Title:
PLASMA SPUTTERING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2023/090835
Kind Code:
A1
Abstract:
A plasma sputtering apparatus is disclosed. The plasma sputtering apparatus comprises: a target having a cylindrical shape and provided to be rotatable; a bar magnet arranged to correspond to the base of an imaginary isosceles triangle inscribed in the circle of the cylindrical shape within the target, the bar magnet extending the longitudinal direction of the target and having both poles positioned at both end sides of the diameter of the circle to form a magnetic field outside the target; and a power supply device (not shown) which applies a voltage for sputtering to the target.
Inventors:
KIM SEONG BONG (KR)
Application Number:
PCT/KR2022/018034
Publication Date:
May 25, 2023
Filing Date:
November 16, 2022
Export Citation:
Assignee:
KOREA INST OF FUSION ENERGY (KR)
International Classes:
C23C14/34; C23C14/35; H01J37/34
Foreign References:
| KR20200051947A | 2020-05-14 | |||
| KR20210084383A | 2021-07-07 | |||
| KR20150069073A | 2015-06-23 | |||
| CN208748188U | 2019-04-16 | |||
| KR20110010780A | 2011-02-07 |
Attorney, Agent or Firm:
NAM, Gun Pil et al. (KR)
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