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WO/2024/048304A1 |
A coated tool comprising a base and a rigid coating film formed thereon. The rigid coating film is a nitride or carbonitride which contains Al and Cr in amounts of 70-90 atm.% and 10-30 atm.%, respectively, with respect to the total amou...
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WO/2024/048954A1 |
A mask comprises: a body which has a length extended in a first direction, and in which defined are a plurality of first cell regions arranged in the first direction, each including a plurality of first holes, and a plurality of second c...
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WO/2024/047995A1 |
This semiconductor device comprises: an amorphous substrate having an insulating surface; an orientation pattern located on the amorphous substrate; and a semiconductor pattern including gallium nitride and located on the upper surface o...
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WO/2024/048768A1 |
[Problem] To provide: a laminated structure with excellent bending strength; an element; an electronic device; an electronic apparatus; and a system. [Solution] This laminated structure is constituted of at least a first layer and a seco...
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WO/2024/048764A1 |
[Problem] To provide: a crystal having excellent crystallinity; a layered structure; and an element, an electronic device, an electronic apparatus, and a system that use the crystal and the layered structure. [Solution] This layered stru...
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WO/2024/047216A1 |
The present invention relates to a method for producing a carrying structure (10) for carrying at least one functional unit (20), preferably for an optical device, in a reaction chamber (30), comprising: providing a liquid medium (40) fo...
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WO/2024/049055A1 |
A deposition mask according to an embodiment comprises a metal plate including a deposition region and non-deposition regions. The deposition region includes at least one effective portion, and the at least one effective portion includes...
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WO/2024/048765A1 |
[Problem] The present invention provides: a crystal which has excellent crystallinity; a multilayer structure; and an element, an electronic device, an electronic apparatus and a system, each of which uses the crystal and the multilayer ...
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WO/2024/048766A1 |
[Problem] To provide a crystal having excellent crystallinity, a multilayer structure, and an element, an electronic device, an electronic appliance, and a system which are obtained using these. [Solution] An electroconductive crystal wh...
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WO/2024/041825A1 |
A conductive substrate coated with compact lithium is described, wherein the substrate consists of sheet-like metals or sheet-like carbon-based materials, wherein on at least one side of the substrate a 1 to 5000 nm thick lithiophilic in...
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WO/2024/041388A1 |
A top-down sublimation arrangement (1,100) for an evaporation system and use of it, at least comprising at least one heatable top-down sublimation crucible (10) having at least one sidewall (14), being fillable with evaporation material ...
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WO/2024/042076A1 |
The invention relates to a coating method for depositing a coating system (S) on a substrate (1), wherein at least one HiPIMS layer (HS) and one DCMS layer (DS) are deposited on the substrate (1) by means of magnetron sputtering. In the ...
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WO/2024/043560A1 |
A deposition mask according to an embodiment comprises a metal plate including a deposition area and a non-deposition area, wherein: the deposition area comprises at least one effective portion; the effective portion comprises a pluralit...
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WO/2024/041353A1 |
Disclosed in the present application is a rotary cathode end head, comprising an end head housing, wherein a driving shaft is rotatably mounted in the end head housing by means of a bearing, and one end of the driving shaft penetrates ou...
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WO/2024/039591A1 |
A method for nanoparticle fabrication deposits a seed layer of a transparent conductive oxide onto a substrate and deposits a layer of a plasmonic metal onto the transparent conductive oxide layer. The method forms nanoparticles from the...
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WO/2024/039156A1 |
A razor blade according to an embodiment of the present invention comprises a substrate having a cutting edge formed at the tip thereof, wherein the thickness (T4) of the substrate as measured at a distance of 4μm from the tip has a val...
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WO/2024/038862A1 |
This vapor deposition mask comprises: a first plate member equipped with a first inner surface having a first protruding section on the edge thereof; and a second plate member equipped with a second inner surface having a second protrudi...
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WO/2024/039090A1 |
A deposition mask according to an embodiment comprises: a small surface hole including a metal plate including a deposition area and a non-deposition area, wherein the deposition area includes at least one effective area and a non-effect...
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WO/2024/038674A1 |
Provided is an yttrium-based protective film having excellent plasma resistance and appearance. The yttrium-based protective film provided herein contains an yttrium oxide, has a porosity of less than 0.5 vol% and a Vickers hardness of...
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WO/2024/039527A1 |
A system for depositing material over a sample in a localized region of the sample, the system including: a vacuum chamber; a thermal mass disposed outside the vacuum chamber; a sample support configured to hold a sample within the vacuu...
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WO/2024/039091A1 |
A deposition mask according to an embodiment comprises a metal plate including a deposition region and a non-deposition region, wherein the deposition region includes at least one effective portion. The effective portion comprises a plur...
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WO/2024/031958A1 |
A solar cell production device and a copper seed layer coating process and apparatus. Deposition of a conductive thin film is first completed in a first process chamber (100) to obtain a first base body; then, the first base body is full...
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WO/2024/035664A1 |
A system may include a substrate and a coating deposited onto a surface of the substrate. The coating includes a carbon rich layer deposited on the substrate. The carbon rich layer is also characterized by a first carbon content includin...
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WO/2024/034435A1 |
The present invention increases the usefulness of ECR plasma technology. A film formation device 1 causes ejected first target particles to be deposited by causing ions (ions constituting ECR plasma) to collide with a cylindrical target ...
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WO/2024/034236A1 |
This alignment device comprises: a substrate support means for supporting a substrate; a mask support means for supporting a mask; a distance adjustment means for adjusting a distance between the substrate support means and the mask supp...
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WO/2024/030562A1 |
A system for deposition of evaporated material on a substrate is provided. The substrate has a central axis. The system includes an evaporation vacuum chamber, at least one nozzle assembly, and a shadow mask. The nozzle assembly has a th...
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WO/2024/027361A1 |
The present invention provides a film coating device and method capable of improving deep hole filling. The device comprises a cavity, a target material bearing disc, a magnetic control assembly, a base, and a corrector. The target mater...
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WO/2024/029429A1 |
This laminate structure has an underlying insulating layer, a metal oxide layer disposed on the underlying insulating layer, and an oxide semiconductor layer disposed in contact with the metal oxide layer. The oxide semiconductor layer h...
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WO/2024/027645A1 |
The present invention relates to the technical field of integrated black panel display devices, and provides an anti-reflection film, and a preparation method therefor and an application thereof. The anti-reflection film comprises a subs...
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WO/2024/029221A1 |
This alignment apparatus performs alignment of a substrate and a mask using a substrate mark provided to the substrate and a mask mark provided to the mask. A plurality of detection means detect the substrate mark and the mask mark. A de...
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WO/2024/026939A1 |
A polymer composite material and a preparation method therefor. The polymer composite material comprises a polymer base layer and a metal thin film layer arranged on the surface of the polymer base layer, wherein the material forming the...
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WO/2024/024343A1 |
The present disclosure provides a powder surface film-forming device, which makes it possible to reduce the aggregation of a powder by disintegrating aggregates of the powder at a proper timing during the delivery of the powder when the ...
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WO/2024/025333A1 |
The present specification relates to a load-lock chamber for anti-reflection coating and anti-fingerprint coating, and a coating process system, the chamber accommodating, in the load-lock chamber supplying product trays, coating materia...
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WO/2024/021527A1 |
The present invention belongs to the technical field of aeronautical engine thermal barrier coatings and relates to a lanthanum-gadolinium-samarium-based high-entropy thermal barrier coating material and a preparation method thereof, the...
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WO/2024/022558A1 |
The invention relates to a method for evaporating a cathode by means of an arc evaporation process in a vacuum chamber, in which method an arc is ignited and the speed and motion of the cathode spot of the arc on a predetermined track on...
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WO/2024/024658A1 |
Provided is a metal mask having a perforated region, a surrounding region, and an alignment region. The surrounding region is a region surrounding the perforated region and comprises a non-perforated surface. The alignment region is a re...
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WO/2024/023153A1 |
This disclosure relates to a coated element having a surface, wherein at least a part of the surface of the element is coated by a coating, a system or kit, comprising the coated element, a closed system comprising the coated element, an...
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WO/2024/024584A1 |
The corrosion-resistant member according to the present disclosure is a multilayer body comprising a substrate and a first layer laminated on the substrate. The first layer comprises a rare earth element compound containing a rare earth ...
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WO/2024/024267A1 |
This film formation device includes a vacuum chamber, a substrate support part that supports a substrate, a target support part that supports a target including nitrogen and gallium, a sputtering gas supply unit that supplies a sputterin...
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WO/2024/022579A1 |
An evaporation source (100) for depositing a material on a substrate (10) is described. The evaporation source (100) includes a crucible (110) for evaporating the material. Further, the evaporation source (100) includes a distributer (12...
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WO/2024/024268A1 |
This film formation device comprises: a vacuum chamber; a substrate support part that supports a substrate in the vacuum chamber; a target support part that supports a target which includes gallium and nitrogen in the vacuum chamber; a s...
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WO/2024/024266A1 |
This film thickness measurement device comprises: a light reception unit that is provided to a film forming chamber for performing film formation on a substrate or to a transfer chamber for transferring the substrate to the film forming ...
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WO/2024/022578A1 |
A processing apparatus (100) for processing a flexible substrate (10) is described. The processing apparatus (100) includes a vacuum processing chamber (110) including at least one deposition source (111) for depositing a layer of materi...
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WO/2024/025765A1 |
Methods for selective deposition are described herein. The methods include depositing an oxide on a first portion of a substrate surface selected from the group consisting of a metal surface, a metal nitride surface and a metal silicide ...
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WO/2024/017631A1 |
The present invention relates to a coating plant for coating substrates by cathode sputtering, and to a method for replacing a target in such a coating plant.
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WO/2024/018742A1 |
This vacuum chamber is characterized by comprising: a chamber of which the inside can be decompressed; a reinforcement member 125 provided along the wall surface of the chamber; a fixture tool 127 for attaching the reinforcement member 1...
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WO/2024/016182A1 |
A method for surface modification, comprising the following steps: a) providing a first substrate comprising a metal material; b) forming a colored precursor layer on the first substrate by means of vapor deposition, such that the colore...
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WO/2024/017553A1 |
A method for manufacturing an edge emitting semiconductor laser diode comprising the following steps is provided: - providing an edge emitting semiconductor body (2) configured for generating electromagnetic laser radiation during operat...
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WO/2024/017119A1 |
The present invention discloses a target palladium membrane selection method, a hydrogen-related reaction execution method, and an osmosis diffusion rate determination method and system. The selection method comprises: according to a tar...
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WO/2024/018686A1 |
A film according to the preset invention, which protects a ceramic-based composite material from a high-temperature environment that contains sand and dust, is provided with an upper layer on at least one side that is exposed to the envi...
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