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WO/2023/108313A1 |
Provided in the present invention is a vacuum coating apparatus for improving the film coating uniformity of a workpiece. The vacuum coating apparatus comprises a shell assembly, a vacuumizing mechanism, a clamping mechanism, a pushing m...
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WO/2023/110188A1 |
The invention relates to a device for coating a strip-shaped substrate (2) with a parylene layer within a working chamber (1), comprising a) a take-off roller (3) for unwinding the strip-shaped substrate (2); b) a take-up roller (5) for ...
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WO/2023/112155A1 |
A sputtering apparatus for sputtering a target using a plasma generated by supplying a high frequency power to an antenna, the sputtering apparatus comprising: a dummy electrode provided around the target and being equipotential to the t...
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WO/2023/110185A1 |
The present invention relates to a coating source for a coating installation, to a coating installation having such a coating source, and to a method for coating substrates using such a coating source.
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WO/2023/110105A1 |
A cathode assembly (110) for sputter deposition is provided. The cathode assembly includes a first cathode drive unit (113) configured to rotate a first rotatable cathode (111), a second cathode drive unit (114) adjacent to the first cat...
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WO/2023/106314A1 |
The present disclosure addresses the problem of providing a multilayer body which is capable of maintaining high transmittance, while preventing an increase in the resistivity due to annealing. The present disclosure provides a multilaye...
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WO/2023/102845A1 |
A cascaded material surface active catalytic structure, mainly formed by combining a polymer base material (1) and a negative dielectric material layer (2) provided on the surface of the polymer base material (1). The polymer base materi...
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WO/2023/106473A1 |
The present invention relates to a low-dielectric-constant polymer substrate and a manufacturing method therefor. More particularly, the present invention relates to a low-dielectric-constant polymer substrate and a manufacturing method ...
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WO/2023/107590A1 |
A system method and protective coating for transparent panels, especially beneficial for transparent panels covering digital displays, made by the system and coating. The protective coating includes an adhesion layer formed on a surface ...
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WO/2023/106624A1 |
The present invention relates to a polymer substrate on which nanostructures are formed and a sensor comprising same. More specifically, the present invention relates to: a polymer substrate on which nanostructures are formed, which can ...
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WO/2023/106132A1 |
The purpose of the present disclosure is to provide a heat reflection plate which has good thermal responsiveness and high reflectance, while being suppressed in the possibility of contaminating a furnace, and which has a low heat capaci...
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WO/2023/106357A1 |
Provided are: a film-forming material that is suitable for a plasma etching device member and that contains Y2O3 having high plasma resistance; and a production method therefor. The film-forming material comprises a solid solution cont...
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WO/2023/105894A1 |
Provided is a silicon nitride film forming method with which a silicon nitride film having a relatively strong tensile stress can be formed by reactive sputtering. In this silicone nitride film forming method, a silicon target 3 and a ...
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WO/2023/099757A1 |
The process according to the invention is a process for depositing a coating on a substrate by means of physical vapor deposition methods, comprising a step of depositing said coating on said substrate by the simultaneous use of high-pow...
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WO/2023/100452A1 |
Provided is a vacuum processing device that holds a stage configured so as to be able to offset the phase of a substrate to be treated without causing positional deviation of the substrate. A vacuum processing device SM, according to t...
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WO/2023/100891A1 |
This solid molten mixture contains a first organic compound and a second organic compound, and can be used in vapor deposition. The solid molten mixture satisfies formula (A1) (however, the first organic compound is different from the se...
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WO/2023/098706A1 |
Provided in the present invention are a zinc-doped indium oxide powder, a sputtering target material, and preparation methods therefor, belonging to the technical field of new materials. In the present invention, a precursor powder of a ...
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WO/2023/101862A1 |
According to at least one feature of the present disclosure, a method of forming an optical element, includes: Depositing an aluminum layer atop a glass substrate via a physical deposition process; depositing a first fluorine containing ...
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WO/2023/099045A1 |
The invention relates to an endoprosthesis (30) comprising a cap component (20) and an insert component (10), the sliding surface of the insert component (10) being in sliding contact with the sliding surface of the cap component (20). T...
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WO/2023/099281A1 |
The invention relates to a composite pane (100), at least comprising an outer pane (1), a thermoplastic intermediate layer (3), an inner pane (2), a masking layer (4) which is arranged in a region of the composite pane (100), an adhesive...
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WO/2023/101983A1 |
Implementations disclosed describe a method of obtaining a first image of a sample using a first light, wherein the sample has been subjected to a processing operation associated with a change of a thickness of the sample. The method fur...
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WO/2023/097583A1 |
A doped nickel oxide target material, which comprises a nickel oxide substrate and a doping substance doped in the nickel oxide substrate, wherein the doping substance comprises at least one of compounds containing one or more elements o...
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WO/2023/101544A1 |
A metal electrode patterning method using a metal pattern formation control material, according to one embodiment of the present invention, comprises the steps of: preparing a substrate; printing, on the substrate, a pattern formation co...
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WO/2023/097939A1 |
A ruby (2) plating process for a beauty instrument, and a beauty instrument. The process comprises: a primary processing step: when primary processing is performed on the shape of a ruby (2), processing the ruby (2) into a shape that is ...
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WO/2023/093104A1 |
Disclosed in the present application are a mask and a mask assembly. The mask comprises an evaporation area and a peripheral area, wherein the evaporation area comprises at least one evaporation opening; and the peripheral area comprises...
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WO/2023/095648A1 |
The present invention provides a titanium material for fuel cell separators, the titanium material being used for a fuel cell separator and being capable of decreasing the contact resistance between separators, while being also capable o...
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WO/2023/095102A1 |
Object of the present invention is a transparent composite material having antimicrobial properties in particular antibacterial, antiviral, anti-fungal and anti-protozoal activities, a method for its preparation and use in articles, surf...
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WO/2023/093011A1 |
The present invention discloses a copper alloy thin film, and a protective layer based on the service of the copper alloy thin film and a preparation method therefor. The copper alloy thin film is a binary alloy and comprises Cu and an a...
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WO/2023/095181A1 |
Roll (10) for industrial processes and related apparatus and method for producing it. The roll (10) is provided with a central body (11) on which is disposed, by means of at least one of a PVD, CVD and PECVD technique, a thick-film surfa...
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WO/2023/093089A1 |
Embodiments of the present application provide a mask. The mask is used for depositing a substrate to be deposited; the mask comprises a panel region; the panel region comprises a deposition portion and a non-deposition portion; at least...
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WO/2023/097079A1 |
There is provided markers, systems, and methods for creating and utilizing a marker containing identification information. The embodiments include an identifying marker comprised of high temperature material for tracking a component in a...
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WO/2023/095769A1 |
The purpose of the present disclosure is to provide a reflective photomask blank and a reflective photomask that maximize the effectiveness of a phase shift effect and that possess high transferability (especially resolution). A reflecti...
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WO/2023/096022A1 |
The present invention provides a vanadium oxide thin film as a thermochromic material that does not contain impurities and has high transmittance, wherein the vanadium oxide thin film is formed by using a rapid thermal process (RTP) tech...
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WO/2023/096187A1 |
A method for manufacturing a fine metal mask by using dry etching according to the present invention comprises: a metal film attachment step of attaching a metal film to the top of a glass substrate; a photoresist laminating step of lami...
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WO/2023/095872A1 |
This sputtering device is provided with a cathode unit for emitting sputter particles toward a surface to be treated of a substrate on which a film is to be formed. The cathode unit has a target, a magnet unit, a magnet scanning unit, an...
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WO/2023/087577A1 |
The present invention relates to a nano-cutter coating and a preparation method therefor. The nano-cutter coating of the present invention comprises a cutter base body, and a transition layer, a support layer, an interface layer, and a f...
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WO/2023/089388A1 |
This invention deal with a flaky effect pigment comprising as optical active layer a single platelet consisting of a semiconductor material with a band gap in a range of 0.1 to 2.5 eV and having an average atomic composition of: a) Si(1-...
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WO/2023/091595A1 |
Medium to high entropy alloys and methods for producing the same are disclosed herein. In accordance with a first aspect, provided is a method for producing a medium to high entropy alloy. The method may comprise mixing a feed compositio...
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WO/2023/090275A1 |
The present invention provides a solid lubricant material which has high durability. This solid lubricant material has a material that has a hexagonal crystal structure. The ratio of planes other than the (002) plane to the (002) plane a...
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WO/2023/090249A1 |
In this sputtering target material comprising a sintered body of an oxide containing potassium, sodium, niobium, and oxygen, when the volume resistivity at 25ºC is less than 6.0×1011 Ω·cm, the Vickers hardness is 460 or greater and t...
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WO/2023/091196A1 |
Embodiments of substrate supports for use in substrate processing chambers are provided herein. In some embodiments, a substrate support includes: an upper assembly having a base plate assembly coupled to a lower surface of a cooling pla...
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WO/2023/090835A1 |
A plasma sputtering apparatus is disclosed. The plasma sputtering apparatus comprises: a target having a cylindrical shape and provided to be rotatable; a bar magnet arranged to correspond to the base of an imaginary isosceles triangle i...
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WO/2023/087310A1 |
Provided in the present application are a method for forming a hole transport layer on the surface of a substrate, and a hole transport layer, a solar cell and a preparation method therefor, and a photovoltaic module. The method for form...
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WO/2023/089813A1 |
The following are layered in an alternating manner in this superlattice structure: a first crystal layer (101) in which Ca2Fe2O with a brownmillerite structure serves as a unit lattice; and a second crystal layer (102) in which CaCuO2 wi...
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WO/2023/090957A1 |
The main objective of the present invention is to provide an electron-beam-assisted sputtering device and a method therefor, the device adding, as an electron supply means, an electron beam supply module to a conventional plasma sputteri...
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WO/2023/087205A1 |
Embodiments of the present application relate to the technical field of semiconductors, and provide vapor deposition equipment and a method for depositing a thin film, which can solve the problem that, when depositing a thin film by mean...
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WO/2023/091330A1 |
A composite includes a substrate and a target material, wherein the target material includes indium oxide (In2O3), tin oxide (SnO2), and gallium oxide (Ga2O3), and a method for making the same. The method includes positioning the substra...
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WO/2023/088130A1 |
Provided in the present invention is a semiconductor cavity. The semiconductor cavity comprises a cavity body, and a first shielding member and a liftable base assembly, which are arranged in the cavity body, wherein the first shielding ...
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WO/2023/090777A1 |
The present invention relates to a method for manufacturing a pellicle for extreme ultraviolet lithography. More specifically, the present invention relates to a method for manufacturing a pellicle for extreme ultraviolet lithography, th...
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WO/2023/090620A1 |
The present invention provides a cutting tool having a hard coating capable of satisfying various physical properties such as wear resistance, toughness, oxidation resistance, and heat crack resistance in a well-balanced manner. In order...
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