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WO/2013/086913A1 |
A detection method for a space imaging overlay and an array substrate are provided. The method comprises: photoetching to form a layer of thin film with a space imaging overlay mark; developing the space imaging overlay mark on the trans...
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WO/2013/085389A2 |
There is disclosed a chip die manufacturing system and method providing real- time overlay measurement and/or control. In use, an alignment mark (23) on a wafer comprises a patterned material (123) having a fluorescent frequency- shifted...
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WO/2013/056941A1 |
A lithographic apparatus comprising a support structure constructed to support a patterning device, the patterning device being capable of imparting an EUV radiation beam with a grating in its cross-section to form a patterned EUV radiat...
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WO/2013/039100A1 |
An alignment film having alignment material film applied to a film substrate is fed into a winding device for alignment exposure film after being wound around a back roll. The alignment film is held by the back roll, thereby smoothing ou...
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WO/2013/026361A1 |
A step photolithography device and a photolithography exposure method thereof. The step photolithography device includes: an illumination unit (1) for providing an exposure beam, a workpiece station (4) for supporting a base (7) to move ...
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WO/2013/020473A1 |
A post-development photoresist layer alignment and detection method, comprising: setting a light source parameter for the post-development photoresist layer alignment and detection, and setting the relative light intensity in the light s...
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WO/2013/021985A1 |
An alignment light source that emits light for alignment purposes is provided in an alignment device and is incorporated in a camera for example. The alignment light source emits alignment light coaxially with the optical axis of light d...
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WO/2013/018762A1 |
The present invention performs: a coordinate detection step for detecting the coordinates of a first observation point (14) and a second observation point (15) set in advance on the substrate (1) to be exposed, in order to observe displa...
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WO/2013/017924A2 |
The invention relates to a method for correcting misalignment of positions on a first wafer bonded to a second wafer, the method comprising the application (F4), to coordinates of each position, of a predetermined correction function for...
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WO/2012/160928A1 |
In the present invention, a sensor of a camera is used to detect alignment marks on a substrate and alignment marks on a mask, through a filter having a transmission region for long-wavelength light and a transmission region for short-wa...
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WO/2012/158025A2 |
The invention relates to a lithography system for processing a target, wherein the lithography system comprises a final projection system arranged for projecting a pattern on the target surface. The lithography system comprises a mark po...
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WO/2012/144905A2 |
The invention relates to a lithography system for processing a target, such as a wafer. The lithography system comprises a beam source arranged for providing a patterning beam, a final projection system arranged for projecting a pattern ...
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WO/2012/144903A2 |
The invention relates to a lithography system for processing a target, such as a wafer and a substrate for use in such a lithography system. The lithography system comprises a beam source arranged for providing a patterning beam, a final...
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WO/2012/144904A2 |
The invention relates to a substrate for use in a lithography system, said substrate being provided with an at least partially reflective position mark comprising an array of structures, the array extending along a longitudinal direction...
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WO/2012/140106A1 |
Lithography process comprising: a preparation step during which a layer of resist is placed on a substrate, a prior lithography step carried out in order to define at least one prior feature (112) in the resist layer, characterized in th...
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WO/2012/137866A1 |
An exposure method for exposing a substrate to exposure light, which includes: obtaining information pertaining to the deformation of a first portion of the outer edge region of the substrate which includes the edge; obtaining, on the ba...
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WO/2012/133903A1 |
Long wavelength light from a first light source and short wavelength light from a second light source are collected at a beam splitter, and this collected light is made to converge by a lens and is incident to a mask and substrate perpen...
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WO/2012/124517A1 |
[Problem] To provide an alignment means that maintains alignment accuracy with a bottom layer of a printed board with multiple layers for use in an electronic circuit, and which enables adjustment of the alignment of an electronic compon...
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WO/2012/109348A1 |
Contrast enhancement in a metrology tool may include generating a beam of illumination, directing a portion of the generated beam onto a surface of a spatial light modulator (SLM), directing at least a portion of the generated beam incid...
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WO/2012/089043A1 |
Disclosed are a backside registration apparatus and a method for determining the relative location relationship between a base (6) and a work station (24). The backside registration apparatus comprises an illumination apparatus (1) for e...
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WO/2012/087666A1 |
A vision system is provided to determine a positional relationship between a semiconductor wafer (16) on a platen (12) and an element (26) on a processing machine, such as a printing screen, on a remote side of the semiconductor wafer fr...
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WO/2012/073483A1 |
An alignment mark (AM) provided on a wafer (W) using an alignment system is imaged while a wafer stage is actuated on the basis of a measurement result of a position measuring system, and the position of the alignment mark (AM) is sought...
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WO/2012/071748A1 |
A liquid crystal panel exposure process using an exposure machine for manufacturing multiple liquid crystal panels is provided. The exposure process includes the following steps: exposuring a glass substrate (20) for manufacturing multip...
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WO/2012/063632A1 |
A side portion coating film (22) is formed on at least one of the side edge portions in the width direction of a film (2) by applying a colored firing material, a colored photocurable material or a colored ink thereto, said film (2) bein...
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WO/2012/063631A1 |
Provided is an exposure apparatus (1), wherein a first mark forming section (17) is provided in the upstream of the irradiation region of exposure light in the transfer direction of a member to be exposed (2), and a meandering detection ...
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WO/2012/059912A1 |
A template (6) suitable for characterizing an optical system is disclosed. The template has at least one alternating brightness pattern (62) along a pair of orthogonal directions (64, 66) over at least a portion of the template, wherein ...
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WO/2012/044077A2 |
The present invention relates to a light-exposure system, and more specifically relates to a light-exposure system comprising: a light-emitting unit; a film-conveying unit wherein a film makes close contact with the surface thereof and i...
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WO/2012/032903A1 |
A film exposure device (1) is provided with a draw-in mark forming unit (13) that forms draw-in marks (2a) at the leading part of a supplied film (2), such marks serving as reference for the initial position of a mask (12). A detection u...
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WO/2012/032904A1 |
In the present invention, a laterally situated exposure material membrane is formed in one or both of film base material feeding areas which are on both sides of the cross-wise direction of a film base material (20). An alignment mark fo...
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WO/2012/029449A1 |
Provided is an exposure apparatus, which can prevent a foreign material from entering between a microlens array and a substrate, and which can also prevent a microlens from being scratched due to the foreign material and abnormal closene...
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WO/2012/026927A1 |
Devices for leveling an object for patterning a substrate surface, including an array of scanning probe tips, are provided. A device may include a support structure adapted to mount an object, the object having a plurality of protrusions...
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WO/2011/147775A1 |
A substrate support unit adapted for a system for testing or processing of a substrate is provided. The substrate support unit includes a support table having at least one substrate carrier structure adapted to support a substrate, where...
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WO/2011/136848A1 |
An apparatus for leveling an array of microscopic pens relative to a substrate surface or measuring a relative tilting therebetween includes an actuator configured to drive one of the array or the substrate to vary a distance therebetwee...
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WO/2011/125401A1 |
Disclosed is an exposure method for sequentially exposing a predetermined pattern onto a pattern forming area of a substrate through a photomask while moving the substrate in a prescribed direction, said exposure method comprising: a ste...
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WO/2011/113682A1 |
A method of patterning a plurality of layers (L1, L2, L3, L4) of a work piece (2404) in a series of writing cycles in one or a plurality of write machines, the workpiece being deviced to have a number of N layers (L1, L2, L3, L4) and lay...
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WO/2011/111327A1 |
Disclosed is an alignment method that sets the distance between a substrate and a photomask to a prescribed exposure gap. The photomask is rectangular in shape and includes a first side and a second side in opposition to the first side. ...
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WO/2011/107564A1 |
A pattern generator includes: a writing tool and a calibration system. The writing tool is configured to generate a pattern on a workpiece arranged on a stage. The calibration system is configured to determine a correlation between a coo...
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WO/2011/104173A1 |
A lithographic apparatus includes two or more optical columns configured to project a beam on a target portion of a substrate, each of the two or more optical columns including one or more radiation sources (906) to provide the beam, and...
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WO/2011/104374A1 |
A method for patterning a workpiece in a direct write machine in the manufacturing of a multilayer stack, wherein a first circuit pattern (1304) comprising patterns for connection points is transformed according to determined fitting tol...
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WO/2011/104376A1 |
A method of patterning a plurality of layers of a work piece in a series of write machines, wherein errors due to different transformation capabilities of different machines are compensated by distributing the errors over the plurality o...
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WO/2011/104375A1 |
A method for patterning a second layer of a work piece in a direct write machine in the manufacturing of a multilayer system-in-package stack. The work piece having a first layer with a plurality of electrical components in the form of d...
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WO/2011/104372A1 |
A method for patterning a workpiece provided with dies in a direct write machine, wherein measurement data of positions of the dies in terms of location and orientation together with the workpiece location and orientation relative the wr...
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WO/2011/104373A1 |
An alignment method for the of patterning a work piece in a direct write machine, wherein a reference board provided with board reference features is used to coordinate calibration of a measurement station and a writing station against a...
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WO/2011/101184A1 |
A method produces at least one monitor wafer for a lithographic apparatus. The monitor wafer is for use in combination with a scanning control module to periodically retrieve measurements defining a baseline from the monitor wafer thereb...
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WO/2011/101187A1 |
A method controls a scanning function of a lithographic apparatus. A first alignment strategy is used. A monitor wafer is exposed to determine baseline control parameters pertaining to the scanning function. The baseline control paramete...
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WO/2011/099563A1 |
Disclosed is a substrate processing device provided with: a transfer unit that transfers a strip-shaped sheet substrate in a first direction; a plurality of processing units that process a plurality of sections that segment the sheet sub...
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WO/2011/097234A2 |
Apparatus for registering a printing plate includes a support surface. A first registration member provides an electrical signal to the printing plate when contact is established between the first registration member and a first edge of ...
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WO/2011/097144A2 |
A method for determining if a printing plate is registered. A support surface supports the printing plate. An electric signal travels along a path through the printing plate. A plurality of registration members includes a set of two or m...
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WO/2002/039794A9 |
A method of recording aligned images on two sides of a printed circuit board substrate, comprising: recording and image of an electrical circuit pattern on a first side of a printed circuit board substrate (804); forming an alignment pat...
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WO/2011/090057A1 |
Disclosed are: a substrate in which all of regions to be exposed to light can be irradiated with a light energy with high accuracy; and a light exposure method. Using a light exposure device (5) that is equipped with multiple light expos...
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