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WO/2024/091025A1 |
The present invention relates to a polyimide resin, a negative-type photosensitive resin composition comprising same, and an electronic device comprising an organic insulating film or a photosensitive pattern, formed from the negative-ty...
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WO/2024/091470A1 |
Methods for forming an EUV photoresist hard mask are provided. The method includes treating a metal-rich layer on a substrate with a reductive plasma to form a metallic surface on the metal-rich layer, the metal-rich layer having a top p...
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WO/2024/088904A1 |
A microlithographic projection exposure apparatus comprises a mask holder (20) for holding a mask (18), a substrate holder (26) for holding a substrate (24), and a projection lens (22) having a plurality of optical elements (R1-R4) for i...
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WO/2024/090567A1 |
Provided is a negative photosensitive resin composition comprising: a polyimide (A) represented by formula (1) {in formula (1), A denotes a structure derived from a tetracarboxylic dianhydride, B denotes a structure derived from a diamin...
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WO/2024/089737A1 |
In order to achieve a dichroic mirror having a large area, this synthetic optical element comprises: a plurality of optical elements each provided with a first substrate and a dichroic film; and a second substrate, wherein the plurality ...
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WO/2024/088871A1 |
The invention relates to a projection exposure system (1, 101) for semiconductor lithography, comprising at least one optical element (Mx, 117), wherein at least one actuator (44) for deforming an optical active surface (33) of the optic...
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WO/2024/090460A1 |
Provided are: a resin composition which contains at least one resin selected from the group consisting of cyclized resins and precursors thereof and a compound A represented by formula (A-1) and having a molecular weight of at most 380; ...
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WO/2024/090384A1 |
Provided is a technology by which a chemical can be effectively fixed to the surface of a substrate. A substrate treatment device 1 comprises: an activating device 40 configured so that, in a state where a liquid is supplied to a surfa...
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WO/2024/090126A1 |
The purpose of the present invention is to effectively perform learning in order to determine a parameter value of a neural network and to improve control accuracy in the control of a control target using the neural network. This contr...
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WO/2024/090019A1 |
Provided are: a raw material supply device that can stably supply a plasma source; and a light source device. A raw material supply device according to an aspect of the present invention is a raw material supply device for supplying a ...
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WO/2024/090063A1 |
A drawing device according to one aspect of the present disclosure comprises a light source unit and a scanning unit. The scanning unit irradiates a surface of a recording medium with a plurality of laser beams generated by the light sou...
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WO/2024/090694A1 |
The present invention relates to a method for manufacturing a polymer-based microneedle patch designed to maximize skin penetration performance. The polymer-based microneedle patch of the present disclosure can be manufactured to have en...
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WO/2024/090486A1 |
The present invention provides a photosensitive resin composition which contains (A) a polyimide precursor that has a repeating structure represented by formula (1), and (B) a photoradical initiator. (In formula (1), X1 represents a tetr...
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WO/2024/090264A1 |
The present invention uses a negative-type photosensitive resin composition that includes a bisphenol novolac epoxy resin and a cationic polymerization initiator. The invention is characterized in that the weight-average molecular weight...
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WO/2024/090041A1 |
Provided are a radioactive-ray-sensitive resin composition and a pattern formation method that make it possible to form a resist film that has satisfactory storage stability, and also has excellent sensitivity and LWR performance when ne...
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WO/2024/088727A1 |
A metrology system is described. Active or passive metasurfaces are used to replace (or to augment) an existing objective lens to focus radiation such as light, tune a focal length, and/or correct aberrations in the metrology system. The...
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WO/2024/088666A1 |
Methods, computer programs, and systems are disclosed, with one method including characterizing a depth variation of a predicted result within a feature of a pattern from a lithography simulation. The method evaluates the depth variation...
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WO/2024/090327A1 |
A substrate processing device (1) comprises: a workpiece support (25) configured to be able to support a workpiece (W); and a plurality of light sources (41, 42) that transmit illuminating beams (L1, L2) that include vacuum ultraviolet r...
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WO/2024/087158A1 |
The preset invention belongs to the technical field of lithography, and particularly relates to a high-etching-resistance silicon-containing molecular glass photoresist compound, and a preparation method therefor and the use thereof. The...
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WO/2024/090442A1 |
A hydrostatic gas bearing device according to the present disclosure comprises: a movable member; and a fixed member. A recess is located on a bearing surface of a base of the movable member or the fixed member, and an opening of a gas s...
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WO/2024/087355A1 |
A quantum dot color photosensitive resin composition and a preparation method therefor. The quantum dot color photosensitive resin composition is prepared from the following raw materials in parts by weight: 1-10 parts of a quantum dot m...
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WO/2024/090510A1 |
[Problem] The present invention provides a multilayer body which is capable of efficiently forming an insulating layer that has achieved a good balance between excellent via formability and high dielectric characteristics. [Solution] D...
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WO/2024/088665A1 |
A method for training a prediction model to generate a high-resolution image representing defects on a substrate from a low-resolution image of the substrate. The method includes inputting a first image and a reference image of defects o...
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WO/2024/087679A1 |
A position measurement apparatus, a semiconductor device manufacturing device, a semiconductor device manufacturing method, and a method for measuring the reference position of a movable worktable, which relate to the technical field of ...
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WO/2024/088708A1 |
Disclosed is an illumination configuration module comprising: a polarizing and wavelength separation arrangement operable to separate input broadband illumination into at least first dispersed illumination comprising a first polarization...
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WO/2024/088663A1 |
Disclosed is metrology method comprising: obtaining metrology data relating to a measurement of at least one target, each said at least one target comprising a plurality of features; said metrology data describing a placement error of on...
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WO/2024/082896A1 |
An alkali-soluble resin, a photosensitive resin composition, and a photosensitive cured film. The alkali-soluble resin has a structure represented by general formula (1), wherein Ar1 represents a dianhydride residue; R1 represents H or a...
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WO/2024/083404A1 |
A lithographic apparatus comprising a reflector for reflecting radiation. The reflector comprises a body, a reflective surface arranged on the body, and a channel formed in the body for conveying a fluid. The lithographic apparatus compr...
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WO/2024/085389A1 |
The present invention is provided to increase reliability and a lifespan as a display having vivid colors and high resolution by implementing a colored pattern on an electrode substrate. The present invention provides a method for manufa...
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WO/2024/083437A1 |
Described herein is a method for die-to-die (D2D) image alignment using a defect map associated with an image. The method includes accessing a set of images of a substrate, which correspond to different image capture conditions. The loca...
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WO/2024/085388A1 |
The present invention relates to a display with not only vivid colors but also high resolution by implementing a colored pattern on an electrode substrate, so as to improve reliability and lifespan. The present invention relates to a met...
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WO/2024/083559A1 |
A source selection module comprising an adjustable diffraction element comprising multiple pixels. The source selection module further comprises a light dispersive element configured for receiving a first and a second light. The light di...
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WO/2024/085055A1 |
The purpose of the present invention is to, when a substrate (or substrates) is (are) disposed on a substrate holder for holding the substrate(s), detect the position(s) of the substrate(s) disposed in various forms, in which, for exampl...
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WO/2024/085292A1 |
The present invention relates to a chemically amplified positive photoresist composition for improving a pattern profile and enhancing adhesion, the photoresist composition being exposable by a light source with a wavelength of 248 nm, a...
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WO/2024/086571A1 |
Embodiments of the present disclosure generally relate to lithography systems. More particularly, embodiments of the present disclosure relate to a method, a system, and a software application for a lithography process to control transmi...
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WO/2024/085390A1 |
The purpose of the present invention is to improve the reliability and lifespan of a display having not only vivid colors but also high resolution by implementing a colored pattern on an electrode substrate. The present invention relates...
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WO/2024/084993A1 |
A radiation-sensitive composition comprising a polymer having: a side chain including an acid-dissociable group; and a side chain including one or more radiation-sensitive onium cation structures and two or more iodo groups.
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WO/2024/083470A1 |
A particle transfer system, including: a particle trap apparatus configured to trap a plurality of particles; and a particle conveyance structure configured to convey the particles in parallel from the particle trap apparatus to a substr...
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WO/2024/084040A1 |
The disclosure relates to an aqueous bioink solution for use in light-based bioprinting applications, comprising: (a) 0.5-95 wt % water-soluble prepolymer; (b) 0.001-5 wt % biocompatible metal acylphosphinate photoinitiator; (c) 0.001-10...
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WO/2024/083435A1 |
Described is a method for predicting a parameter of interest of a manufacturing process for manufacturing integrated circuits. The method comprises: obtaining metrology data relating to the parameter of interest; applying a first predict...
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WO/2024/084636A1 |
A photosensitive resin composition contains a polyamic acid ester and a polymerizable monomer, the polyamic acid ester includes a structural unit (A) derived from tetracarboxylic dianhydride and a structural unit (B) derived from a diami...
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WO/2024/085016A1 |
Provided is a substrate treatment method including a step for developing a substrate wherein a negative-type metal-containing resist film is formed and subjected to an exposure treatment and a heat-treatment after the exposure treatment,...
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WO/2024/086042A1 |
Embodiments of the present disclosure relate to a system, a software application, and methods of digital lithography for semiconductor packaging. The method includes comparing positions of vias and via locations, generating position data...
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WO/2024/085030A1 |
The purpose of the present invention is to provide: a method for producing a semiconductor substrate, the method using a composition which is capable of forming a film that has excellent bending resistance and excellent solubility during...
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WO/2024/084615A1 |
Provided is a photoresist that can form a photoresist layer having both developability and polar solvent resistance while having excellent peel removability as a positive photoresist layer. This composition for forming a photoresist comp...
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WO/2024/082657A1 |
A chip preparation method and system, and a chip, which relate to the technical field of micro-nano fabrication. The method comprises: by means of an exposure mode of laser direct writing, preparing a first bottom circuit of an impedance...
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WO/2024/084970A1 |
Provided are: an active-ray-sensitive or radiation-sensitive resin composition capable of forming a pattern having excellent resolution, LWR performance, and pattern shape; and an active-ray-sensitive or radiation-sensitive film, a patte...
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WO/2024/084796A1 |
Provided are a light source device and a raw material supply unit which can inhibit the impact of debris. This light source device uses energy beam (EB) irradiation to convert a liquid raw material (23) into plasma and extract radiatio...
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WO/2024/085293A1 |
The present invention relates to a photoresist composition that can be exposed with a light source having a wavelength of 248 nm, and to a chemically-amplified positive photoresist composition for pattern profile improvement and etch res...
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WO/2024/084965A1 |
Provided is a technique for forming a diffraction grating using a high-refractive-index material. This method for forming a diffraction grating on a substrate having permeability includes: (a) a step for forming, on the substrate, a fi...
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