present invention provides a method for producing a novel electrical wiring line which is suited to the demands for weight saving and space saving, and which can be produced at a low cost. A method for producing a film wire, wherei...
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WO/2023/145951A1 |
A vapor deposition mask according to the present disclosure is provided with a silicon-containing mask substrate, a mask layer having a first surface and a second surface that is located on the opposite side from the first surface and th...
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WO/2023/143884A1 |
The invention relates to a transparent substrate (1000) provided, on one of its main surfaces, with a stack (1001) of thin layers, the stack (1001) of layers consisting of the following layers starting from the substrate (1000): - a firs...
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WO/2023/141967A1 |
An oxide semiconductor target and thin film, a thin film transistor, and a method for improving the stability and mobility of the thin film transistor. The oxide semiconductor target comprises a matrix oxide semiconductor material and po...
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WO/2023/145498A1 |
A sputtering target material according to the present invention is composed of oxides containing indium (In), zinc (Zn), and tantalum (Ta) such that the atomic ratios of the respective elements satisfy all of formulae (1) to (3). (1) 0.1...
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WO/2023/143857A1 |
The invention relates to a method for producing an MxAl1-xN-based thin film with a metastable cubic crystal structure exhibiting a high thermal stability allowing its use in high temperature applications, wherein M = Ti, V or Zr, wherein...
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WO/2023/143772A1 |
The present invention relates to a coating chamber and to a method for coating substrates with a distance detection for the substrates.
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WO/2023/145808A1 |
[Problem] To provide: a crystal having excellent shape memory properties and corrosion resistance; a multilayer structure, an electronic device and an electronic instrument each containing the crystal; and methods respectively for produc...
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WO/2023/145499A1 |
A sputtering target according to the present invention is formed by using a bonding material to bond a plurality of sputtering target members to a substrate. The sputtering target members are composed of oxides containing indium (In), zi...
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WO/2023/144222A1 |
The invention relates to a transparent substrate (1000) provided on one of its main surfaces with a stack (1001) of thin layers, said stack (1001) of layers consisting of the following layers starting from the substrate (1000): - a first...
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WO/2023/141145A1 |
Embodiments of the present disclosure generally relate to composite PVD target. The target has a diameter, a connection face, a substrate face opposite the connection face, a thickness between the connection face and the substrate face, ...
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WO/2023/138768A1 |
The invention is related to a method of using a thermal laser evaporation (TLE) system (100), the system (100) comprising a reaction chamber (10) fillable with a reaction atmosphere (14), one or more sources (30) arranged in the reaction...
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WO/2023/138769A1 |
The invention is related to a method of using a thermal laser evaporation (TLE) system (100), the system (100) comprising a reaction chamber (10) fillable with a reaction atmosphere (14), one or more sources (30) arranged in the reaction...
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WO/2023/141332A1 |
A method includes applying a bond layer of a first chemical composition to a first surface of a first metal body. The metal body is of a second chemical composition. The method further includes disposing a second metal body of the second...
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WO/2023/139214A1 |
An electrode for electrochemical applications is coated with a layer of a-C, wherein the layer of a-C comprises at least 10 each of first and second sub-layers, being • (i) first sub-layers having high conductivity with a sp2 content o...
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WO/2023/140536A1 |
This mask assembly comprises: a frame comprising long side portions each extending in a first direction and being spaced apart from one another in a second direction crossing the first direction, and short side portions which are connect...
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WO/2023/138625A1 |
The present invention provides a micro-channel matrix optical waveguide flat plate. The micro-channel matrix optical waveguide flat plate is formed by vertically overlapping two optical element groups; each optical element group is compo...
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WO/2023/141409A1 |
A method of manufacturing is provided. The method can include determining a cross- sectional shape of an object to be inspected using a sensor configured with a sensor coil. The method can also include providing a substrate having a prof...
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WO/2023/139957A1 |
In a case in which the capacitance of a capacitance element that is provided to an antenna is increased, a current is made to flow sufficiently evenly to each second electrode of said capacitance element. An antenna (3) comprises an ante...
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WO/2023/138767A1 |
The present invention relates to a temperature control system (10) for adjusting a temperature (60) of a vacuum chamber (102), the temperature control system (10) comprising conduits (20) which can be thermally coupled to a chamber wall ...
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WO/2023/140105A1 |
The present invention provides an article comprising an intermediate layer positioned on a substrate, and a surface treatment layer which is positioned on the intermediate layer and formed from a surface treatment agent including a fluor...
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WO/2023/139347A1 |
The invention relates to a method of depositing a coating layer comprising a step of sputtering a target comprising silicon, aluminium and samarium under an atmosphere comprising a noble gas, oxygen and nitrogen to form the coating layer...
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WO/2023/136096A1 |
This holding device, which is for holding an object on a first surface of a disk-shaped first plate member, comprises: the first plate member having the first surface and a second surface provided at the side opposite to the first surfac...
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WO/2023/136144A1 |
Provided are: a surface treatment agent from which a surface layer having excellent friction durability can be formed; an article having the surface layer; and a method for manufacturing the article. A surface treatment agent accordin...
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WO/2023/136546A1 |
Provided are a mask, a mask assembly including the mask, and a substrate transport equipment including the mask. The present invention includes a mask including a frame including an opening, an accommodation structure disposed on the fra...
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WO/2023/136212A1 |
A surface-coated cutting tool wherein: 1) a coating layer includes a layer in which layer A and layer B are alternately laminated; 2) layer A is represented by Al1-aTiaN (0.30≤a≤0.70); 3) layer B is represented by Cr1-cM2cN (M2 is at...
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WO/2023/136143A1 |
Provided are a surface treatment agent capable of forming a surface layer having exceptional friction durability, an article having the surface layer, and a method for producing the article. The surface treatment agent according to the...
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WO/2023/134484A1 |
Provided in the embodiments of the present application is a coating apparatus, which can form a high-precision pattern coating on a base film, thereby improving the performance of an assembly (such as a current collector) comprising the ...
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WO/2023/132144A1 |
The present disclosure addresses the problem of providing an oxide film having a low carrier concentration and high carrier mobility, and an oxide sputtering target suitable for forming said oxide film. Provided is an oxide film containi...
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WO/2023/131379A1 |
The invention relates to a method for producing at least one photoactive layer of a layer system of an organic electronic component, wherein, when the at least one photoactive layer is being applied, energy is introduced into the at leas...
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WO/2023/132276A1 |
Provided are: a composition capable of forming a surface layer having excellent lubricity; a method for producing the composition; a coating liquid; an article; and a method for producing the article. This composition contains two or m...
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WO/2023/132130A1 |
This surface treatment device (10) is for forming a film on a surface of a material to be treated (W) in a chamber (20), said device comprising: an HCD electrode (210) (electrode) (or a sputtering electrode (220) (electrode)), which is a...
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WO/2023/131099A1 |
The present invention provides a method, device and system for preparing a composite metal foil. The device comprises: primary and secondary double-sided coating modules (10, 20) which are arranged spaced apart. The primary double-sided ...
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WO/2023/126387A1 |
The invention relates to a nuclear fuel cladding produced with a substrate (14), which is made of pure zirconium or of a zirconium-based alloy, and a multilayer protective coating (16), which covers a surface (14B) of the substrate (14),...
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