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WO/2023/187704A1 |
The invention relates to compositions containing chromium. In particular, the composition includes a chromium component, and an adhesive component admixed with the chromium component to form the composition. Furthermore, the invention ex...
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WO/2023/189870A1 |
A sputtering target comprising an oxide sintered body containing indium oxide as the main component, wherein the oxide sintered body has a contained hydrogen concentration of 5×1016 atoms/cm3 or greater, the atomic concentration ratio (...
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WO/2023/190230A1 |
According to an aspect of the present invention, provided is a photocatalyst member comprising a photocatalyst layer formed on a base material via a foundation layer, the photocatalyst member being characterized in that the foundation la...
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WO/2023/189159A1 |
A method for producing a spectacle lens having a substrate and a metal atom-containing layer disposed on the substrate, the method comprising forming the metal atom-containing layer on the substrate by electron beam deposition that radia...
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WO/2023/184634A1 |
The present invention relates to the field of optical thin films, mainly aims at a nodular defect for reducing an optical thin film damage threshold, and particularly relates to a method for improving a thin film laser damage threshold b...
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WO/2023/189535A1 |
Provided is an oxide sintered body containing: cubic MgO with Zn in solid solution; hexagonal ZnO with Mg in solid solution; and ZnGa2O4 with Mg in solid solution.
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WO/2023/186188A1 |
The invention relates to the technical field of rare metal and powder metallurgy, in particular to a molybdenum alloy target material, and a preparation method and application thereof. The target material comprises the following componen...
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WO/2023/190861A1 |
Provided is a vapor deposition mask in which thermal deformation is inhibited. An embodiment of the present invention is a vapor deposition mask 10. The vapor deposition mask 10 is provided with a resin layer 24 having a pattern of openi...
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WO/2023/186295A1 |
A deposition source (100) for depositing material on a substrate is described. The deposition source (100) includes a rotatable cathode (110) connected to a first drive (131). Additionally, the deposition source (100) includes a rotatabl...
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WO/2023/187630A1 |
The present invention relates to a method for manufacturing a vacuum coated paper, said method comprising: a) providing a paper substrate, wherein said paper substrate comprises 0.3-60 kg/ton of a humectant, based on the total dry weight...
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WO/2023/190869A1 |
An aluminum scandium nitride film according to the present invention contains aluminum, scandium and nitrogen, while additionally containing gallium. The crystal phase of this aluminum scandium nitride film may include a hexagonal crysta...
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WO/2023/184667A1 |
The present invention belongs to the technical field of micro-nano electronics. Provided are a tetrahedral structure compound doped Sb-Te phase change material and a phase change memory. The chemical formula of the Sb-Te phase change mat...
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WO/2023/190657A1 |
An electrode (1) comprises, in order in the thickness direction, a substrate film (2), a metal underlayer (3), and an electroconductive carbon layer (4). In the metal underlayer (3), the ratio R of oxygen obtained by the following formul...
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WO/2023/190660A1 |
A method for manufacturing a laminate (1) comprises a step for preparing a metal substrate (2), and a step for using sputtering to form an inorganic insulation layer (3) on one surface (21) of the metal substrate (2) in the thickness dir...
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WO/2023/191875A1 |
A targeted temporal ALD device includes an ALD head that is configured to perform targeted ALD to discrete targeted areas of products/substrates positioned on the mounting surface(s) of the ALD device. The ALD head includes: (i) an outer...
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WO/2023/191174A1 |
A large-area thin film deposition device according to the present invention comprises: a supply roller and a collecting roller for supplying and collecting a substrate in a roll-to-roll type; a sensor array disposed on a path of substrat...
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WO/2023/191835A1 |
Methods and apparatus for processing a substrate are provided herein. For example, a physical vapor deposition processing chamber comprises a chamber body defining a processing volume, a substrate support disposed within the processing v...
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WO/2023/185672A1 |
An anti-fog coating of the specific embodiments of the present disclosure, the coating being formed by the plasma polymerization of a saturated chain monomer, wherein at least two ends of the saturated chain monomer are provided with a h...
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WO/2023/191403A1 |
Disclosed is a method for manufacturing a carbon-based thin film shadow mask, comprising the steps of: a) forming a buffer layer on a substrate; b) depositing a metal layer on the buffer layer, and then patterning same; c) forming an amo...
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WO/2023/191364A1 |
A deposition mask stage, according to one embodiment of the present invention, comprises: a stage frame; a plurality of chucks coupled to the stage frame; and a plurality of support blocks on the rear surface of the stage frame, wherein ...
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WO/2023/191049A1 |
The coated tool according to the present disclosure comprises a base body and a coated layer disposed above the base body. The coated layer includes a plurality of Ta-containing laminated structural bodies and a plurality of Mo-containin...
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WO/2023/191078A1 |
A coated tool according to the present disclosure comprises: a substrate; and a coating layer positioned on the substrate and comprising cubic crystals. An X-ray diffraction spectrum, measured for the coating layer which has been held in...
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WO/2023/191837A1 |
Methods for selectively depositing on metallic surfaces are disclosed. Some embodiments of the disclosure utilize a metal-carbonyl containing precursor to form a self-assembled monolayer (SAM) on metallic surfaces.
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WO/2023/185611A1 |
Provided in the present invention are a chain wheel of a racing motorcycle and a manufacturing method therefor. The chain wheel of a racing motorcycle comprises a chain wheel disc body, wherein an axle hole and wheel teeth are formed on ...
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WO/2023/189834A1 |
Provided is a spattering target (1) comprising an oxide sintered compact including an In element, a Ga element, and an O element. Said sintered compact includes a crystal structure represented by In2O3, the atomic composition ratio of th...
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WO/2023/189014A1 |
Provided is a semiconductor film comprising a solid-phase crystallized product of an indium oxide doped with tin and hydrogen.
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WO/2023/184668A1 |
The present invention relates to the technical field of micro- and nano-electronics, and provides a lattice matching-based compound-doped Ge-Sb-Te phase change material and a phase change memory. The chemical formula of the phase change ...
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WO/2023/179704A1 |
Provided are a copper plating additive composition, a copper plating solution, and a copper brush plating method using the same. The copper plating additive composition includes 1, 4-cyclohexanedione monoethylene acetal, potassium phthal...
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WO/2023/179997A1 |
The invention discloses a shutter system consisting of a shutter for shielding a coating source in a vacuum system, wherein the shutter is configured such that it can be slid in front of the coating source; and a method which is carried ...
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WO/2023/182313A1 |
The present invention pertains to a substrate with β-type gallium oxide nano rods that includes: a substrate having a pair of main surfaces; and a plurality of β-type gallium oxide nano rods which are formed on the substrate. The β-ty...
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WO/2023/182312A1 |
The present invention relates to a substrate with a β-gallium oxide film, said substrate comprising a Si monocrystal substrate and a β-gallium oxide film that is provided on the Si monocrystal substrate, wherein the β-gallium oxide fi...
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WO/2023/182126A1 |
A coated tool in which: a mean thickness At of a lower layer A is 0.3 to 6.0 μm, a mean thickness Bt of an upper layer B is 0.1 to 3.0 μm, and 2.0≤At/Bt≤5.0; the lower layer A comprises alternately stacked layers of an A1α layer h...
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WO/2023/182211A1 |
The present invention provides at least one of: a high gallium nitride sintered body in which an increase in oxygen content caused by reoxidation after sintering is suppressed, as compared to a conventional gallium nitride sintered body ...
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WO/2023/183571A1 |
Process kits for processing chambers and processing chambers having a lower shield and lower shield ring are described. The lower shield has a ring-shaped body with an inner wall and an outer wall, a top wall and a bottom wall with an ou...
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WO/2023/179998A1 |
The invention discloses a method and a device for protecting oxygen-sensitive target materials in a coating source. The problem of specifying a method and arrangement, by means of which reactive, in particular oxygen-sensitive target mat...
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WO/2023/183902A1 |
A method is disclosed for enhancing adhesion of a decorative metal layer to a polymeric primer that is a film on the surface of a substrate produced by a low-temperature cure. Substrates to which the polymeric primer is applied include m...
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WO/2023/181927A1 |
This coated member includes a substrate and a hard coating that is formed on the surface of the substrate and includes a nitride or carbide of a metal element. Of the total amount of metal elements and metalloid elements in the hard coat...
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WO/2023/180417A1 |
The invention relates to a microfluidic receiving element (110) for a microfluidic device (100) for processing fluids. The receiving element (110) has at least one recess (115) for receiving an aqueous solution, wherein the at least one ...
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WO/2023/182837A1 |
Disclosed is a method for manufacturing a fine metal mask, the method comprising the steps of: a) patterning a plated resist on a substrate; b) forming a metal plated layer on the substrate exposed through the patterned plated resist; c)...
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WO/2023/182311A1 |
Provided is a gallium oxide film manufacturing device with which gallium oxide is epitaxially grown to have excellent crystallinity and excellent flatness. A manufacturing device (1000) includes: a reaction chamber (1100); a substrate di...
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WO/2023/178948A1 |
Provided is a continuous ALD coating apparatus, belonging to the technical field of ALD. The continuous ALD coating apparatus includes a box assembly, a vacuum assembly, a driving assembly and a detection assembly, wherein the box assemb...
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WO/2023/174711A1 |
In various embodiments, a method (300) for processing a solar cell precursor (402), having a side coated with at least one dielectric, may comprise atomizing (303) a sputter target (404) into a coating region (401), where the sputter tar...
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WO/2023/174510A1 |
A vacuum deposition system (100, 200, 300) for coating a substrate in an essentially vertical orientation is described. The vacuum deposition system includes a vacuum transfer chamber (120), a first deposition branch (130) extending from...
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WO/2023/176757A1 |
[Problem] To provide a piezoelectric body having excellent hysteresis properties, a laminate structure including the piezoelectric body, an electronic device, an electronic apparatus, and manufacturing methods with which it is possible t...
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WO/2023/176808A1 |
According to the present invention, particles are inhibited from infiltrating a vacuum processing device. To achieve the abovementioned purpose, a vacuum processing device according to one mode of the present invention comprises a vacuum...
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WO/2023/177050A1 |
The objective of the present invention is to provide a hard film-coated cutting tool having excellent welding resistance and wear resistance. To achieve the objective as above, the hard film-coated cutting tool according to the present i...
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WO/2023/176756A1 |
[Problem] To provide a piezoelectric body that has excellent hysteresis properties, a laminated structure including the piezoelectric body, an electronic device, an electronic apparatus, and methods by which the foregoing can be obtained...
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WO/2023/174512A1 |
The invention relates to a source arrangement (10) for a TLE system (100) for providing a source element (12) comprising or consisting of a source material (14) to be evaporated and/or sublimated by a laser beam (112), comprising a suppo...
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WO/2023/174691A1 |
The invention relates to a method for coating a substrate. The method comprises the following steps: A) providing a first metal and a second metal in the form of a wire; B) introducing the wire, C) preparing the starting material that is...
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WO/2023/176758A1 |
[Problem] To provide: a piezoelectric body that has excellent hysteresis characteristics; a laminated structure, an electronic device, and an electronic apparatus that each comprise the piezoelectric body; and production methods which ma...
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