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WO/2023/058890A1 |
An embodiment of a fine metal mask may comprise: a base sheet, a mask sheet which is formed on the base sheet and has pattern regions in which cells are formed, and cut regions formed between the base sheet and the mask sheet, wherein th...
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WO/2023/058706A1 |
The present invention aims to provide at least either: a laminate comprising a silicon substrate that comprises a gallium nitride that has higher crystallinity than a laminate comprising a silicon substrate comprising conventional galliu...
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WO/2023/057656A1 |
The invention relates to a new kind of electrocatalyst to be incorporated as part of the electrodes, anode and cathode, in water electrolysers aimed for hydrogen production through the electrochemical splitting of water into oxygen and h...
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WO/2023/057706A1 |
This device for heating a substrate (2) in a vacuum chamber for multilayer deposition on said substrate (2) comprises a heat source (5) intended to be in contact with the substrate (2), a support (6) for the heat source (5), a thermal in...
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WO/2023/057464A1 |
It is an object of the invention to provide a decontamination bath for decontaminating plastic articles comprising a contaminant, wherein the decontamination bath comprises - water, - a non-polar organic solvent component, - optionally a...
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WO/2023/058507A1 |
Provided is a sputtering apparatus comprising: a placement table on which a target material that is manufactured in a treatment container and that is made of a low melting point metal or a low melting point alloy is to be placed; a holdi...
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WO/2023/059405A1 |
Apparatus and methods for flipping substrates in vacuum between PVD sputtering of each side for increasing throughput are provided herein. In some embodiments disclosed herein, a module of a processing system for flipping a substrate in ...
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WO/2023/058698A1 |
This sputtering target contains crystal grains, contains 3 vol% or less of an amorphous phase, and contains at least one metal selected from the group consisting of chromium, molybdenum, and chromium-molybdenum alloys.
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WO/2023/059071A1 |
The present invention provides a molybdenum oxide sintered compact exhibiting excellent low reflection, chemical resistance and heat resistance, a thin film using the sintered compact, a thin film transistor comprising the thin film, and...
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WO/2023/051514A1 |
Provided in the present application is a manufacturing method for an aluminum-scandium alloy target material with a high scandium content. By mixing an Sc powder and an intermetallic compound Al3Sc powder, the powder sintering temperatur...
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WO/2023/053340A1 |
This hard coating 32 comprises: a first layer 34 provided on the surface of a base material 30; and a second layer 36 provided on the surface of the first layer 34. The first layer 34 is composed of AlCrαN, and the second layer 36 is co...
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WO/2023/051496A1 |
The present application discloses a semiconductor processing device and a wafer processing method. The semiconductor processing device comprises a processing chamber, and further comprises a heating chamber in communication with the proc...
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WO/2023/054044A1 |
This surface treatment device comprises: a treatment target material placement part (50) (placement part) for placing a treatment target material (W); a load lock chamber 55 (first accommodation unit) which accommodates the treatment tar...
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WO/2023/053380A1 |
The present invention addresses the problem of providing a sliding member covered with a DLC coating with which microfractures in a sliding surface due to development of cracks are less likely to occur, and an increase in abrasive wear c...
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WO/2023/054420A1 |
Provided is an optical laminate in which at least two layers of optical functional layers that transmit visible light are laminated, the optical laminate being characterized by including: a first functional layer which contains at least ...
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WO/2023/055653A1 |
Some embodiments relate to articles having removable coatings. The articles may comprise a substrate and a coating on the substrate. An etch stop layer may be provided between the substrate and the coating to permit removal of the coatin...
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WO/2023/054028A1 |
An electromagnetic wave reflection sheet (1) comprises a substrate (2) and an electromagnetic wave reflection layer (3) sequentially toward one side in the thickness direction. The electromagnetic wave reflection sheet (1) has a transmit...
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WO/2023/047948A1 |
[Problem] To provide an optical product that is less susceptible to cracking due to heat although having a microrelief structure, and has more excellent heat resistance, and a manufacturing method capable of easily creating the optical p...
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WO/2023/045788A1 |
Provided in the present invention are an electrostatic chuck and a semiconductor processing apparatus. In the electrostatic chuck, a gas channel structure comprises an annular gas channel, a primary gas channel group and a secondary gas ...
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WO/2023/046820A1 |
The present invention relates to a coated article comprising a coated surface, the coated surface consisting of a substrate and a coating system, the coating system comprising at least one protective layer consisting of one or more trans...
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WO/2023/048346A1 |
The present invention comprises the steps of: (S11) forming a mold for forming a microneedle polymer layer; (S12) imprinting each of a working electrode, a counter electrode, and a reference electrode on the mold by using acrylic or PLA;...
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WO/2023/047995A1 |
In this sputtering deposition source, a magnetic circuit comprising permanent magnets (22a, 23a) and a yoke (24a) and a magnetic circuit comprising permanent magnets (22b, 23b) and a yoke (24b) are provided on the respective back surface...
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WO/2023/048139A1 |
The purpose of the present invention, relating to lanthanide boride, which is known as a low work function material, is to provide a novel low work function material with low chemical reactivity, in particular a low work function materia...
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WO/2023/045042A1 |
A method for preparing a layered double hydroxide (LDH) film on the basis of in situ conversion of a co-sputtering intermediate film. The method comprises the steps: S1, co-depositing two or more metals onto a surface of a substrate mate...
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WO/2023/045352A1 |
The present invention provides a multi-stage structural membrane for a biomedical use, comprising: a structure composed of Ti, Zr, and Ta, 3 to 4 layers, and a substrate being a titanium alloy. The prevent invention has the advantages th...
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WO/2023/045051A1 |
A sputtering deposition device and method. The device comprises a cavity (25), a plurality of target guns (24), an inert gas supply system (30), and a second gas supply system (32), wherein the target guns (24) are located in the cavity ...
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WO/2023/045835A1 |
Disclosed is a preparation method for a metal compound film, comprising: step 1: placing into a reaction chamber a tray carrying a wafer onto which a film is to be deposited, the tray being located above a base; and step 2: introducing a...
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WO/2023/045190A1 |
The present invention provides a shielding device and a semiconductor process apparatus. The shielding device is configured to shield a base arranged in a process chamber of the semiconductor process apparatus. The base is configured to ...
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WO/2023/045052A1 |
A high-throughput thin film deposition device and thin film deposition method. The device comprises a cavity, a stage (44), a target gun (41), a first gas supply system (45), and a second gas supply system (46). The cavity comprises a sp...
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WO/2023/043516A1 |
Magnet assemblies comprising a housing with a top plate each comprising aligned openings are described. The housing has a bottom ring and an annular wall with a plurality of openings formed in the bottom ring. The top plate is on the hou...
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WO/2023/041018A1 |
Provided is a sputtering target, comprising: a tubular liner, the axis of which is defined as the axial direction, the plane where the radial direction is located being perpendicular to the axial direction; at least one cylindrical targe...
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WO/2023/042849A1 |
A transparent electroconductive film (X) according to the present invention comprises a transparent resin substrate (10) and a crystalline transparent electroconductive layer (20) in this order in the thickness direction (D). The transpa...
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WO/2023/042733A1 |
A surface treatment apparatus (10) comprises: a chamber (20) (accommodating unit) for accommodating at least one workpiece (W); workpiece mounting parts (32a, 32b) (mounting means) for mounting the workpiece (W) so as to face outward and...
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WO/2023/042844A1 |
A transparent electroconductive film (1) comprising a substrate (2) and a crystalline transparent electroconductive layer (3) in this order toward one thickness-direction surface. The crystalline transparent electroconductive layer (3) c...
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WO/2023/043015A1 |
A magnetic field generation device, according to one embodiment, generates a magnetic field inside a chamber of a sputtering device. The magnetic field generation device may comprise: a housing which has an annular shape so as to surroun...
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WO/2023/041185A1 |
A mask frame support element for a mask frame support is described. The mask frame support element includes along a first direction, which is configured to extend along a side edge of a substrate, a protruding section configured to provi...
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WO/2023/042842A1 |
A manufacturing method for a transparent conductive film (3) comprises: a first step for preparing a long substrate (1); a second step for forming, in a vacuum atmosphere, a transparent conductive layer (2) on one surface in the thicknes...
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WO/2023/042777A1 |
Provided are a tool and the like excellent in abrasion resistance. A coated ultrafine grain cemented carbide drill 1 is produced by coating an ultrafine grain cemented carbide with a hard coating film by means of PVD or CVD, said coated ...
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WO/2023/040675A1 |
The present application relates to a method and apparatus for optimizing a process parameter of a film coating process, and a real-time film coating monitoring system. The method comprises: acquiring a target performance parameter of a f...
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WO/2023/042210A1 |
A method for coating a metallic surface by a graphene layer by depositing a graphene molecular precursor comprising a compound having an aromatic hydrocarbon component that is derivatized by a tethering group. The tethering groups react ...
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WO/2023/042841A1 |
This method for producing a transparent electroconductive film (3) comprises a first step for preparing a long and narrow substrate (1), a second step for forming a transparent electroconductive layer (3) on one thickness-direction surfa...
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WO/2023/042848A1 |
A transparent conductive film (X) according to the present invention comprises a transparent resin substrate (10) and a crystalline transparent conductive layer (20) in this order in the thickness direction (D). The transparent conductiv...
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WO/2023/041415A1 |
The present invention relates to a coated cutting tool (1) comprising a substrate (5) and a coating (6), wherein the coating (6) comprises a from about 0.5 to about 10 pm nano-multilayer (8) of alternating nanolayers of a first nanolayer...
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WO/2023/042843A1 |
A transparent conductive film (1) is provided with a base material (2) and an amorphous transparent conductive layer (3) in this order when observed toward one side in the thickness direction. The base material (2) has a second thermal s...
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WO/2022/231690A9 |
A multilayer coating including an adhesion layer; and a protective coating is disclosed. The multilayer coating can be applied to a portion of at least one of a base and a tip of an interface cone. A method of making a coated interface c...
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WO/2023/041017A1 |
Provided are a sputtering target and a method for manufacturing the sputtering target. The sputtering target comprises: a tubular liner tube, an axis thereof being defined as an axial direction, and a plane where a radial direction is lo...
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WO/2023/041263A1 |
The invention relates to a system and a method for the multi-step processing of planar substrates, more particularly planar glass substrates, on a substrate carrier, wherein a plurality of mutually spatially separated processing stations...
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WO/2023/042438A1 |
The present invention addresses the problem of providing: a light blocking film and a multilayer antireflection film, each of which has excellent light blocking properties, antireflection properties and chemical stability; a method for p...
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WO/2023/035955A1 |
A silver alloy target material. The silver alloy target material consists of silver, indium and scandium; in the silver alloy target material, the content of indium in percentage by mass is 0.2%-1%, the content of scandium in percentage ...
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WO/2023/038174A1 |
The present invention relates to an apparatus for forming a high-functional compound layer on the surface of a material by using ion injection, the apparatus comprising a first ion generator and a second ion generator, which are respecti...
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