Title:
SILICON-BASED PRECURSOR PURIFICATION METHOD AND PURIFICATION SYSTEM
Document Type and Number:
WIPO Patent Application WO/2024/087340
Kind Code:
A1
Abstract:
A silicon-based precursor purification method and purification system, relating to the field of electronic precursor purification. The method comprises the following steps: (S.1) dispersing an adsorbent in an ionic liquid to obtain adsorption slurry; (S.2) dissolving an industrial-grade silicon-based precursor in the adsorption slurry, so that the industrial-grade silicon-based precursor is in contact with the adsorbent, and metal ion impurities in the industrial-grade silicon-based precursor are adsorbed by the adsorbent; and (S.3) after the adsorption is finished, rectifying a crude silicon-based precursor to remove a light component and a heavy component in the silicon-based precursor to obtain an electronic-grade silicon-based precursor. By changing the environment of the silicon-based precursor in the purification process, the silicon-based precursor can be effectively separated from metal ion impurities mixed in the silicon-based precursor, so that adsorption of the metal ion impurities is facilitated; in addition, by using various means in combination, the physical or chemical adsorption effect on the metal ion impurities is improved.
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Inventors:
LIU YING (CN)
PEI KAI (CN)
ZHAO YI (CN)
SUN LIANGLI (CN)
LI XIAOTING (CN)
PEI KAI (CN)
ZHAO YI (CN)
SUN LIANGLI (CN)
LI XIAOTING (CN)
Application Number:
PCT/CN2022/138262
Publication Date:
May 02, 2024
Filing Date:
December 11, 2022
Export Citation:
Assignee:
DALIAN CREDITCHEM ELECTRONIC MATERICAL CO LTD (CN)
International Classes:
C01B33/107; B01D11/00; B01D11/04; B01D15/10; B01J20/30; C01B33/00; C01B33/037; C07F7/00; C07F7/21
Attorney, Agent or Firm:
ZHEJIANG KG IP LAW FIRM (CN)
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