RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

Title:

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

Document Type and Number:

WIPO Patent Application WO/2023/112746

Kind Code:

A1

Abstract:

A resist composition having a solid content concentration of at least 15 mass% contains a polymer compound (A1) having a constituent unit (a10) represented by general formula (a10-1), an onium salt-based acid generator (B1), a crosslinking agent (C), and a polynuclear phenol low molecular compound (Z) having at most five phenyl groups. In the formula, R represents a hydrogen atom, a C1-C5 alkyl group, or a C1-C5 halogenated alkyl group, Yax1 is a single bond or a divalent linking group, and Wax1 is an aromatic hydrocarbon group which may have a substituent. nax1 is an integer of 1 or greater.

Inventors:

HIRANO TOMOYUKI (JP)
SUNAMICHI TOMONARI (JP)
HASHIMOTO HARUNA (JP)
NAKAGAWA YUSUKE (JP)

Application Number:

PCT/JP2022/044740

Publication Date:

June 22, 2023

Filing Date:

December 05, 2022

Export Citation:

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Assignee:

TOKYO OHKA KOGYO CO LTD (JP)

International Classes:

G03F7/038; C08F12/00; G03F7/004; G03F7/20

Foreign References:

JP2011215597A	2011-10-27
JP2018084683A	2018-05-31
JP2013171101A	2013-09-02
JP2021092779A	2021-06-17

Attorney, Agent or Firm:

TAZAKI Akira et al. (JP)

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