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WO/2024/044457A1 |
Exemplary methods of semiconductor processing may include forming a layer of silicon-containing material on a semiconductor substrate. The methods may include performing a post-formation treatment on the layer of silicon-containing mater...
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WO/2024/041182A1 |
The present application provides a ligand compound. The structure of the ligand compound is X-Y-L-(Z)n, wherein X is HOOC-, NH2-, HOOOP-, HSS-, or HS-; Y is at least one of a single bond, an aliphatic organic group, an aromatic organic g...
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WO/2024/043098A1 |
The present invention employs a resist composition containing: a base material component of which the solubility in a developing solution changes due to the action of an acid; and a compound represented by general formula (d0). In formul...
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WO/2024/043111A1 |
Provided is a photosensitive composition comprising particles A which have a refractive index of 1.6 or more, a photopolymerization initiator B, and a resin C, wherein the content of the particles A is 20 mass% or more with respect to th...
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WO/2024/042951A1 |
Provided is an acid generator that has superior solubility in cation-curable compounds. This acid generator includes: a salt (1) of a cation represented by formula (c-1) and a monovalent counter anion; and a salt (2) of a cation repres...
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WO/2024/043121A1 |
The present invention employs a resist composition including: a base material component, the solubility of said base material component in a developing fluid changing due to the action of an acid; and a compound represented by general fo...
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WO/2024/038810A1 |
The present invention provides a positive-type photosensitive composition capable of suppressing generation of foreign matter defects on a surface of an opening part and forming a pixel division layer and/or planarized layer with high th...
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WO/2024/039626A1 |
A method for patterning a radiation sensitive material on a substrate involves the development of a material on a substrate based on a latent image in the material with irradiated regions and non-irradiated regions to form a physically p...
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WO/2024/038007A1 |
Disclosed are two different block copolymer families having general structures (I) or (III), composition thereof, and the process of using these compositions for DSA; wherein B segment and B1 segment are polar block copolymer segments co...
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WO/2024/039499A1 |
A method of forming a semiconductor device, where the method includes receiving a substrate in a processing chamber, the substrate including a first patterned layer including a metal-based material; and with a gaseous etch process, trimm...
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WO/2024/038533A1 |
This light source unit comprises: a light source array in which a plurality of light source elements each having a light emitting unit that emits light are arrayed on a two-dimensional plane; and a magnification optical system that forms...
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WO/2024/037801A1 |
Disclosed herein is a stand-alone conditioning system for a fluid handling structure of a lithographic apparatus, comprising: an inspection system configured to inspect the fluid handling structure and to determine one or more different ...
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WO/2024/037837A1 |
Described a method and system for generating a mask pattern design for use in imaging of a pattern on a substrate using a lithographic apparatus. The methods include identifying an area located between two adjacent exposure fields in a l...
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WO/2024/036679A1 |
An anti-reflective coating composition, comprising an organic polymer. The organic polymer comprises a cross-linkable polymer. The cross-linkable polymer comprises a monomer unit formed by a monomer shown in Formula (I). Compared with th...
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WO/2024/038535A1 |
This lighting unit comprises: a first light source array (20A) in which a plurality of first light source elements each having a first light emitting section that emits light having a first wavelength characteristic is arranged; a first ...
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WO/2024/037849A1 |
The invention provides a superconductive (SC) magnet assembly for a planar motor, the superconductive magnet assembly comprising: - a two-dimensional (2D) array of SC coils configured to generate a two-dimensional spatially alternating m...
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WO/2024/037859A1 |
Photolithography. Perform source mask optimization SMO for a plurality of laser spectra. Generate training data by determining for each optimized source-mask-combination performance metrics such as EPE, CDU, LER, LWR, DOF, NILS for the d...
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WO/2023/205093A9 |
Embodiments of the disclosure relate to digital lithography system and related methods, the system including at least one light source configured to emit a light beam onto a substrate via a lens, at least one image sensor, configured to ...
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WO/2024/038538A1 |
This light source unit comprises: a plurality of light source elements that are two-dimensionally arranged on a surface of a fixation target; and protruding portions that protrude from the fixation target and that are each provided betwe...
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WO/2024/039574A1 |
A system for mask design repair may develop a simulation-based model of a layer thickness after one or more process steps for fabricating features on a sample, develop a transformed model of the fabrication process that emulates the simu...
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WO/2024/039498A1 |
A method of processing a substrate includes receiving a substrate including a photoresist film including exposed and unexposed portions, etching parts of the unexposed portions of the photoresist film with a developing gas in a process c...
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WO/2024/037710A1 |
A method of fabricating a semiconductor device includes providing a workpiece (200). The workpiece comprises a semiconductor structure (210), the semiconductor structure comprising a substrate (212) and a semiconductor component (214) ar...
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WO/2024/038814A1 |
The present invention pertains to a positive-type photosensitive resin composition which contains an alkali-soluble resin (A), a photosensitizer (B), and an ink repellent agent (C), and in which the ink repellent agent (C) has a monovale...
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WO/2024/038802A1 |
A problem addressed by the present invention is to provide an active light-sensitive or radiation-sensitive resin composition which is capable of forming a pattern that exhibits excellent resolution performance. In addition, the present ...
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WO/2024/039675A1 |
The present disclosure provides a range of printed materials comprising discrete layers or segment with distinct compositions, and which can collectively lend to high levels of strength, toughness, and break resistance, and these printed...
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WO/2024/038537A1 |
The purpose of the present invention is to, by inhibiting warpage or bending of a substrate on which light source elements are arranged, improve adhesion between the substrate and a heat sink and increase cooling efficiency. This light...
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WO/2024/034383A1 |
[Problem] To provide: a curable reactive organopolysiloxane having good alkali solubility; and a high energy ray-curable composition containing the same. [Solution] Provided is a phenolic hydroxyl group-containing branched organopolysilo...
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WO/2024/034438A1 |
Provided are an actinic ray-sensitive or radiation-sensitive resin composition, a resist film, a pattern forming method, and an electronic device manufacturing method comprising the pattern forming method, the resin composition containin...
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WO/2024/031747A1 |
A laser interference lithography system, which relates to the technical field of laser interference lithography. The system comprises: a laser device (1), an optical path system, a phase detection apparatus and a substrate (15), wherein ...
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WO/2024/033005A1 |
A method of training an inference model to determine one or more parameters of a product of a fabrication process from measurements of the product. The method comprises obtaining a dataset of measurements of one or more products of the f...
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WO/2024/034311A1 |
Provided are a semiconductor substrate production method and film forming composition which are capable of forming a film having excellent etching resistance and excellent embedding properties. This semiconductor substrate production met...
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WO/2024/033025A1 |
A beam metrology device for determining at least one characteristic of first radiation and/or at least one characteristic of second radiation, said second radiation being generated via a first nonlinear process upon receiving a first por...
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WO/2024/033036A1 |
Disclosed is a metrology method. The method comprises obtaining measurement data relating to measurement of at least one target using two or more different illumination profiles; and a respective parameter of interest value for a paramet...
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WO/2024/034637A1 |
Provided is a photosensitive colored resin composition having a high residual film ratio. The photosensitive colored resin composition is characterized by containing a coloring agent (A), a dispersant (B), an alkali-soluble resin (C), an...
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WO/2024/033020A1 |
A debris handling apparatus controls debris within a controlled-environment interior of a chamber of an extreme ultraviolet (EUV) radiation source in which produced EUV light is transmitted along an optical axis within the chamber interi...
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WO/2024/033320A1 |
A drive device (100) for driving at least one actuator (200) for actuating an optical element (310) of an optical system (4, 10), comprising an end stage (110), which is configured to boost an input voltage (V1) using a quiescent current...
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WO/2024/034384A1 |
[Problem] The present invention addresses the problem of providing: a curing-reactive organopolysiloxane which has good alkali solubility; and a high energy ray-curable composition which contains this curing-reactive organopolysiloxane. ...
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WO/2024/034608A1 |
Provided is a photosensitive resin composition which exhibits high light-scattering properties and high light transmission properties, can be developed, and exhibits high heat resistance. This photosensitive resin composition contains: r...
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WO/2024/034445A1 |
Provided are: a resin composition containing a compound represented by formula (1), particles, a resin, a polymerizable monomer having an ethylenically unsaturated bond-containing group, and a solvent; a film using said resin composition...
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WO/2024/035527A1 |
An overlay metrology target may include grating-over-grating structures formed from a lower grating structure with a first coarse pitch in a first sample layer and an upper grating structure with a second coarse pitch in a second sample ...
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WO/2024/032987A1 |
There is provided a fluid dispensing system including a fluid-permeable surface having a pre-defined permeability to allow permeation of a fluid, and a controller configured to control the rate of permeation of the fluid into a volume by...
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WO/2024/035261A1 |
The invention relates to a stamp for imprinting and a corresponding method for producing an imprinted substrate having a variable depth pattern, in particular by using a stamp according to the present invention. The invention enables the...
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WO/2024/034422A1 |
Provided is a resist composition containing a resin component (A1) having a constituent unit (a01) that is represented by general formula (a0-1) and a constituent unit (a10) that is represented by general formula (a10-1), and a compound ...
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WO/2024/033035A1 |
Disclosed is a metrology method. The method comprises illuminating a target comprising one or more sub-targets on a substrate using underfilled illumination such that an illumination beam profile underfills each of said one or more sub-t...
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WO/2024/033081A1 |
Device (200) for sensor-based measurement of chemical and/or physical properties of an adhesive layer (203) in an apparatus for semiconductor technology (100), comprising one first element (201) to be adhesively bonded, one second elemen...
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WO/2024/028374A1 |
A method of controlling a relief plate production system (10) comprising a plurality of production units, the method comprising the steps of: each of the plurality of production units (100, 100', 200) receiving a job instruction from a c...
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WO/2024/029354A1 |
Provided is a novel compound that has photosensitivity such that said compound rapidly decomposes and generates an acid when irradiated with light rays having a wavelength of 20 nm or lower. A sulfonium salt according to the present in...
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WO/2024/029204A1 |
The present invention addresses the problem of providing a colored curable resin composition comprising a resin, which has excellent adhesiveness or is useful for increasing the amount of colorant. The present invention relates to a co...
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WO/2024/030478A1 |
Apparatus for and methods of rapidly achieving a target peak wavelength separation in a system for producing laser radiation at more than one wavelength (color) in which one or more actuators control wavelength in response to being suppl...
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WO/2024/030211A1 |
Embodiments of methods are provided to form an EUV-active photoresist film for use in EUV photolithographic processes. The methods disclosed herein may generally include forming an extreme ultraviolet (EUV)-active photoresist film on a s...
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