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WO/2023/244370A1 |
Embodiments disclosed herein include a semiconductor processing tool. In an embodiment, the semiconductor processing tool comprises a chamber, a pedestal in the chamber configured to secure a substrate, and a plasma source above the pede...
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WO/2023/241822A1 |
A method for operating a multi-beam particle microscope in an inspection mode of operation and an associated multi-beam particle microscope are disclosed. A detection unit comprises an image generation detection region with fixedly assig...
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WO/2023/242703A1 |
The present invention relates to a device for use with an electrical component, wherein the device is configured to surround at least a component portion of the electrical component at least partially around the axis thereby defining a r...
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WO/2023/244258A1 |
A remote plasma source (RPS) for generating etchants leverages symmetrical hallow cathode cavities to increase etchant rates. The RPS includes an upper electrode with a first hollow cavity configured to induce a hollow cathode effect wit...
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WO/2023/243063A1 |
The present invention displaces a positional relationship between a focus and a sample highly precisely and very fast.　This transmission charged particle beam device is a device that acquires a ronchigram of a sample 59 and performs ab...
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WO/2023/239431A1 |
A plasma processing system for cleaning a substrate is provided. The plasma processing system includes a process chamber that includes: a chamber body enclosing an interior volume; and a substrate support disposed in the interior volume....
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WO/2023/239541A1 |
A method for compressing a sensor-based signal is described. The method includes receiving the sensor-based signal and dividing the sensor-based signal into a plurality of portions. Each portion is generated according to a corresponding ...
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WO/2023/237277A1 |
Systems and methods of imaging a sample using a charged-particle beam apparatus are disclosed. The apparatus may include a charged-particle source configured to emit charged particles, the emitted charged particles forming a primary char...
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WO/2023/239512A1 |
An ion source with a crucible is disclosed. In some embodiments, the crucible contains a solid dopant material, such as a metal. A porous wicking tip in disposed in the crucible in contact with the solid dopant material. The porous wicki...
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WO/2023/238371A1 |
The present invention comprises a deflector (114) having an electron conversion electrode (141) that is positioned such that secondary electrons emitted from a specimen when irradiated with a primary electron beam collide therewith, a fi...
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WO/2023/237225A1 |
A multi-beam charged particle beam system and a method of operating a multi-beam charged particle beam system with higher precision is provided. The system and method is configured for an improved determination of an assignment of second...
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WO/2023/239400A1 |
Methods and apparatus for etching a substrate in a plasma etch chamber are provided. In one example, the method includes exposing a substrate disposed on a substrate supporting surface of a substrate support to a plasma within a processi...
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WO/2023/239574A1 |
A chuck system for supporting a substrate in a plasma processing chamber is provided. A base plate comprises a substrate support region and a shoulder surrounding the substrate support region. A protective coating is on a surface of the ...
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WO/2023/240003A1 |
A method performed within a plasma chamber. The method including providing a first power signal to an electrostatic chuck (ESC). The method including providing a second power signal to an edge ring. The method including measuring an ampl...
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WO/2023/239081A1 |
The present invention relates to a plasma chamber having a side gas feed for forming a swirl motion, the plasma chamber comprising: a housing having a seating portion on which a wafer is seated; and a side gas feed formed on a lateral su...
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WO/2023/238193A1 |
A charged particle beam device, which observes a sample by periodically irradiating the sample with a pulsed charged particle beam, comprises a control device that controls the irradiation of the pulsed charged particle beam and the dete...
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WO/2023/240026A1 |
A plasma CVD system for growing diamond and diamond-like materials includes a process chamber having an exhaust port that is coupled to an input of a vacuum pump. A plasma source generates a plasma in the process chamber. A cooling stage...
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WO/2023/239531A1 |
A substrate processing system includes a processing chamber including a dielectric window and a substrate support. A gas delivery device is located in the processing chamber between the dielectric window and the substate support. An indu...
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WO/2023/237667A1 |
A charged particle-optical device for projecting a plurality of charged particle beams along respective beam paths towards a sample location, the charged particle-optical device comprising: a charged particle-optical assembly configured ...
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WO/2023/239494A1 |
Described is a method for thermally protecting an electronic circuit. In at least one implementation, electronic circuit comprises at least a first component and a second component. In at least one implementation, method comprises measur...
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WO/2023/238287A1 |
The present invention improves the performance of an inspection device. Provided is, for example, an inspection device 100 comprising an electron detection element 30 and an X-ray detection element 40, wherein: the electron detection ele...
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WO/2023/239430A1 |
Embodiments provided herein generally include apparatus, e.g., plasma processing systems, and methods for the plasma processing of a substrate in a processing chamber. Some embodiments are directed to a waveform generator. The waveform g...
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WO/2023/237271A1 |
The invention relates to an annular device for generating accelerated electrons, comprising an annular housing (101), which delimits an annular evacuable space (102a; 102b) and has an annular electron exit window (104); at least one firs...
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WO/2023/239863A1 |
What is described is an equipment for plasma processing including: a pedestal configured to hold a wafer; concentric with the pedestal, a focus ring including an insulator, the focus ring being positioned close to an edge region of the w...
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WO/2023/239845A1 |
Disclosed herein are systems, methods, and devices processing feed material utilizing an upstream swirl module and composite gas flows. Some embodiments are directed to a microwave plasma apparatus for processing a material, comprising: ...
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WO/2023/239630A1 |
A method of processing a substrate that includes: loading the substrate into a plasma etch chamber, the substrate including a patterned hard mask layer and an underlying layer, the plasma etch chamber including: a chamber part having a s...
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WO/2023/235214A1 |
An isolation valve assembly is provided that includes a valve body having an inlet and an outlet, a sealing body disposed within an interior cavity of the valve body, and an actuatable closure element disposed within the valve body. The ...
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WO/2023/232382A1 |
Systems, apparatuses, and methods for adjusting distortion in images. Embodiments include obtaining a plurality of images; determining alignment differences between a plurality of features on the plurality of images and corresponding fea...
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WO/2023/235145A1 |
A multi-electron beam system that forms hundreds of beamlets can focus the beamlets, reduce Coulomb interaction effects, and improve resolutions of the beamlets. A Wien filter with electrostatic and magnetic deflection fields can separat...
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WO/2023/235441A1 |
An electron-beam device includes a laser and a photocathode film. The photocathode film has a front side and a back side and emits a plurality of electron beamlets when illuminated from the back side using the laser. The electron-beam de...
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WO/2023/231754A1 |
The present application relates to the field of semiconductor equipment, and disclosed thereby is a semiconductor process device. The semiconductor process device comprises a process pipe, a plurality of air intake pipes, and a plurality...
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WO/2023/232801A1 |
The invention relates to a device for holding a sample for use with an optical appliance, a system, a method for manufacturing a device and a method for holding a sample in an optical appliance. A device (10) for holding a sample for use...
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WO/2023/232257A1 |
A method for calibrating deflectors of a charged particle beam device, the deflectors deflecting a charged particle beam of the charged particle beam device based on device coordinates of the charged particle beam device, the method comp...
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WO/2023/234568A1 |
The present invention provides an apparatus for processing a substrate. The apparatus for processing the substrate comprises: a housing that provides a processing space therein; a plasma generating unit that generates plasma from a proce...
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WO/2023/232662A1 |
The current invention relates to an improved microfluidic device for protein/protein complex purification, as well as an associated methodology and system. In particular it relates to systems and methods for electron microscopy, preferab...
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WO/2023/231084A1 |
A gas distribution device (100), and a plasma treatment device and method. The gas distribution device (100) comprises several buffer portions (10), several controllable valves (50) and a controller (70). Each buffer portion (10) is conf...
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WO/2023/232282A1 |
A method for obtaining a sequence of cross-section images of a measurement site of a wafer parallel to one another, comprising the following steps: la) providing a focused ion beam (FIB) column and a charged particle beam (CPB) imaging c...
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WO/2023/232474A1 |
The present invention provides a method of processing data derived from a sample, comprising processing an initial data set of elements derived from a detection by a detector for calibration, the data set comprising elements representing...
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WO/2023/234178A1 |
A multi-charged particle beam drawing device of one embodiment of the present invention is characterized by comprising: a beamforming mechanism for forming multi-charged particle beams; a defect correction data creation circuit for using...
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WO/2023/232283A1 |
An improved alignment for magnetic lenses in a multi-beam particle microscope is disclosed. For this purpose, an electrically controllable mechanical alignment and fixing means with an actuator system is provided for at least one in part...
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WO/2023/232640A1 |
The present description relates to an electron beam device (100) comprising: - a treatment chamber (130) having a longitudinal direction (Z); - at least one electron beam source (110), each source being suitable for emitting an electron ...
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WO/2023/232626A1 |
A module (10, 10.1) for generating a pulsed microwave output signal and for controlling a microwave solid-state power amplifier module (110, 112, 114, 124, 126, 128) comprises a. An input member (S1), which has a microwave signal input (...
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WO/2023/232624A1 |
An RF combiner arrangement (2) comprises a multiplicity of signal paths (20), wherein each signal path (20) has a signal conductor (21), an input connection contact (22) for the hot-swappable connection of an amplifier module (3), and a ...
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WO/2023/233657A1 |
In order to increase the luminance of an electron beam emitted from a photocathode, the present invention irradiates a photocathode comprising a photoelectric film with a first pulsed light and additionally with a second pulsed light hav...
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WO/2023/235675A1 |
A method for performing a plasma etch process in a process chamber is provided, including: applying a source radiofrequency (RF) signal to a top electrode of the process chamber; applying a bias RF signal to a lower electrode of the proc...
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WO/2023/227424A1 |
A charged particle assessment apparatus for detecting defects in samples by scanning a charged particle beam across a sample; the apparatus comprising: a detector unit configured to output a digital detection signal of pixel values in re...
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WO/2023/227095A1 |
A coil structure for generating plasma, comprising at least one coil unit. Each coil unit comprises M coil groups, and M is an integer greater than or equal to 4; the M coil groups have the same structure and are connected in parallel to...
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WO/2023/229892A1 |
A component of a plasma processing chamber is provided. A yttria coating is formed on a surface of a component body, wherein the yttria coating is deposited by aerosol deposition and is annealed, wherein the yttria coating is at least 95...
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WO/2023/229857A1 |
Provided herein are approaches for optimizing a full horizontal scanned beam distance of an accelerator beam. In one approach, a method may include positioning a first Faraday cup along a first side of an intended beam-scan area, positio...
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WO/2023/224994A1 |
A substrate support assembly includes a plate structure and an insulator structure. The plate structure includes an upper plate and a lower plate. The lower plate includes a lower plate structure surface. The insulator structure is dispo...
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