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WO/2020/224808A1 |
The invention relates to an autofocusing method for an imaging device (2) (for semiconductor lithography) comprising an imaging optical unit (9), an object (3) to be measured and an autofocusing device (1 ) having a reflective illuminati...
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WO/2020/224882A1 |
Disclosed is a dark field metrology device comprising an objective lens arrangement and a zeroth order block to block said zeroth order radiation. The objective lens (OL) arrangement directs illumination onto a specimen (W) to be measure...
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WO/2020/212000A1 |
The present invention provides a method of providing a pulsed radiation beam for exposing a first object and a second object in a lithographic apparatus. The method comprising providing the pulsed radiation beam at a first frequency for ...
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WO/2020/207794A1 |
Apparatus for and method of measuring a parameter of an alignment mark on a substrate in which an optical system is arranged to receive at least one diffraction order from the alignment mark and the diffraction order is modulated at a pu...
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WO/2020/200664A1 |
An apparatus comprising: a position monitoring system configured to determine the position of the substrate with respect to a projection system configured to project a radiation beam through an opening in the projection system and onto a...
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WO/2020/193039A1 |
The invention provides a method of measuring an alignment mark or an alignment mark assembly, wherein the alignment mark comprises grid features extending in at least two directions, the method comprising: measuring the alignment mark or...
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WO/2020/182379A1 |
Methods and apparatus for estimating at least part of a shape of a surface of a substrate usable in fabrication of semiconductor devices. Methods comprise: obtaining at least one focal position of the surface of the substrate measured by...
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WO/2020/182488A1 |
A method to reduce sensitivity of a level sensor, arranged to measure a height of a substrate, to variations of a property of an optical component in the level sensor includes directing a beam of radiation toward a diffractive element an...
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WO/2020/178003A1 |
Disclosed is method of aligning a substrate within an apparatus. The method comprises determining a substrate grid based on measurements of a plurality of targets, each at different locations on a substrate. The determining step comprise...
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WO/2020/178008A1 |
Disclosed is an optical component, being configured to function as an optical frequency converter in a broadband radiation source device. The optical component comprises a gas cell, and a hollow-core photonic crystal fiber at least parti...
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WO/2020/173892A2 |
The invention relates to an object handling apparatus for handling a generally planar object, the object handling apparatus comprising: two support arms, at least one of the two support arms movable relative to other support arm generall...
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WO/2020/173654A1 |
Described herein is a method for determining measurement data of a printed pattern on a substrate. The method involves obtaining (i) raw images (402) of the substrate comprising a printed pattern corresponding to a reference pattern (401...
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WO/2020/173641A1 |
The invention provides an inspection apparatus for inspecting an object, the apparatus comprising: a measurement system configured to measure: - a first parameter of the object across an area of interest of the object, and - a second par...
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WO/2020/169357A1 |
An alignment method includes directing an illumination beam with a first polarization state to form a diffracted beam with a second polarization state from an alignment target, and passing the diffracted beam through a polarization analy...
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WO/2020/169419A1 |
A metrology system (400) includes a radiation source (412) configured to generate radiation (413), an optical element (414) configured to direct the radiation (415) toward a grating structure (418) comprising a non-constant pitch, and a ...
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WO/2020/170382A1 |
This surface position detecting device which determines the position information of a detected surface along an axis that intersects the detected surface comprises: a light emitting unit which emits a plurality of detection light beams w...
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WO/2020/167408A1 |
The present disclosure generally relates to photolithography systems, and methods for correcting positional errors in photolithography systems. When a photolithography system is first started, the system enters a stabilization period. Du...
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WO/2020/164904A1 |
A lithographic apparatus includes an illumination system to produce a beam of radiation, a support to support a patterning device to impart a pattern on the beam, a projection system to project the patterned beam onto a substrate (520), ...
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WO/2020/164851A1 |
Disclosed is a metrology apparatus for use in a lithographic manufacturing process. The metrology apparatus comprises a radiation source comprising a drive laser having an output split into a plurality of optical paths, each comprising a...
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WO/2020/156738A1 |
A method of determining a control parameter for a lithographic process is disclosed, the method comprising: defining a substrate model for representing a process parameter fingerprint across a substrate, the substrate model being defined...
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WO/2020/156274A1 |
Provided are an optical alignment apparatus and a photoetching system, which can be compatible with alignment and scanning of narrow marks, and can effectively improve scanning signal energy of the marks, suppress optical crosstalk betwe...
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WO/2020/151000A1 |
A digital double-sided photolithography or exposure system and a method. The system comprises: a first optical engine (110) used to expose a front surface of a substrate (910); a second optical engine (120) used to expose a back surface ...
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WO/2020/146175A1 |
Probe systems and methods for calibrating capacitive height sensing measurements. A probe system includes a probe assembly with a probe support body that supports a capacitive displacement sensor that terminates in a sensing tip relative...
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WO/2020/143294A1 |
A large-area nano-lithography system (100) and a large-area nano-lithography method. The large-area nano-lithography system (100) comprises a workpiece stage (10), a position feedback system (20), an interference optical system (30), and...
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WO/2020/141050A1 |
Disclosed is a metrology apparatus comprising an optical element configured to receive at or near a pupil plane of the metrology apparatus, at least first radiation comprising a first higher diffracted order and second radiation comprisi...
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WO/2020/126981A1 |
The present disclosure provides a method for focusing of an optical beam during projection onto a photo-sensitive resist, including passing a first stream of gas from a domain of a first pressure (210) through a constriction (220) to a d...
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WO/2020/124860A1 |
A coding method, a coding device and a coding system. Said method comprises: when a substrate (1) is transferred to an exposure machine (2), adjusting the substrate, so as to align an exposure alignment mark (11) on the substrate with th...
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WO/2020/124406A1 |
An alignment device, method and equipment for a double-sided exposure, which belongs to the technical field of printed circuit boards. The alignment device comprises: a positioning mark (11), a marking mark (12) and a position acquisitio...
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WO/2020/126257A1 |
Disclosed is an illumination system for delivering incoherent radiation to a metrology sensor system. Also disclosed is an associated metrology system and method. The illumination system comprises a spatial filter system for selective sp...
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WO/2020/126242A1 |
Disclosed is a method for determining a correction relating to a performance metric of a semiconductor manufacturing process, the method comprising: obtaining a first set of pre-process metrology data; processing the first set of pre-pro...
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WO/2020/126816A1 |
A method of applying a measurement correction includes determining an orthogonal subspace used to characterize the measurement as a plot of data. A first axis of the orthogonal subspace corresponds to constructive interference output fro...
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WO/2020/126810A1 |
An apparatus for and method of determining the alignment of a substrate in which a multiple alignment marks are simultaneously illuminated with spatially coherent radiation and the light from the illuminated marks is collected in paralle...
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WO/2020/119863A1 |
The problem addressed by the invention is that of providing a new option for processing planar workpieces (6), in which a particularly high throughput rate and improved precision can be achieved using merely one processing unit (4). The ...
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WO/2020/118937A1 |
A preparation method for a black matrix and a display device (20), comprising: providing a substrate (21) (S1); coating the upper surface of the substrate (21) with a layer of refractive index temperature control materials (S2); pre-baki...
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WO/2020/114829A1 |
A method of applying a measurement correction includes determining an orthogonal subspace used to characterize a first principal component of the measurement and a second principal component of the measurement, and rotating the orthogona...
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WO/2020/108861A1 |
A method for determining a layout of mark positions across a patterning device or substrate, the method comprising: a) obtaining (502) a model configured to model data associated with measurements performed on the patterning device or su...
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WO/2020/108417A1 |
A method for adjusting a measurement light path of a scribe line position of a grating ruling engine, and a system for the same, pertaining to the technical field of diffraction grating manufacturing. The method comprises: installing a c...
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WO/2020/101822A1 |
A method of aligning a plate containing a substrate is disclosed wherein multiple cameras with distinct fields of view are aligned with mark cells that are within the field of view of each of the multiple cameras. Tn one example embodime...
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WO/2020/086700A1 |
Methods, devices, and systems for forming atomically precise structures are provided. In some embodiments, the methods, devices, and systems of the present disclosure utilize a scanning tunneling microscope (STM) system to receive a samp...
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WO/2020/080372A1 |
Provided are: a molding method for forming a fine pattern where directions and positions are controlled for predetermined positions of a to-be-molded object; an imprint mold manufacturing method using the same; an imprint mold; and an op...
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WO/2020/074250A1 |
A detection system for an alignment sensor, and an alignment sensor and lithographic projection apparatus comprising such a detection system is disclosed. The detection system comprises at least one detection circuit; and a plurality of ...
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WO/2020/064290A1 |
An apparatus for measuring a position of a mark on a substrate, the apparatus comprising: an illumination system configured to condition at least one radiation beam to form a plurality of illumination spots spatially distributed in serie...
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WO/2020/064240A1 |
A level sensor system having a pneumatic sensor, a temperature sensor and a controller. The pneumatic sensor (10) has a reference outlet (100) for forming a reference gap (GR) with a reference surface (R) and a measurement outlet (200) f...
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WO/2020/057924A1 |
A radiation system comprising a radiation source and a radiation conditioning apparatus, wherein the radiation source is configured to provide a radiation beam with wavelengths which extend from ultraviolet to infrared, and wherein the r...
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WO/2020/059422A1 |
A substrate 10 with an alignment mark comprises a substrate 12, and an alignment mark 14 formed on a first main surface 12a of the substrate 12. The alignment mark 14 has a plurality of linear recessed sections 16. The recessed sections ...
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WO/2020/055086A1 |
An imprinting device applies pressure between a master substrate and a polymer film to transfer a pattern formed on the master substrate to the polymer film. The imprinting device includes a plurality of coils, and the surface of the mas...
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WO/2020/055540A1 |
A light source apparatus includes a gas discharge stage including a three-dimensional body defining a cavity that is configured to interact with an energy source, the body including at least two ports that are transmissive to a light bea...
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WO/2020/043582A1 |
An apparatus and system for determining alignment of a substrate in which a periodic alignment mark is illuminated with spatially coherent radiation which is then provided to a compact integrated optical device to create self images of t...
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WO/2020/038677A1 |
The invention provides a stage apparatus, comprising an object support comprising a ring shaped protrusion having an outer radius in a first plane, and configured to support an object with a radius in the first plane larger than the oute...
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WO/2020/038629A1 |
An apparatus for measuring a position of each of a plurality of alignment marks on a substrate comprising: an illumination system configured to direct a radiation beam from a radiation source onto the plurality of alignment marks on the ...
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