Title:
IMPURITY REMOVAL MATERIAL FOR ORGANIC SOLVENTS AND IMPURITY REMOVAL METHOD FOR ORGANIC SOLVENTS
Document Type and Number:
WIPO Patent Application WO/2023/100442
Kind Code:
A1
Abstract:
According to the present invention, an impurity removal material for organic solvents is a removal material for removing impurities from organic solvents and comprises a polymer material that has a main skeleton that is a skeleton derived from a non-aromatic compound. The polymer material preferably includes, as a charged group, at least one functional group selected from the group that consists of primary amino groups, secondary amino groups, tertiary amino groups, quaternary ammonium groups, and carboxyl groups. According to the present invention, an impurity removal method for organic solvents involves bringing the impurity removal material for organic solvents into contact with an organic solvent.
Inventors:
KAWAKATSU TAKAHIRO (JP)
FUJIMURA YU (JP)
CHUUMAN TAKAAKI (JP)
FUJIMURA YU (JP)
CHUUMAN TAKAAKI (JP)
Application Number:
PCT/JP2022/034393
Publication Date:
June 08, 2023
Filing Date:
September 14, 2022
Export Citation:
Assignee:
KURITA WATER IND LTD (JP)
International Classes:
B01J39/05; B01J20/26; B01J39/07; B01J39/20; B01J41/05; B01J41/07; B01J41/14; B01J47/014
Domestic Patent References:
| WO2019187580A1 | 2019-10-03 |
Foreign References:
| JP2003251118A | 2003-09-09 | |||
| JP2009090259A | 2009-04-30 | |||
| JPS60186522A | 1985-09-24 | |||
| JP2004181352A | 2004-07-02 | |||
| JP2010235653A | 2010-10-21 | |||
| JP2019195763A | 2019-11-14 | |||
| JP2020157249A | 2020-10-01 |
Attorney, Agent or Firm:
SHIGENO, Tsuyoshi et al. (JP)
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