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WO/2024/068286A1 |
The invention relates to a mirror device, in particular for a microlithographic projection illumination system, having a mirror (20), a sensor apparatus (37, 39, 46, 47) and a control unit (38). The mirror (20) comprises a mirror body (2...
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WO/2024/067394A1 |
Disclosed in the present application are a preparation method for a patterned quantum dot thin film, and a photoelectric device and an electronic device. The preparation method comprises the steps of: forming a quantum dot film layer on ...
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WO/2024/070695A1 |
A colored composition comprising a colorant including a pigment, a polymerizable compound, a photopolymerization initiator, and one or more resins, wherein the resins include a resin having a graft chain having a polyester structure, the...
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WO/2024/072779A1 |
A mosaic overlay target may include two or more cell sets distributed across a sample, wherein each cell set includes one or more cells, where each cell set is oriented to have at least one of mirror symmetry with respect to a central ax...
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WO/2024/068345A1 |
The invention relates to a mirror device, in particular for a microlithographic projection exposure system, comprising a mirror (20), a sensor unit (41, 42, 44, 47, 49) and a control unit (38). The mirror (20) comprises a mirror body (23...
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WO/2024/066706A1 |
Disclosed is an apparatus for use in semiconductor production, specifically a heat treatment device. The device comprises a cooling unit (200), a heating unit (300) and a transfer unit (400). The cooling unit (200) comprises a cooling pl...
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WO/2024/070683A1 |
This film forming method includes: preparing a substrate having a resist film in the upper surface of which an opening is formed; supplying the substrate with a metal-containing gas that contains a metal, thereby causing the metal to per...
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WO/2024/070942A1 |
The present invention mainly addresses the problem of providing a composition which generates little development residue and by which it is possible to form a cured film having excellent adhesive properties and having excellent low refle...
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WO/2024/070845A1 |
The purpose of the present invention is to provide a highly sensitive photosensitive resin composition with which the amount of film reduction during alkaline development is reduced and exposure time can be shortened. The present inventi...
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WO/2024/068430A1 |
The invention relates to an arrangement (100), a method and a computer program product for system-integrated calibration of the facet mirrors (18, 19) of a microlithographic illumination system (20). Calibration beam paths (103, 104) lea...
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WO/2024/066848A1 |
Disclosed are a high-molecular-weight narrow-distribution PHS resin that is controllable and easy to produce on a large scale, and a preparation method therefor and use thereof. The preparation method for the PHS resin provided by the pr...
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WO/2024/073400A1 |
The present invention presents improved systems and methods for performing multi-photon lithography. A line-scanning temporally focused two-photon lithography (LS-TFTPL) technique is capable of patterning three-dimensional structures wit...
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WO/2024/070968A1 |
Provided are: an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin the polarity of which is increased due to acid activity, (B) a compound which produces an acid when irradiated with actinic rays or ra...
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WO/2024/070713A1 |
The present invention provides a resin composition which enables the achievement of a film having a low dielectric loss tangent, an insulating film which has a low dielectric loss tangent, and a method for producing an interlayer insulat...
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WO/2024/071131A1 |
This resist composition comprises: a resin component (A1) having a constituent unit (a01) derived from a compound represented by general formula (a0-1); and a fluororesin component (F1) having a constituent unit represented by general fo...
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WO/2024/070535A1 |
The purpose of the present invention is to provide a method for forming a resist pattern having excellent pattern rectangularity. Provided is a method for forming a resist pattern, the method comprising: a step for applying a resist unde...
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WO/2024/070756A1 |
This substrate processing method includes: a step (a) for performing wet development on a metal-containing resist of a substrate; and a step (b) for performing dry development on the metal-containing resist. The metal-containing resist i...
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WO/2024/070184A1 |
Provided is a transfer film which comprises a temporary support, a resin layer, and a protective film in the given order. The resin layer includes an alkali-soluble resin 1, an alkali-soluble resin 2 that is a compound differing from the...
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WO/2024/071380A1 |
A resin composition comprising a resin which is at least one resin selected from the group consisting of polyimides and precursors thereof and which has a side chain including a five- or more-membered cyclic structure, a polymerization i...
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WO/2024/072766A1 |
A system may include a controller for receiving one or more images of a metrology target including periodic features with one or more known pitches, pre-processing the one or more images using a decomposition technique to generate one or...
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WO/2024/070964A1 |
The present invention provides: an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) and a non-ionic compound (C), wherein the resin (A) has a repeating unit represented by general formula (A1) describ...
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WO/2024/071125A1 |
A resist composition comprises: a resin component (A1), the solubility of which in a developer solution is changed by the action of acid; and a compound (D0) represented by general formula (d0). In the formula: Ar is an aromatic ring; Xd...
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WO/2024/070348A1 |
Provided is a resin composition with which it is possible to form a pattern having a high aspect ratio. This resin composition contains (A) a resin, (B) an oxetane compound, and a photocation polymerization initiator, the (A) resin inclu...
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WO/2024/070963A1 |
The present invention provides a film production method involving applying, onto a base material, a photosensitive resin composition that includes (A) a resin, (C) a photopolymerization initiator, (D) a radical polymerization inhibitor, ...
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WO/2024/071344A1 |
This on-machine development type lithographic printing plate precursor comprises a support body and an image recording layer disposed on the support body. The image recording layer contains an electron-accepting polymerization initiator,...
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WO/2024/068194A1 |
The invention relates to an optical element (100, 200) for a projection exposure system (1), comprising a mirror body (104, 204), the mirror body (104, 204) having a mirror section (124, 224) with an optically active surface (102, 202) a...
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WO/2024/068686A1 |
The invention relates to a measuring device (400) for an optical system (300), comprising an input node (K1) for receiving a voltage (V2) dropping in the optical system (300); a capacitive voltage divider (410) which can be connected to ...
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WO/2024/070047A1 |
The present invention pertains to a light exposure device and a beam interval measurement method therefor, does not require an increase in stage movement strokes even when there are many light exposure heads, and can do so at a low cost....
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WO/2024/068138A1 |
A cooling device (200) for cooling a position-sensitive component (102) of a lithography system (1), comprising a cooling line (206) with a liquid chamber (218) for conducting a cooling liquid (112) to the position-sensitive component (1...
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WO/2024/061579A1 |
The invention relates to an assembly for annealing at least a portion of an optical element (Mx, 117) for semiconductor lithography, the assembly comprising - an optical element (Mx, 117) having an optically active area (24), and - a dev...
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WO/2024/061594A1 |
A holding device (61) serves for holding an optical component (62) having an optical surface with a polygonal border and having a cylindrical substrate body (38) with a cylinder lateral wall (39) with a polygonal cross section correspond...
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WO/2024/063025A1 |
A resin composition that comprises a resin having an ethylenically unsaturated bond-containing group, the resin being at least one resin selected from the group consisting of a cyclized resin and a precursor thereof and a polyamide, a ph...
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WO/2024/064071A1 |
Provided are patterning structure underlayers deposited between a. substrate and an imaging layer, the underlayers having chemically labile, activatable bonds useful in extreme ultraviolet lithography. Reactive moieties may be released f...
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WO/2024/064341A1 |
According to one aspect, the present disclosure relates to a system. The system includes a part, a plurality of actuators configured to over-actuate the part; and a controller configured to control the part using the plurality of actuato...
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WO/2024/061952A1 |
In a method for operating a projection exposure system (10) for microlithography, a mask (40) is repeatedly exposed with an exposure radiation (14) provided by an illumination system (20), and mask structures (42) are imaged on, in each ...
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WO/2024/061599A1 |
The invention relates to a guide arrangement for guiding a first and a second component (108.8, 108.2) of an imaging device with a first and second guide unit (109.1, 109.2), which function kinematically parallel to one another between t...
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WO/2024/061574A1 |
The invention relates to an assembly of an optical system, comprising at least one mirror with a mirror main body (200, 300), in which there is a fluid channel arrangement with at least one fluid channel (206, 306) through which a fluid ...
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WO/2024/061581A1 |
The disclosure relates to methods and apparatus for forming a patterned layer of material on a substrate. In one arrangement, a selected portion of a surface of a substrate is irradiated during a deposition process. The irradiation local...
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WO/2024/062998A1 |
Provided are: a polymer which mitigates sensitivity decrease caused by a decrease in energy application density in patterning performed by irradiation with strong particle beams or electromagnetic waves of particles and photon energy and...
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WO/2024/062934A1 |
The present invention addresses the problem of providing an active-ray-sensitive or radioactive-ray-sensitive resin composition from which a hole pattern having excellent resolution can be formed. The active-ray-sensitive or radioactive-...
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WO/2024/061572A1 |
An optical alignment system comprising an illumination system configured to condition a radiation beam to form a first off-axis monopole, a marker configured to diffract the first off-axis monopole to form zeroth and first diffraction or...
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WO/2024/061733A1 |
In a microlithographic projection exposure apparatus (1), the second facet mirror (14) of the illumination optical unit (4) is arranged in the region of the wafer plane (9), in particular below the wafer plane (9).
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WO/2024/062943A1 |
The present invention provides: an active-ray-sensitive or radiation-sensitive resin composition that, when used as a mask during an etching process, makes it possible to form a resist pattern in which the occurrence of defects in an etc...
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WO/2024/063977A1 |
A metrology system may include an optical metrology sub-system to generate optical metrology measurements of optical metrology based on features of the optical metrology targets associated with at least one optical pitch and an additiona...
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WO/2024/061736A1 |
A positioning system for an optical element such as an objective of a metrology apparatus (e.g., an overlay measurement apparatus used in a semiconductor manufacturing process) is described. The positioning system comprises a stage and a...
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WO/2024/063066A1 |
[Problem] To provide: an organopolysiloxane that has a good fine patterning property (including coatability), alkali solubility, and high energy ray curability and that forms a cured film having high transparency and adequate mechanical ...
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WO/2024/060362A1 |
Provided in the present disclosure are a super-resolution photoetching structure, a manufacturing method, and a pattern transfer method. The manufacturing method comprises: S1, forming a dielectric layer (2) on a substrate (1); S2, depos...
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WO/2024/061905A1 |
The invention relates to an optical assembly (102) for a projection exposure apparatus (1), comprising an optical element (126) and a mount (128) carrying the optical element (126), wherein the mount (128) comprises a mount lower part (1...
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WO/2024/061550A1 |
The present invention relates to the use of a metal and/or metalloid-comprising ketoacidoximate and/or a metal-compound- comprising ketoacidoximate as a functional metal and/or metalloid-comprising ketoacidoximate as a patterning agent i...
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WO/2024/063044A1 |
A composition for forming a silicon-containing resist underlayer film, the composition containing: polysiloxane as component [A]; an aromatic iodine compound as component [B]; and a solvent as component [C].
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