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Patent Searching and Data


Title:
SUBSTRATE PROCESSING APPARATUS AND METHOD FOR DRIVING DOOR ASSEMBLY
Document Type and Number:
WIPO Patent Application WO/2023/003309
Kind Code:
A1
Abstract:
The present invention provides an apparatus for processing a substrate. The apparatus for processing a substrate comprises: a chamber that has a processing space for processing a substrate and an entrance through which a substrate enters and exits; a gas supply unit that supplies a process gas to the processing space; a plasma unit that generates plasma from the process gas; and a door assembly that opens and closes the entrance, wherein the door assembly includes a door that opens and closes the entrance, and a door actuator that moves the door between an open position and a closed position, and the door may include a housing having a passage at one side thereof, wherein an air flow is induced in the passage, and an internal space, a valve that opens or closes the passage, and a valve actuator that moves the valve between an open position and a closed position.

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Inventors:
KANG JUNG HYUN (KR)
Application Number:
PCT/KR2022/010490
Publication Date:
January 26, 2023
Filing Date:
July 19, 2022
Export Citation:
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Assignee:
PSK INC (KR)
International Classes:
H01L21/67; F16K3/02; F16K51/02; H01J37/32
Foreign References:
KR20150116003A2015-10-15
KR101099603B12011-12-29
KR101654619B12016-09-23
US20200166154A12020-05-28
KR20200049739A2020-05-08
Attorney, Agent or Firm:
KWON, Hyuk-Soo et al. (KR)
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