Title:
SUBSTRATE PROCESSING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2024/062762
Kind Code:
A1
Abstract:
A substrate processing apparatus 1 comprises a transfer block 5, a processing block 7, and a buffer unit 33. The transfer block 5 comprises a bulk transport mechanism HTR for storing a substrate W into a carrier C, and a first attitude transform mechanism 15 for transforming the substrate W into a vertical attitude. The processing block 7 comprises a batch processing region R1, a single processing region R3, a single substrate transport region R2, and a batch substrate transport region R4. The batch processing region R1 is provided with batch processing baths BT1 to BT6, and a second attitude transform mechanism 31 for transforming the substrate W into a horizontal attitude. The single processing region R3 is provided with a single processing chamber SW1, for example. The single substrate transport region R2 is provided with a center robot CR. The batch substrate transport region R4 is provided with a first transport mechanism WTR1. The bulk transport mechanism HTR transports the substrate W to the first attitude transform mechanism 15, and transports the substrate W from the buffer unit 33.
Inventors:
MITSUYOSHI ICHIRO (JP)
Application Number:
PCT/JP2023/027231
Publication Date:
March 28, 2024
Filing Date:
July 25, 2023
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/677; H01L21/304
Foreign References:
| JP2006179757A | 2006-07-06 | |||
| JP2022057884A | 2022-04-11 | |||
| JP2022087065A | 2022-06-09 | |||
| JP2006261548A | 2006-09-28 | |||
| JP2006261546A | 2006-09-28 |
Attorney, Agent or Firm:
SUGITANI Tsutomu (JP)
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