Title:
DUST COLLECTION TOOL, SUBSTRATE PROCESSING DEVICE AND PARTICLE COLLECTION METHOD
Document Type and Number:
WIPO Patent Application WO/2015/159849
Kind Code:
A1
Abstract:
This dust collection tool (1) collects particles contained inside a machine that is used in a semiconductor production process and is to have a substrate for semiconductor production placed therein. The dust collection tool (1) is provided with: a base plate (10) that is transportable by a substrate transport mechanism, provided inside the machine, for transporting a substrate (W) to be processed; a filter unit (4) that is provided on the base plate and collects particles contained in the airflow; and a flow passage for letting the airflow pass through into the filter unit.
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Inventors:
HASHIMA HITOSHI (JP)
Application Number:
PCT/JP2015/061366
Publication Date:
October 22, 2015
Filing Date:
April 13, 2015
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/677; B01D41/04; B01D46/12; B01D46/42; B03C3/011; B03C3/019; B03C3/155; B03C3/28; H01L21/02
Foreign References:
| JP2002329699A | 2002-11-15 | |||
| JP2011040707A | 2011-02-24 | |||
| JP2013140775A | 2013-07-18 | |||
| JPS6219188U | 1987-02-04 |
Attorney, Agent or Firm:
KATSUNUMA Hirohito et al. (JP)
Katsunuma Hirohito (JP)
Katsunuma Hirohito (JP)
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