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WO/2023/214005A1 |
The present disclosure relates to a device for vacuum deposition systems, comprising: a movable main body, at least one deposition source mounted on the movable main body, at least one coating window associated with the at least one depo...
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WO/2023/213189A1 |
Provided in the embodiments of the present application are a semiconductor process device and a method for forming a stacked film structure. The method for forming a stacked film structure comprises: a first sputtering step, involving: t...
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WO/2023/213720A1 |
The present invention relates to a process for obtaining perovskite thin films from powders of inorganic and organic materials by vapour deposition, characterized in that the crucible used to heat the powders is pre-heated above their su...
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WO/2023/215529A1 |
A system and associated method are described. The system includes a controlled power supply for generating electrical pulses for a plasma discharge source. The controlled power supply includes an output pulse rail, a direct current power...
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WO/2023/208249A1 |
A preparation method for a molybdenum alloy tube target material, a molybdenum alloy tube target material, and an application, which belong to the technical field of powder metallurgy. The target material is prepared from raw material po...
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WO/2023/211160A1 |
The present invention relates to an electromagnetic wave shielding material and to a method for manufacturing same, the shielding material comprising: a base material; and a Zn-NiCr shielding layer coated on the surface of the base mater...
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WO/2023/209241A1 |
An arrangement (10) for holding substrates (SS) curved along a main extension direction is adapted to be received in a vacuum chamber (14) of a coating apparatus (12) vis-a-vis to an evaporation source (16), and comprises a hub portion (...
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WO/2023/210436A1 |
An antireflection film (10) has a transparent film base material (11), a hard coat layer (12), and an antireflection layer (13) in this order. The dimension change ratio in a first direction from before to after a heat resistance test of...
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WO/2023/209052A1 |
The invention relates to a transparent substrate provided, on one of the main surfaces thereof, with a stack of thin layers, said stack consisting of the following layers, starting from the substrate: - a first dielectric module of one o...
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WO/2023/208597A1 |
The present invention relates to a coated cutting tool comprising a substrate and a coating comprising a first, a second and a third layer, wherein i) the first layer is a (Ti, Al)N layer adhered to the substrate, said first layer having...
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WO/2023/207950A1 |
The present application discloses a magnetron apparatus and a magnetron sputtering device. The magnetron apparatus is used for acting on a target assembly to sputter particles. The magnetron apparatus comprises a first magnetron, a secon...
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WO/2023/211245A1 |
The present invention relates to silicon-coated antioxidant iron, silicon-coated antioxidant nickel, and manufacturing methods therefor. More specifically, the present invention relates to an antioxidant iron that includes a surface coat...
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WO/2023/210096A1 |
A film deposition device having an alignment means for aligning a substrate and a mask using a substrate mark provided to the substrate a mask mark provided to the mask, a bonding means for bonding the aligned substrate and mask, and a f...
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WO/2023/210606A1 |
The present invention achieves a hard coating, etc., exhibiting stable, high performance under a wide range of processing conditions. A hard coating (12) has a structure obtained by alternately laminating A layers (A1 to An) comprising A...
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WO/2023/208599A1 |
The invention relates to a wear-optimised saw blade (10), more particularly a linearly cutting saw blade (10) for a sabre saw or a compass saw, comprising a main body (12), on which at least one saw tooth (14) is arranged and/or formed. ...
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WO/2023/210464A1 |
A film deposition device according to one embodiment of the present invention deposits a film, through a mask that has one or a plurality of open regions provided in a mask foil joined to a frame-like mask frame, onto one or a plurality ...
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WO/2023/210308A1 |
A film structure (10) has a buffer film (12) formed on a substrate (11) and a metal film (13) formed on the buffer film (12). The substrate (11) is an Si (100) substrate or an SOI substrate containing an SOI layer obtained from an Si (10...
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WO/2023/204912A2 |
The present disclosure provides a method of processing a substrate within an ion beam system. The substrate has a top surface that has a plurality of features, an edge and a bottom surface. The substrate is placed on a wafer stage and an...
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WO/2023/203281A1 |
According to an aspect, there is provided a collimator for tilted c-axis thin-film deposition comprising a collimator body. The collimator body comprises an array of holes for limiting directions of deposition of particles. The collimato...
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WO/2023/204021A1 |
A compound containing at least one selected from the group consisting of polydialkylsiloxane residues and C10 or higher alkylene chains, a polyoxyalkylene chain, and a reactive silyl group; a composition and a surface treatment agent con...
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WO/2023/201766A1 |
An anti-corrosion and anti-fouling composite treatment method for the surface of an additive manufacturing metal part, comprising: 1, preparing a metal part base by using a selective laser melting method; 2, performing shot blasting trea...
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WO/2023/202793A1 |
An apparatus for coating a component. The apparatus includes a chamber. A first magnetron and a second magnetron are disposed within the chamber for supplying a coating material to a surface of the component. A component holder is dispos...
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WO/2023/204020A1 |
Provided are: a compound that contains a monovalent aromatic ring group having a substituted or unsubstituted aromatic ring having 4 to 16 carbon atoms, at least one partial structure selected from the group consisting of (A) a linear al...
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WO/2023/201841A1 |
An individual-film thickness measurement system (10) for a multi-layer film system. The measurement system (10) comprises a measurement box body (1) mounted on a substrate holder (30) inside a vacuum coating chamber (100) and capable of ...
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WO/2023/204762A1 |
An amphiphobic coating is provided. The amphiphobic coating comprises a polymeric substrate having an oxygen plasma-treated surface; a silicon dioxide layer comprising silicon dioxide nanoparticles disposed directly on the oxygen plasma-...
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WO/2023/203147A1 |
The invention relates to a coated cutting tool (1) comprising a substrate (5) and a coating (6), wherein the coating (6) comprises a from 0.5 to 15 µm monolithic layer (7) of (Ti,Al,Si)N with an average composition Ti1-x-yAlxSiyN, 5 0.5...
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WO/2023/204896A1 |
The present disclosure provides a method for increased target utilization within a sputtering system. A plurality of targets are provided wherein each target is operatively connected to a central axis. An ion beam is generated within the...
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WO/2023/204295A1 |
This light exposure method is a method for exposing a first resist layer located on a deposition mask base material to light. In the first resist layer, a region used for the formation of a single deposition mask by etching is a unit mas...
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WO/2023/197130A1 |
Disclosed are a multi-channel high-density ultra-narrow stretchable microelectrode, a method for preparing same, and use thereof. The method comprises the following steps: providing a flexible substrate comprising a stretchable area and ...
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WO/2023/199699A1 |
This substrate conveying device comprises: a series of conveyance rollers that support support surfaces of a conveyance body which holds a substrate, and that convey the conveyance body; and a measurement means for measuring changes in t...
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WO/2023/199722A1 |
An objective of the present invention is to provide an oxide semiconductor film capable of enhancing carrier mobility in a thin film transistor and stability relative to ambient temperature. An oxide semiconductor film according to one a...
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WO/2023/199668A1 |
This phase shift mask blank has: a substrate; and a first layer that is deposited on the substrate. The first layer contains zirconium (Zr), silicon (Si), and nitrogen (N). The transmittance of the first layer at a thickness at which a 1...
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WO/2023/197469A1 |
A high-conductivity corrosion-resistant amorphous/nanocrystalline composite coexisting coating, and a preparation method therefor and a use thereof. The preparation method comprises: using arc ion plating in combination with high-power i...
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WO/2023/199618A1 |
The purpose of the present invention is to provide a heat-resistant and wear-resistant coating, and a coated object coated with the coating as a tool such as a cutting tool or a die tool, etc. This coating is an AlCr oxidation-resistant ...
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WO/2023/195058A1 |
[Problem] To provide a film-forming device in which an anode part provided with a function for generating a magnetic field is positioned between a cathode part and an object being processed, whereby it is possible to reduce adhesion of p...
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WO/2023/194371A1 |
A viewport protection system (1) comprising a gas nozzle (4), wherein said gas nozzle (4) is adapted to provide a flow of a purge gas onto a viewport window (2), and an outlet channel (5) arranged in a direction facing away from said win...
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WO/2023/193300A1 |
Provided in the present application are a display substrate and a manufacturing method therefor, and an evaporation device. The display substrate has two first lap joint areas, and the display substrate comprises a light-emitting functio...
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WO/2023/195414A1 |
The purpose of the present invention is to provide an inexpensive transparent gas barrier film with excellent acid resistance. The present invention is a transparent gas barrier film that is a plastic film having, on at least one surface...
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WO/2023/187704A1 |
The invention relates to compositions containing chromium. In particular, the composition includes a chromium component, and an adhesive component admixed with the chromium component to form the composition. Furthermore, the invention ex...
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WO/2023/189870A1 |
A sputtering target comprising an oxide sintered body containing indium oxide as the main component, wherein the oxide sintered body has a contained hydrogen concentration of 5×1016 atoms/cm3 or greater, the atomic concentration ratio (...
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WO/2023/190230A1 |
According to an aspect of the present invention, provided is a photocatalyst member comprising a photocatalyst layer formed on a base material via a foundation layer, the photocatalyst member being characterized in that the foundation la...
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WO/2023/189159A1 |
A method for producing a spectacle lens having a substrate and a metal atom-containing layer disposed on the substrate, the method comprising forming the metal atom-containing layer on the substrate by electron beam deposition that radia...
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WO/2023/184634A1 |
The present invention relates to the field of optical thin films, mainly aims at a nodular defect for reducing an optical thin film damage threshold, and particularly relates to a method for improving a thin film laser damage threshold b...
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WO/2023/189535A1 |
Provided is an oxide sintered body containing: cubic MgO with Zn in solid solution; hexagonal ZnO with Mg in solid solution; and ZnGa2O4 with Mg in solid solution.
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WO/2023/186188A1 |
The invention relates to the technical field of rare metal and powder metallurgy, in particular to a molybdenum alloy target material, and a preparation method and application thereof. The target material comprises the following componen...
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WO/2023/190861A1 |
Provided is a vapor deposition mask in which thermal deformation is inhibited. An embodiment of the present invention is a vapor deposition mask 10. The vapor deposition mask 10 is provided with a resin layer 24 having a pattern of openi...
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WO/2023/186295A1 |
A deposition source (100) for depositing material on a substrate is described. The deposition source (100) includes a rotatable cathode (110) connected to a first drive (131). Additionally, the deposition source (100) includes a rotatabl...
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WO/2023/187630A1 |
The present invention relates to a method for manufacturing a vacuum coated paper, said method comprising: a) providing a paper substrate, wherein said paper substrate comprises 0.3-60 kg/ton of a humectant, based on the total dry weight...
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WO/2023/190869A1 |
An aluminum scandium nitride film according to the present invention contains aluminum, scandium and nitrogen, while additionally containing gallium. The crystal phase of this aluminum scandium nitride film may include a hexagonal crysta...
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WO/2023/184667A1 |
The present invention belongs to the technical field of micro-nano electronics. Provided are a tetrahedral structure compound doped Sb-Te phase change material and a phase change memory. The chemical formula of the Sb-Te phase change mat...
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