Title:
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
Document Type and Number:
WIPO Patent Application WO/2024/034422
Kind Code:
A1
Abstract:
Provided is a resist composition containing a resin component (A1) having a constituent unit (a01) that is represented by general formula (a0-1) and a constituent unit (a10) that is represented by general formula (a10-1), and a compound (D0) having a group that is represented by general formula (d0-r). In the formulas, Rx01 and Rx021 to Rx028 are hydrogen atoms or the like. Ra0 is an acid-dissociable group that is represented by general formula (a01-r-1). Wax1 is an aromatic hydrocarbon group optionally having a substituent.
Inventors:
IWASHITA YUSUKE (JP)
SAITO AYA (JP)
YONEMURA KOJI (JP)
NAKAGAWA YUSUKE (JP)
SAITO AYA (JP)
YONEMURA KOJI (JP)
NAKAGAWA YUSUKE (JP)
Application Number:
PCT/JP2023/027625
Publication Date:
February 15, 2024
Filing Date:
July 27, 2023
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD (JP)
International Classes:
G03F7/039; C08F212/14; G03F7/20
Foreign References:
| JP2021063980A | 2021-04-22 | |||
| JP2016089085A | 2016-05-23 | |||
| JP2017044929A | 2017-03-02 | |||
| JPH1152575A | 1999-02-26 |
Attorney, Agent or Firm:
TAZAKI Akira et al. (JP)
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