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WO/2023/038016A1 |
A sputtering target is provided which enables manufacturing a heat assisted magnetic recording medium that has high saturation magnetization and few in-plane oriented magnetic grains. This sputtering target, for producing a heat assist...
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WO/2023/037077A1 |
The invention relates to a method for generating nanoparticles on the surface of a substrate, said method comprising: - a step of providing the substrate made of a material comprising at least one element from columns 4, 5, 13 and 14 of ...
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WO/2023/036200A1 |
The present application provides a thin film mask, comprising: a first layer and a second layer. The first layer and the second layer are laminated; the second layer comprises an adhesive film; the absorption coefficient of the first lay...
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WO/2023/037810A1 |
Provided are: a hard nitride-containing sputtering target that can prevent the occurrence of arcing during sputtering, caused by inclusion of relatively course zirconia particles, and can suppress the generation of particles during film ...
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WO/2023/038081A1 |
The purpose of the present invention is to provide a CoFeB alloy-based target material that reduces generation of particles during sputtering. Provided is a sputtering target material comprising an alloy containing Co and/or Fe, and B an...
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WO/2023/032041A1 |
A sputtering apparatus provided with a treatment chamber, a substrate holder for holding a substrate on a substrate-holding surface in a treatment space in the treatment chamber, a first target holder for holding a first target so that a...
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WO/2023/032582A1 |
A coated tool according to the present disclosure comprises a base and a coating layer positioned on at least a portion of the surface of the base. With the coated tool according to one aspect of the present disclosure, in a case in whic...
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WO/2023/033182A1 |
This λ-Ti3O5 film forming substrate comprises a support substrate and a λ-Ti3O5 film provided directly on the support substrate.
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WO/2023/030764A1 |
The invention relates to a method for joining a first component (1) with a second component (2) in order to form an assembly (12) of a process automation field device, having the steps of: - placing a first joint zone (4) of the first co...
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WO/2023/033067A1 |
A plasma-resistant laminate according to the present disclosure comprises a substrate, a membrane electrode formed on the substrate, and a dielectric layer formed on the membrane electrode, the substrate including sapphire, the dielectri...
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WO/2023/031551A1 |
The invention relates to a method for depositing a carbon-based material from a target onto a metal substrate, by ion-assisted cathode sputtering. According to the invention, the ratio between the flow of ions that is directed toward the...
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WO/2023/032721A1 |
The present invention relates to a substrate-holding device including a mask member, a biaser, and a contact part. A contact member is provided with an inclined surface, an extending surface, and an abutting surface. A substrate is posit...
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WO/2023/034479A1 |
A substrate carrier and a substrate assembly comprising the same are provided. The substrate carrier comprises an accommodation space; a guide unit disposed adjacent to the accommodation space; and a supporting unit disposed under the ac...
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WO/2023/034480A1 |
Methods and apparatus reduce defects in substrates processed in a physical vapor (PVD) chamber. In some embodiments, a method for cleaning a process kit disposed in an inner volume of a process chamber includes positioning a non-sputteri...
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WO/2023/032456A1 |
This oxide sintered body includes tin, tantalum, and niobium. The area fraction of pores per unit area of the oxide sintered body as observed in cross-section is no more than 1%. The maximum circle equivalent diameter of the pores of the...
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WO/2023/029908A1 |
The present application discloses a composite copper foil structure, a preparation method therefor, a copper clad laminate, and a printed circuit board. The composite copper foil structure comprises a copper foil core layer and a shell l...
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WO/2023/033001A1 |
A vapor deposition mask base according to the present invention is used to produce a vapor deposition mask for forming an organic EL element. The vapor deposition mask base is formed from an alloy containing iron and nickel, contains par...
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WO/2023/031278A1 |
The present invention provides a laser-printing method for forming a cell-laden hydrogel on a receiver substrate, and to an irradiation configuration comprising a donor substrate, a receiver substrate and a pulsed laser source for use in...
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WO/2023/033709A1 |
An apparatus and method for coating surfaces of optical elements, wherein the apparatus comprises: a body with a holder for holding an optical element in position for coating more than one surfaces of the optical element, wherein the hol...
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WO/2023/031558A1 |
The invention relates to a metal part comprising a metallic substrate (S) having an outer surface coated with a layer of carbon-based material (M). According to the invention, the layer of carbon-based material: - is of "DLC" amorphous c...
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WO/2023/025986A1 |
An inorganic thin film electroluminescent display element (20) having a layer structure comprising: a first dielectric layer (23), a luminescent layer (26), comprising a luminescent material, on the first dielectric layer, and a second d...
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WO/2023/027263A1 |
A sputtering apparatus for powder of the present invention may comprise: a processing chamber having a vacuum inside; a reactor provided in the processing chamber, being in communication with the processing chamber, and having a powder a...
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WO/2023/027304A1 |
The present specification discloses a cooking tool exterior material having improved durability, heat resistance, scratch resistance, and cleaning properties by forming a silicon-diamond like carbon (SiDLC) coating layer having silicon a...
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WO/2023/026720A1 |
The present invention comprises: a substrate that has a main surface having a diameter of three inches or more; and a piezoelectric film that is formed on the substrate and is formed from an alkali niobium oxide containing K, Na, Nb, and...
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WO/2023/025145A1 |
Provided in the present application is a unidirectional perspective film (10), comprising a first niobium pentoxide layer (11), a first silicon oxide layer (12), an absorption layer (13), a second niobium pentoxide layer (14) and a secon...
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WO/2023/024319A1 |
A vertical long pipe coating device, comprising a vacuum housing (10), a first target frame (20), a second target frame (30), a third target frame (40), and a workpiece frame (50). The vacuum housing (10) is provided with a first cabin d...
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WO/2023/025546A1 |
The present invention relates to a method for producing a vehicle pane (100) which is coated in regions, at least comprising the following method steps: (A) providing a laminated pane (1) with an outer surface (I) and an inner surface (I...
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WO/2023/027537A1 |
A room-temperature and atmospheric-pressure superconducting ceramic compound and a preparation method therefor are disclosed. The room-temperature and atmospheric-pressure superconducting ceramic compound and the preparation method there...
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WO/2023/024331A1 |
A three-chamber magnetron sputtering coating apparatus, the three-chamber magnetron sputtering coating apparatus comprising an operation mechanism, a transmission part, a front chamber (2) and a coating chamber (3). A plating piece is pr...
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WO/2023/024329A1 |
A workpiece transfer device for a vacuum magnetron sputtering coater. The workpiece transfer device for a vacuum magnetron sputtering coater comprises a mounting frame (10). A placement cavity (11) is formed in the mounting frame (10). A...
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WO/2023/024544A1 |
The present application discloses an antireflection film, a cover plate structure, and a manufacturing method for an antireflection film. The antireflection film comprises one or more antireflection units; a plurality of antireflection u...
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WO/2023/024321A1 |
Disclosed in the present utility model is a multi-chamber vacuum magnetron sputtering coating apparatus. The multi-chamber vacuum magnetron sputtering coating apparatus comprises an operating mechanism, a conveying part, a front chamber,...
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WO/2023/022368A1 |
Disclosed is a method for manufacturing an antibacterial film having antibacterial, antiviral, and deodorizing effects according to various embodiments of the present invention to achieve the above-described subject. The method may compr...
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WO/2023/022236A1 |
Provided is a composite material containing: a matrix of metal oxides; a fluororesin; and one or more types of metallic materials selected from the group consisting of In, Sn, and Bi.
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WO/2022/239009A9 |
This invention provides a process for the preparation of aluminum scandium nitride films. This invention further provides aluminum scandium nitride films and layers, and devices and systems comprising aluminum scandium nitride films.
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WO/2023/020461A1 |
Provided is a semiconductor process apparatus, comprising a first chamber (100), a second chamber (200), and a third chamber (300), wherein the first chamber (100) is connected to and in communication with the second chamber (200); the t...
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WO/2023/022230A1 |
A coated tool according to the present invention comprises a base material and a hard coating film on the base material. The hard coating film has a face-centered cubic lattice structure and is formed of a nitride or a carbonitride conta...
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WO/2023/020709A1 |
A method of depositing material includes sputtering from a first rotary target having a first magnet assembly having a first plasma confinement and with an aperture plate and sputtering simultaneously from a second rotary target having a...
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WO/2023/020874A1 |
The invention relates to a flat steel product comprising a steel substrate with an anti-corrosion coating of zinc or a zinc alloy provided on at least one side of the steel substrate. The anti-corrosion coating has zinc nanocrystals (19)...
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WO/2023/019549A1 |
Provided are a self-lubricating coated hob cutter for band saw blade milling teeth, a preparation method therefor, and an application thereof. The coated hob cutter comprises a cutter base, and also comprises a nitride bonding layer and ...
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WO/2023/022849A1 |
A method of forming a metal superlattice structure includes depositing, on a substrate, a layer of a first metal with face-centered-cubic (fcc) crystal structure. The method further includes depositing a layer of ruthenium (Ru) metal wit...
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WO/2023/018758A1 |
Sputtering machines and substrate holders for such systems are described which include one or more magnets apart from the magnets typical of sputtering guns. The added magnets produce a magnetic field bias which is a new means for contro...
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WO/2023/018600A1 |
A method and apparatus for thermal evaporation are provided. The thermal evaporator includes a flat crucible design, which provides an increased surface area for evaporation of the material to be deposited relative to conventional design...
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WO/2023/019068A1 |
A substrate preparation chamber is described herein. The substrate preparation chamber comprises an enclosure, a rotatable substrate support disposed within the enclosure, and an atmosphere replacement system coupled to the enclosure. Th...
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WO/2023/017667A1 |
This sputtering target is formed from multiple structural members including a target and a substrate. The multiple structural members include a first structural member and a second structural member that are layered together. The first s...
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WO/2023/018419A1 |
An apparatus includes a wall defining a boundary of an evacuated space and having a first side interior to the evacuated space and a second side exterior to the evacuated space, a first plate positioned on a first side of the wall and in...
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WO/2023/011509A1 |
Disclosed in the present application is a magnetron sputtering apparatus, comprising: a process chamber; a target material arranged at the top in the process chamber; a carrying base for carrying a wafer, the carrying base being arranged...
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WO/2023/010893A1 |
Embodiments of the present application provide a support bar and a web tensioning method. A first aspect of embodiments of the present application provides a support bar, the support bar comprising a support section and a precut section,...
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WO/2023/012345A1 |
Cooling device, layer deposition apparatus and method for cooling a cooling element. Therein, the cooling device comprises a cooling element having a cooling duct with an inlet and an outlet. With the inlet a compressed gas supply is con...
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WO/2023/011733A1 |
The present invention relates to a method of operating an evaporation system (30), in particular a thermal laser evaporation system (30), for a deposition of source material (32) onto a substrate (36), the system (30) comprising a reacti...
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