Title:
MATERIAL FOR REMOVING IMPURITIES IN ORGANIC SOLVENT, AND METHOD FOR REMOVING IMPURITIES IN ORGANIC SOLVENT
Document Type and Number:
WIPO Patent Application WO/2023/100441
Kind Code:
A1
Abstract:
Provided is a material for removing impurities in an organic solvent having a water content of 1,000 ppm or less, the material comprising a porous ion exchange resin. It is preferred that the porous ion exchange resin has, as an ion exchange group, at least one functional group selected from the group consisting of a primary amino group, a secondary amino group, a tertiary amino group and a quaternary ammonium group. Also provided is a method for removing impurities in an organic solvent, the method comprising bringing the material for removing impurities in an organic solvent into contact with an organic solvent having a water content of 1,000 ppm or less.
Inventors:
KAWAKATSU TAKAHIRO (JP)
FUJIMURA YU (JP)
CHUUMAN TAKAAKI (JP)
FUJIMURA YU (JP)
CHUUMAN TAKAAKI (JP)
Application Number:
PCT/JP2022/034392
Publication Date:
June 08, 2023
Filing Date:
September 14, 2022
Export Citation:
Assignee:
KURITA WATER IND LTD (JP)
International Classes:
B01J39/05; B01J39/07; B01J39/20; B01J41/05; B01J41/07; B01J41/14; B01J47/014
Domestic Patent References:
| WO2019187580A1 | 2019-10-03 |
Foreign References:
| JPS60186522A | 1985-09-24 | |||
| JP2004181352A | 2004-07-02 | |||
| JP2010235653A | 2010-10-21 | |||
| JP2020157249A | 2020-10-01 |
Attorney, Agent or Firm:
SHIGENO, Tsuyoshi et al. (JP)
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