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Title:
METHOD FOR TREATING WASTE RESIDUES FROM GLASS ETCHING
Document Type and Number:
WIPO Patent Application WO/2024/017129
Kind Code:
A1
Abstract:
Disclosed in the present invention is a method for treating waste residues from glass etching. In the method, waste acid is added to a glass etching waste residue dissolution and neutralization reaction system, the temperature of the reaction system is raised by means of waste acid dilution heat and neutralization reaction heat, and the dissolution reaction of waste residues from glass etching is accelerated by means of heating. In the present invention, the dissolution rate of waste residues from glass etching can be obviously increased, and an external heat source is not needed. The method is simple and energy-saving, and can synchronously treat high-concentration waste acid, thereby greatly improving the production efficiency.

Inventors:
WANG YANMING (CN)
ZHANG DONG (CN)
LI WUDONG (CN)
ZOU JINLIN (CN)
Application Number:
PCT/CN2023/107190
Publication Date:
January 25, 2024
Filing Date:
July 13, 2023
Export Citation:
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Assignee:
SHANGHAI MUNICIPAL ENG DESIGN INST GROUP CO LTD (CN)
International Classes:
B09B3/70; B09B3/40; B09B5/00
Foreign References:
CN115283422A2022-11-04
KR101751691B12017-07-12
CN111547885A2020-08-18
CN113816349A2021-12-21
CN106277017A2017-01-04
CN105018732A2015-11-04
KR101982701B12019-05-27
JP2006159129A2006-06-22
Attorney, Agent or Firm:
SHANGHAI BESHINING LAW OFFICE (CN)
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