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WO/2022/209094A1 |
Provided is an eyeglass lens that comprises a lens base material and an inorganic layer, and further comprises a metal-containing layer on the surface-side of the inorganic layer that is opposite the lens base material. The metal include...
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WO/2022/209093A1 |
A method for producing a spectacle lens, wherein the spectacle lens has a water-repellent layer, the water-repellent layer is formed as a film by a thermal vapor deposition method, the film formation by the thermal vapor deposition metho...
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WO/2022/209399A1 |
This multilayer body (10) is provided with a substrate (11) and an oxide site (13) that is positioned on the substrate (11). The oxide that constitutes the oxide site (13) has an apatite-type crystal structure which contains at least two...
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WO/2022/210563A1 |
This piezoelectric film has as a main component a piezoelectric material having a Wurtzite-type crystal structure, and has an additive element including Kr; the piezoelectric material contains, as positive elements, one component selecte...
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WO/2022/209170A1 |
[Problem] To provide a gallium nitride-based gallium sputtering target that has a low oxygen concentration, that is less likely to be broken during sputtering, and with which the rate of film growth by sputtering is high. [Solution] A sp...
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WO/2022/210438A1 |
This method for manufacturing a piezoelectric element includes: an angle adjustment layer formation step for forming an angle adjustment layer containing an amorphous oxide on one main surface side of a flexible base material by sputteri...
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WO/2022/210182A1 |
This method for manufacturing a piezoelectric film includes a piezoelectric film formation step for forming a piezoelectric film, in which at least two types of crystal films are layered onto an amorphous film. The piezoelectric film for...
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WO/2022/209104A1 |
The purpose of the present invention is to provide an optical laminate which exhibits high strength when peeling off an air-gap layer, an optical laminate production method, an optical member, an optical device, an optical member product...
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WO/2022/205271A1 |
A multi-metal nanoparticle stack structure, in particular, a structure having a high-catalytic-activity catalyst effect, mainly comprising a composite structure in which nanoparticles of two or more different metals are alternately stack...
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WO/2022/209779A1 |
The present invention pertains to an electromagnetic wave-transmitting metallic lustrous member that comprises: a base body; and a metal layer formed on the base body. The metal layer includes a plurality of portions that are at least pa...
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WO/2022/210395A1 |
A vacuum film formation device (100) comprising: a chamber (10) that is maintained in a vacuum state; a rotating drum (20) disposed in the chamber (10); an unwinding roll (21) from which a long film (40) is let out; cutting mechanisms (5...
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WO/2022/209587A1 |
Provided is a sputtering device for a multilayered optical recording medium capable of suppressing the occurrence of defects in a recording area. The sputtering device for a multilayered optical recording medium comprises an outer peri...
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WO/2022/209356A1 |
A sputtering apparatus (100) comprises a shutter (50) configured to be movable between a shutter closing position (50a) in which a film formation object (2) is shielded from a target (1) and a shutter retract position (50b) which is reac...
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WO/2022/206386A1 |
Disclosed are a high-throughput thermal evaporation thin film preparation device and an application thereof. The high-throughput thermal evaporation thin film preparation device comprises an evaporation cavity and a storage cavity; the e...
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WO/2022/206385A1 |
Disclosed in the present disclosure are a high-flux film preparation device in which crucible replacement is convenient, and the use thereof. The device comprises an evaporation cavity and a storage cavity, wherein the evaporation cavity...
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WO/2022/212108A1 |
A method for ion-assisted deposition of optical coatings. The method may include performing one or more pre-deposition processes. The method may include performing evaporation using an evaporation assembly of an ion-assisted deposition s...
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WO/2022/210428A1 |
A Cr-Si film, according to the present invention, includes chromium (Cr) and silicon (Si). The compositional range of the Cr-Si film is Cr/(Cr+Si)=0.25-0.75, and the TCR absolute value, in increments of 10℃ in a temperature range of 40...
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WO/2022/209105A1 |
The purpose of the present invention is to provide an optical laminated body configured such that a pressure-sensitive adhesive, an adhesive, and the like tend not to permeate into a void space in a void layer. In order to achieve the ...
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WO/2022/212697A1 |
A wheel fastener and method of forming a wheel fastener is provided. The wheel fastener has a fastener body comprising a threaded portion and an upper portion opposite the threaded portion. A load-bearing surface of the fastener body is ...
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WO/2022/209716A1 |
Provided are a piezoelectric element (1) and a method for manufacturing a piezoelectric element with which it is possible to achieve high breakdown voltage and drive stability without a decrease in piezoelectric characteristics. The pi...
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WO/2022/210575A1 |
This member with a film is provided with: a base material; and a film that is provided on at least a part of the base material, while being formed of an oxide, fluoride, oxyfluoride or nitride of a rare earth element. This member with a ...
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WO/2022/209717A1 |
Provided are: an inexpensive piezoelectric element (1), in which the deterioration of piezoelectric characteristics is suppressed; and a method for manufacturing a piezoelectric element. The piezoelectric element comprises, in the foll...
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WO/2022/202640A1 |
Provided is a transparent conductive film containing an alkali tungsten bronze. In a powder X-ray diffraction pattern, the alkali tungsten bronze shows a hexagonal crystal pattern, and there is no orthorhombic, trigonal, or pyrochlore ph...
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WO/2022/201853A1 |
Provided is a laminated body production apparatus which makes it possible to form a highly dense self-assembled monolayer on the surface of a substrate. More specifically, the laminated body production apparatus is provided with a vacuum...
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WO/2022/203677A1 |
A refrigeration system (100), particularly a closed-loop refrigeration system for cooling a vacuum chamber of a substrate processing system and/or capturing water vapor and/or other condensable substances is described. The refrigeration ...
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WO/2022/202729A1 |
This coated cutting tool is provided with a base material and a hard coating film. The hard coating film comprises: a layer b that is arranged on the base material; a layer c that is a multilayer film which is arranged on the layer b, an...
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WO/2022/203052A1 |
[Problem] To provide: a sliding member and a coating film which exhibit chipping resistance and abrasion resistance, has excellent peeling resistance (adhesiveness), and achieves smaller friction. [Solution] Provided is a sliding member ...
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WO/2022/204001A1 |
A plasma processing system used for reactive sputtering may include multiple dual magnetron sputtering (DMS) components. Each DMS component may include a power supply coupled with two electrodes that switch between operation as a cathode...
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WO/2022/156820A9 |
A composite multi-layer thin film structure deposited on a metal substrate, the method thereof are provided. The film structure includes a first thin film layer on a surface of the metal substrate including Al 2O 3 with a thickness rangi...
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WO/2022/202170A1 |
This gas barrier film is provided with an organic substrate and an inorganic transparent barrier layer provided on one side of the organic substrate, wherein the inorganic transparent barrier layer contains a barrier material as the prim...
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WO/2022/201986A1 |
Provided is an AIN single crystal substrate in which the occurrence of cracks is suppressed. This AIN single crystal substrate has a three-layer structure that, in terms of defect density, can be divided into a first layer, a second laye...
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WO/2022/202941A1 |
An electrode (1) comprises a base material film (2), a metal underlayer (3), and a conductive carbon layer (4). The ratio (O/C) of oxygen to carbon is less than 0.01, as measured using X-ray photoelectron spectroscopy, at a position 4.5 ...
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WO/2022/202715A1 |
An electrode (1) comprises, sequentially in the thickness direction, a resin film (2) and a conductive carbon layer (4). The conductive carbon layer (4) has an sp3 bond. The heat shrinkage factor of the electrode (1) when heated for one ...
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WO/2022/203320A1 |
Disclosed are a patterned thin film deposition apparatus and a method for forming a sublimable material film using same. The thin film deposition apparatus disclosed herein may comprise: a source container in which a source material for ...
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WO/2022/198814A1 |
Disclosed are a superhydrophobic modified film, a modification method, a triboelectric nanogenerator (TENG) composed thereof, and a preparation method. A PE film is sequentially etched and deposited by using an inductively coupled plasma...
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WO/2022/200906A1 |
Provided is a manufacturing apparatus capable of continuous processing of steps from machining to sealing of an organic compound film. This manufacturing apparatus is capable of continuously performing a light emitting device patterning ...
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WO/2022/200507A1 |
The present invention relates to a battery half-cell comprising a copper foil, a lithium anode layer deposited on a surface of the copper foil and a capping layer, preferably a conformal capping layer, deposited on the lithium anode laye...
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WO/2022/202381A1 |
The present invention provides: a piezoelectric film which has achieved a good balance between high withstand voltage and long-term reliability; a piezoelectric element; and a method for producing a piezoelectric film. A piezoelectric ...
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WO/2022/196431A1 |
A bottom-gate thin film transistor which comprises: a gate insulating film that is arranged on a gate electrode; an oxide semiconductor layer that is arranged on the gate insulating film; and a first electrode and a second electrode, whi...
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WO/2022/196555A1 |
A surface-coated cutting tool wherein a coating layer includes a layer in which a first layer and a second layer are laminated in an alternating manner with an average thickness of 0.1-10.0 μm. The first layer has an average thickness o...
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WO/2022/197796A1 |
Described are substrates that include high aspect ratio surfaces and non-high aspect ratio surfaces, at least two coatings, one coating at high aspect ratio surfaces and a second coating at non-high aspect ratio surfaces, and having fluo...
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WO/2022/194377A1 |
A method of depositing at least one material on a substrate is described. The method includes a first deposition including: sputtering from a first and a second rotary target through an aperture, the aperture being adjustable and having ...
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WO/2022/196637A1 |
The present invention provides a coated tool, a substrate of which is a cBN sintered compact in which the average particle diameter of cBN particles is 2.5-6.0 µm and the content thereof is 40-70 vol%, a coating layer having an R of 0.1...
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WO/2022/196435A1 |
The present invention is a thin-film transistor having an oxide semiconductor layer. The oxide semiconductor layer has a ZnGaO-based oxide in which the molar ratio of Zn with respect to the total of Ga (gallium) and Zn (zinc) is 35% incl...
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WO/2022/194547A1 |
According to various embodiments, a vacuum chamber body (151) can comprise: a plurality of chamber outer walls (151a to 151e) which peripherally surround a cavity (151h), of which a first chamber outer wall (151a) delimits the cavity (15...
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WO/2022/197723A1 |
Embodiments of methods and apparatus for reducing particle formation in physical vapor deposition (PVD) chambers are provided herein. In some embodiments, a method of reducing particle formation in a PVD chamber includes: performing a pl...
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WO/2022/196915A1 |
According to one embodiment of the present invention, provided is a method for preparing a low-loss hydrogenated amorphous silicon nitride that is transparent in visible light, comprising the steps of: providing a substrate; and depositi...
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WO/2022/191428A1 |
A sputtering target according to an aspect of the present invention may comprise a substrate; and an alloy target layer, disposed on the substrate, having an amorphous phase at a ratio of 98.0% or higher.
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WO/2022/190929A1 |
This transparent barrier film (1) is provided with a transparent polymer film (2) and a transparent oxide film (3) sequentially toward at least one side in the thickness direction. The transparent oxide film (3) contains zinc, tin and a ...
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WO/2022/192640A1 |
An optical device is provided. The optical device includes an optical device substrate having a first surface; and an optical device film disposed over the first surface of the optical device substrate. The optical device film is formed ...
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