Title:
PRESSURE CONTROL VALVE
Document Type and Number:
WIPO Patent Application WO/2023/171071
Kind Code:
A1
Abstract:
A pressure control valve (1) for opening/closing a circular outlet port (15) that connects a vacuum chamber (2) used in a semiconductor manufacturing apparatus and an exhaust pump (3) for evacuating the vacuum chamber (2), the pressure control valve (1) comprising a valve unit (11) that contacts and separates from a valve seat (12) provided radially outward from the outlet port (15), wherein the valve unit (11) includes: a hollow portion (17) located between an upper surface (11a) of the valve unit (11) on the vacuum chamber (2) side and a lower surface (11b) of the valve unit (11) on the exhaust pump (3) side; a first rubber heater (23) covering a first rear surface (18a) of the upper surface (11a) in the hollow portion (17); and a second rubber heater (24) covering a second rear surface (19a) of the lower surface (11b) in the hollow portion (17).
Inventors:
OGISU TOSHIKAZU (JP)
Application Number:
PCT/JP2022/046060
Publication Date:
September 14, 2023
Filing Date:
December 14, 2022
Export Citation:
Assignee:
CKD CORP (JP)
International Classes:
H01L21/3065; F16K49/00; F16K51/02
Foreign References:
| JP2008202644A | 2008-09-04 | |||
| JP2014090174A | 2014-05-15 | |||
| JP2008186864A | 2008-08-14 | |||
| JP2020077759A | 2020-05-21 |
Attorney, Agent or Firm:
COSMOS INTERNATIONAL PATENT & TRADEMARK OFFICE (JP)
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