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WO/2013/002745A1 |
Example embodiments relate generally to a substrate, information recording medium, information recording device and methods of manufacturing substrates for use in information recording mediums, said methods comprising the steps of polish...
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WO/2012/161998A1 |
A cleaning apparatus for a power driven buffing pad includes a wash plate mounted in a cleaning solution reservoir that provides agitating and cleaning contact with the pad mounted on an operating driver. The wash plate can be reciprocat...
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WO/2012/155385A1 |
A multi-carriage symmetrical numerically controlled coordinate grinding machine includes a base (100a,100b), a work table (110), upright posts, several carriages and a grinding head (140). The upright posts include a first upright post (...
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WO/2012/088145A2 |
The present disclosure relates to a process for the conversion of oxygen-containing hydrocarbons into long-chain hydrocarbons suitable for use as a fuel. These hydrocarbons may be derived from biomass, and may optionally be mixed with pe...
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WO/2012/076418A1 |
Grinding device (1) for mechanically grinding rotor blades (100) for wind power plants, having at least one industrial robot (30) and a grinding unit (10, 50, 70), which is guided by the industrial robot (30), wherein the grinding unit (...
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WO/2012/046614A1 |
Provided is a dressing device wherein the operation time required to change the position of a diamond dresser with respect to the center of a pivot is short, and a positioning error of the diamond dresser does not tend to occur. A config...
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WO/2012/043964A1 |
Disclosed is a preparation method of a CMP pad conditioner. The preparation method of a CMP pad conditioner comprises: the following steps: preparing a amorphous metal powder; and sintering the amorphous metal powder into a state in whic...
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WO/2012/037584A1 |
The aim of the invention is to resharpen a grinding tool, in particular a grinding wheel (1) that is provided for trimming the edges (5) of a glass panel (7). This is achieved in that a resharpening tool (21) is associated with the grind...
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WO/2012/040374A2 |
Superabrasive tools and methods for making and using the same are provided. In one aspect, for example, a CMP pad dresser includes a first monolayer of superabrasive particles disposed on and coupled to one side of a metal support layer ...
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WO/2012/032941A1 |
Provided is a gear grinding machine which can dress a grinding stone while a gear is held attached to the machine regardless of the size of the gear. To this end, the gear grinding machine (1) engages and mutually rotates a work (W) and ...
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WO/2012/013633A1 |
The invention relates to a dressing device (1) for a grinding wheel (2), including a sleeve (10) for laterally holding and guiding, along the horizontal axis (X) thereof, a corundum rod (3), a ram (11) for applying a constant pressing fo...
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WO/2012/009139A1 |
A cathodically-protected pad conditioner (100) for chemical mechanical planarization includes: an abrasive member (110) including a metallic substrate (112), a support carrier (120), and an anode (130) affixed to the peripheral edge (124...
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WO/2012/000426A1 |
A dressing head of a polishing pad includes a bearing block (6), a spindle (14), a protection cover (5), a press disc (3), an adaptive disc (19), a diamond disc (1) and a flexible ring (18). A flange (15) is installed at the lower end of...
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WO/2011/133386A2 |
Embodiments described herein use closed-loop control (CLC) of conditioning sweep to enable uniform groove depth removal across the pad, throughout pad life. A sensor integrated into the conditioning arm enables the pad stack thickness to...
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WO/2011/125246A1 |
Disclosed is a method for dressing a threaded grinding stone for internal gear grinding, by which a threaded grinding stone for grinding an internal gear can be dressed with a high degree of accuracy by using a dressing gear that has bee...
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WO/2011/096366A1 |
Provided is a glass substrate polishing method such that even if a plurality of batches are polished, reduction in the polishing processing rate can be restricted. Also provided is a glass substrate manufacturing method such that glass s...
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WO/2011/089761A1 |
The disclosed system includes a personal computer (10) having correction coefficients (α) for the correction of errors in the tooth profile and correction coefficients (β) for the correction of meshing positions, the correction coeffic...
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WO/2011/043225A1 |
A device for measuring tooth surface run-out comprises: a contact detector (44) which measures the run-out at the tooth surface of a dresser with respect to a grinding tooth surface formed on a helical grinding tooth (70) of a grinding t...
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WO/2011/043358A1 |
Provided is a method of making a barrel-shaped worm-like tool whereby a barrel-shaped worm-like tool capable of efficiently performing grinding without unequal wear can easily be made. The aforementioned method comprises making the barre...
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WO/2011/039838A1 |
Provided is a gear grinding machine the maintainability of which can be improved and which is capable of being miniaturized. More specifically, provided is a gear grinding machine wherein a threaded grinding stone (17) and a workpiece (W...
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WO/2011/030505A1 |
Provided is an inner circumference edge blade dressing method comprising a process wherein there is prepared a dressing block where a reference groove is formed in advance; a process wherein a selection is made as to which side (left or ...
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WO/2011/017356A2 |
An abrasive tool having a body including an abrasive portion having abrasive grains contained within a matrix material and porosity characterized by a bimodal distribution of pores including large pores having an average large pore size ...
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WO/2011/017154A2 |
A process is provided in which a metal chelating agent is dissolved in an aqueous or glycol-based cooling fluid to form a chelating solution with a chelating agent concentration. A silicon boule is cut with a saw to detach a silicon wafe...
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WO/2011/013516A1 |
A method for dressing a tool used for a method for machining an internally toothed gear, the method for machining an internally toothed gear being capable of, even if the grindstone of the tool has a regenerated grinding surface, machini...
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WO/2011/009046A2 |
An abrasive tool with flat and consistent surface topography for conditioning a CMP pad and method for making are disclosed. The abrasive tool includes abrasive grains coupled to a low coefficient of thermal expansion (CTE) substrate thr...
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WO/2010/147086A1 |
Provided is a grinding device with a simple configuration such that it is possible to easily dress a grind stone and which has a dressing mechanism that can be manufactured inexpensively. A dressing head (7) that attaches to a dressing t...
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WO/2010/135058A2 |
In one aspect, a process for roll grinding employs a grinding wheel that is porous and permeable. In another aspect, a process for grinding mill rolls includes dressing the grinding wheel as the wheel traverses the surface of a mill roll...
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WO/2010/128631A1 |
Disclosed is a semiconductor wafer polishing method for polishing the surfaces to be polished of semiconductor wafers by use of polishing pads (16, 17) provided on fixing plates by relative movement of the polishing pads and the semicond...
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WO/2010/110834A1 |
An abrasive tool including a CMP pad conditioner having a substrate including a first major surface, a second major surface opposite the first major surface, and a side surface extending between the first major surface and the second maj...
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WO2010109833A1 |
Provided is a dresser such as a dressing gear (1) used for dressing a gear-type grinding wheel for grinding a gear wheel, the dresser being provided with dressing teeth (3) with a module of m×N (where N is an integer of 2 or more), wher...
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WO/2010/073944A1 |
Provided is an internal gear grinding machine that is compact and can save the installation space by simplifying the dressing operation. The internal gear grinding machine has a spiral grinding tool (17) of barrel shape which is rotated...
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WO/2010/073943A1 |
Provided is an internal gear grinding machine that can save the installation space and prevent damages to a tool in case of troubles such as power outage by simplifying the dressing operation. The internal gear grinding machine has a spi...
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WO/2010/073823A1 |
A machine tool having a function of mounting and demounting a part and capable of working with the part mounted in position. In a machine tool (10) provided with a first main spindle (23) and a second main spindle (26), a dummy head (W2...
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WO/2010/067732A1 |
A grinding device for grinding an object to be ground in such a manner that a grinding tool and the object to be ground are moved while being pressed to each other and the object to be ground is ground by the grinding tool while a grindi...
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WO/2010/019774A2 |
A truing and dressing machine for profiling an abrasive wheel. The truing and dressing machine includes a truing wheel assembly for positioning the truing wheel relative to an abrasive wheel mounted on an abrasive wheel spindle. The trui...
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WO/2009/158507A2 |
A CMP pad conditioner including a substrate having a transparency window represented by an average internal transmittance of not less than about 90% over a wavelength range extending from about 400 nm to about 500 nm along a path length ...
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WO/2009/125835A1 |
A polishing apparatus (1) is provided with a rotating shaft section (5); a rotating table (6), which is arranged on the rotating shaft section (5) and holds a work (30) on an upper surface of the rotating table; a grindstone (3), which i...
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WO/2009/120036A1 |
Disclosed herein is a method of manufacturing a conditioning disc for a polishing pad, which can be used to more precisely machine a plurality of protrusions formed on the conditioning disc. The method includes forming a feedstock having...
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WO/2009/114413A1 |
The present invention relates to a composite material having non-planar geometries and edge-shaving surfaces comprising a CVD diamond coating applied to a composite substrate made from a ceramic material and a preferably unreacted carbid...
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WO/2009/104224A1 |
This invention provides a dresser for an abrasive cloth, which has a smaller abrasive grain diameter than the conventional dresser and has an abrasive grain spacing regulated in a predetermined range depending upon the abrasive grain dia...
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WO/2009/091140A2 |
A CMP pad conditioner is used in global planar izat ion of wafers for high integration of semiconductor devices. The CMP pad conditioner includes a frame fixing abrasive particles to prevent the abrasive particles from being detached fro...
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WO/2009/064345A2 |
A CMP pad conditioner is provided that includes a substrate having a surface and three dimensional structures protruding relative to the surface of the substrate. The three dimensional structures include CVD carbon-containing material se...
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WO/2009/058272A1 |
The present invention relates to methods of using amidoxime compositions for cleaning polishing pads, particularly after chemical mechanical planarization or polishing is provided. A polishing pad is cleaned of Cu CMP by-products, subseq...
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WO/2009/043058A2 |
A CMP pad conditioner comprises a plurality of abrasive segments. Each abrasive segment includes a segment blank and an abrasive layer attached to the segment blank, the abrasive layer including a superhard abrasive material, A pad condi...
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WO/2009/033315A1 |
An automatic adjusting device for brush washing for copper strip, which can efficiently enhance washing quality, is disclosed wherein an elastic member is mounted within a sliding cylinder, the elastic member within the sliding cylinder ...
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WO/2009/034523A1 |
According to the invention, as the grinding wheel (16) used for dressing the diamond wheel (7) is made of a softer material, it is necessary to periodically control the value of its radius. In order to do so, the position detector (21) m...
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WO/2009/025198A1 |
Provided are a dressing method which can dress a barrel worm-shaped tool to grind and work the tooth face of an internal gear, highly precisely, a dressing apparatus for the barrel worm-shaped tool, and an internal gear grinding machine....
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WO/2009/026419A1 |
A study of several key conditioner design parameters has been conducted. The purpose was to improve conditioner performance by considering factors such as wafer defects, pad life, and conditioner life. For this study, several key conditi...
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WO/2008/156078A1 |
An internal gear diamond dresser which can perform highly efficient high precision truing and dressing of a whetstone for grinding a tempered internal gear with high precision, is provided. An internal gear diamond dresser (1) having a t...
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WO2008002811B1 |
A method for cleaning a polishing pad is disclosed. In CMP and ECMP, a polishing pad must be conditioned to obtain good and predictable polishing results. During conditioning, debris is generated that must be removed to prevent processin...
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