PREPARATION METHOD FOR PATTERNED QUANTUM DOT THIN FILM, AND PHOTOELECTRIC DEVICE AND ELECTRONIC DEVICE

Title:

PREPARATION METHOD FOR PATTERNED QUANTUM DOT THIN FILM, AND PHOTOELECTRIC DEVICE AND ELECTRONIC DEVICE

Document Type and Number:

WIPO Patent Application WO/2024/067394

Kind Code:

A1

Abstract:

Disclosed in the present application are a preparation method for a patterned quantum dot thin film, and a photoelectric device and an electronic device. The preparation method comprises the steps of: forming a quantum dot film layer on one side of a substrate, wherein the quantum dot film layer includes a ligand remover and quantum dots with ligands connected to the surfaces of the quantum dots; then performing partial exposure processing on the quantum dot film layer to enable the quantum dot film layer to comprise an exposed part and an unexposed part; and then removing the unexposed part to obtain a patterned quantum dot thin film.

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Inventors:

ZHANG HAO (CN)
FU ZHONG (CN)
ZHOU LIKUAN (CN)

Application Number:

PCT/CN2023/120673

Publication Date:

April 04, 2024

Filing Date:

September 22, 2023

Export Citation:

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Assignee:

UNIV TSINGHUA (CN)
TCL TECH GROUP CORP (CN)

International Classes:

G03F7/20

Foreign References:

CN111781803A	2020-10-16
CN107043339A	2017-08-15

Other References:

ZHANG PING-PING: "Photolithography of Colloidal Quantum Dots for Display Applications", CHINESE JOURNAL OF APPLIED CHEMISTRY, vol. 38, no. 9, 10 September 2021 (2021-09-10), pages 1175 - 1188, XP093151974

Attorney, Agent or Firm:

PURPLEVINE INTELLECTUAL PROPERTY (SHENZHEN) CO., LTD. (CN)

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