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WO/2023/120731A1 |
The present invention provides a novel polyelectrolyte membrane and a monomer that has, through a spacer structure, a composite polymer membrane, an ionomer for a solid polymer-type fuel cell, a phosphonate group, and/or a phosphonate es...
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WO/2023/112746A1 |
A resist composition having a solid content concentration of at least 15 mass% contains a polymer compound (A1) having a constituent unit (a10) represented by general formula (a10-1), an onium salt-based acid generator (B1), a crosslinki...
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WO/2023/106364A1 |
A resist underlayer film which is a burned coating film from a composition for resist underlayer film formation, wherein the composition for resist underlayer film formation includes a polymer having a unit structure (A) having a polycyc...
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WO/2023/093598A1 |
The present invention discloses the use of a styrene sulfonium salt polymer containing a repeating unit as shown in the following formula (I) as an acid generator or a photoresist host material. Such a photoresist material has a good sol...
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WO/2023/089982A1 |
The present invention addresses the problem of overcoming issues caused by volatilization of a curing agent during heat curing and issues regarding deterioration in performance of a cured product associated with reduction in the usage am...
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WO/2023/074408A1 |
The purpose of the present invention is to provide: a novel thiophene compound; a method for synthesizing said thiophene compound; and a composition containing said thiophene compound. This composition can be used in coating materials, i...
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WO/2023/068075A1 |
The purpose of the present invention is to provide: a method for producing a semiconductor substrate, the method using a resist underlayer film-forming composition from which it is possible to form a resist underlayer film that has excel...
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WO/2023/063203A1 |
Provided is a resist composition which generates an acid upon exposure to light and for which the solubility in a developing solution changes due to the action of an acid. The resist composition contains a resin component (A1) for which ...
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WO/2023/058781A2 |
The present invention provides a novel naphthalene compound, a synthesis method for said naphthalene compound, and a composition containing said naphthalene compound. This composition can be employed in coating materials, inks, adhesives...
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WO/2023/048163A1 |
The present invention relates to: a multifunctional phenolic compound obtained by carrying out oxidative polymerization of a phenolic compound (A) that is derived from a plant and has a C15-17 unsaturated aliphatic hydrocarbon group, whe...
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WO/2023/032794A1 |
The present invention provides: an actinic ray sensitive or radiation sensitive resin composition containing a compound (C) that generates an acid when being irradiated with an actinic ray or radiation and that is represented by a specif...
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WO/2023/033873A1 |
The present disclosure relates generally to colored dielectric polymer materials, methods of making them and uses thereof, in particular, the application concerns a colored dielectric polymer material comprising a crosslinked polymer and...
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WO/2023/026923A1 |
The present invention provides: a curable resin composition which contains a poly(vinylbenzyl) ether compound and an inorganic filler, and which provides a cured product that has heat resistance, low dielectric loss tangent and high ther...
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WO/2023/023300A1 |
Poly(cyclic vinyl ethers) (PCVEs), compositions of same, methods of making same, and uses of same. In various examples, PCVEs (e.g., homopolymers and/or copolymers) comprise repeat units comprising cyclic vinyl ether (CVE) groups in the ...
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WO/2023/018987A1 |
Compositions and methods for making a composition comprising a plurality of polymeric chelator particles comprising a plurality of cross-linked polyamine polymer backbone chains and one or more chelators covalently coupled thereto, where...
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WO/2023/017728A1 |
The purpose of the present invention is to provide: a method for producing a semiconductor substrate, the method using a resist underlayer film forming composition which is capable of forming a resist underlayer film that has excellent s...
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WO/2023/013592A1 |
A resist composition is adopted that contains a resin component, which has a constituent unit represented by general formula (a0-1), and a compound, which is represented by general formula (d0-1). In general formula (a0-1), R0 is a hydro...
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WO/2023/008346A1 |
Provided is an actinic-ray-sensitive or radiation-sensitive resin composition containing: a resin (P) that has (A) a repeating unit represented by a specific general formula (a) and having a group which breaks down by the action of an ac...
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WO/2023/008176A1 |
This fluorinated arylsulfonate polymer compound comprises repeating units represented by formula (1), and is suitable as a dopant substance for use in organic EL elements and the like. (In the formula, ArF represents a fluorinated arylen...
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WO/2023/286736A1 |
The present invention provides: a pattern formation method with which it is possible to form a pattern that has excellent resolution and excellent uniformity; and a method for producing an electronic device. The pattern formation method ...
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WO/2023/282038A1 |
[Problem] The present invention addresses the problem of providing a method for producing a papermaking sizing agent having an excellent sizing effect and mechanical stability. [Solution] A method for producing a papermaking sizing agent...
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WO/2023/275746A1 |
Continuous mass polymerisation process for the preparation of vinyl aromatic polymers comprising: - continuously feeding at least one vinyl aromatic monomer and at least one radical initiator to a mixing device, obtaining a reaction mixt...
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WO/2023/276538A1 |
The polymer comprising a constituent unit (I) represented by formula (1) is included in a radiation-sensitive composition. R2 in formula (1) is a single bond, a divalent hydrocarbon group, or the like. R3 is a divalent group represented ...
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WO/2022/270477A1 |
Provided are a compound represented by general formula (I), a polymerizable composition containing said compound, and a polymer and a polymer film having a structural component derived from said compound. In formula (I), R1 represents ...
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WO/2022/254012A1 |
A conductive polymer dispersion comprising a polythiophene and a polyanion, characterized in that the polyanion is a homo- or copolymer of amonomer unit according to Formula (I), wherein any of R1 to R5 is selected from the group consist...
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WO/2022/244726A1 |
One aspect of the present invention relates to a resin composition containing a hydrocarbon-based compound (A) represented by formula (1) [in formula (1), X denotes a hydrocarbon group of at least 6C, including at least one selected from...
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WO/2022/242292A1 |
Provided in the present application is a benzocyclobutene monomer, which has structural formula (I), wherein two R1s are separately independently selected from a hydrogen atom, a methyl group, a methoxy group, an ethyl group, and an este...
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WO/2022/234455A1 |
A capped polyindane oligomer of formula (1) : (1) wherein R1, R2, and R3 are each independently hydrogen, halogen, C1-12 hydrocarbyl provided that the hydrocarbyl group is not tertiary hydrocarbyl, C1-12 hydrocarbylthio, C1-12 hydrocarby...
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WO/2022/215455A1 |
Provided is a porous body (1) having, as a base resin, a crosslinked polymer (11) obtained by crosslinking a polymer of an acrylic monomer and/or a styrene monomer. The storage modulus of the porous body (1) at 23°C is 5-2000 kPa. The a...
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WO/2022/209891A1 |
Provided is a polymer containing at least one selected from a repeat unit represented by formula (1) and a repeat unit represented by formula (2).
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WO/2022/202347A1 |
One aspect of the present invention provides a resin composition which contains (A) a polyphenylene ether compound that has at least one of a group represented by formula (1) and a group represented by formula (2) in each molecule, (B) a...
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WO/2022/203081A1 |
The present disclosure provides a photocurable resin composition which has low viscosity and high curability, while providing a cured product that is able to have a high refractive index. A photocurable resin composition according to the...
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WO/2022/202346A1 |
One aspect of the present invention provides a resin composition which contains: at least one of (A) a polyphenylene ether compound that has at least one of a group represented by formula (1) and a group represented by formula (2) in eac...
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WO/2022/202046A1 |
Provided are hollow particles that provide an excellent reduction in the dielectric constant and dielectric loss tangent of a layered material (insulation layer) that contains the hollow particles, that exhibit an excellent strengthening...
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WO/2022/145173A1 |
Provided is an optical film containing a crystalline polymer having a negative intrinsic birefringence, wherein: the refractive index nx1 of the optical film in a direction which is perpendicular to the thickness direction and in which t...
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WO/2022/145169A1 |
The present invention produces an optical film by means of a production method involving, in the order given, a step for preparing a resin film comprising a resin that includes a crystalline polymer having a negative intrinsic birefringe...
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WO/2022/133530A1 |
A composition for capture of acid gas comprising solid porous particles of hypercrosslinked polymer comprising a network of aryl groups linked by methylene (-CH2-) bridging groups formed by Friedel-Crafts catalyzed polymerization or Frie...
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WO/2022/138670A1 |
Provided are a compound, polymer, composition, film-forming composition, pattern formation method, method for forming insulating films, and compound production method, that yield a resist that exhibits excellent exposure sensitivity. T...
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WO/2022/131128A1 |
Provided are hollow rein particles each having a hollow therein and capable of exhibiting excellent heat resistance. Also provided is a method for easily producing such hollow resin particles. Furthermore, a use of such hollow resin part...
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WO/2022/130921A1 |
Provided is a polymerizable compound that can be used in the formation of ultra-fine wiring patterns, due to having superior optical characteristics, etching tolerance, curability, solvent solubility, and similar, as well as superior inf...
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WO/2022/128001A1 |
The invention relates to flame-retarded copolymers and molding materials or molding compounds with covalently bonded sulfur and covalently bonded organic phosphorus compounds having a statistical monomer distribution. The flame-retarded ...
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WO/2022/131127A1 |
Provided are hollow resin particles having a shell part and a hollow portion surrounded by the shell part, the hollow resin particles being capable of achieving dielectric lowering and dielectric loss tangent lowering and realizing excel...
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WO/2022/131095A1 |
Provided are: a radiation-sensitive resin composition which exhibits good sensitivity and can form a resist pattern having high water repellency and few defects; and a resist pattern formation method and a water repellency-improving agen...
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WO/2022/124522A1 |
The present invention relates to a polystyrene sulfonate metal salt, a production method thereof, and a composition including same, and more specifically, to a polystyrene sulfonate metal salt represented by formula 1, a production metho...
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WO/2022/118930A1 |
A first problem of the present invention is to provide a composition having excellent sweat resistance. A second problem of the present invention is to provide a composition for resin coloring and a polymer which have excellent sweat res...
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WO/2022/107624A1 |
Provided are: a poly(vinylbenzyl)ether compound that yields a cured product exhibiting heat resistance, low dielectric loss tangent, and high thermal conductivity; a method for producing said compound; a composition of said compound; and...
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WO/2022/098411A1 |
The present invention generally relates to the field of conformance control in oil fields, particularly to a re-crosslinkable preformed particle gel system, and composition thereof. The composition of the re-crosslinkable preformed parti...
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WO/2022/092076A1 |
The present invention provides a method for producing hollow particles, said method being capable of reducing the residual content of a hydrophobic solvent, while enabling the achievement of hollow particles that have excellent electrica...
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WO/2022/084904A1 |
A new class of multifunctional tracers has been synthesised for use in the oil industry, specifically during waterflooding operations. They are used either in a traditional way (i.e. mapping the connections of oilfield selections) or to ...
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WO/2022/069386A1 |
A membrane comprising an anion exchange layer (AEL) and a cation exchange layer (CEL) wherein the CEL is obtainable by a process comprising curing a curable composition comprising a compound of Formula (I): Formula (I) wherein: X is is o...
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