Title:
CONTROL VALVE, SUBSTRATE TREATMENT DEVICE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/156934
Kind Code:
A1
Abstract:
This control valve comprises: a gate valve having a movable gate valve plate; and a butterfly valve that is provided to the gate valve plate, has a smaller diameter than a valve opening opened/closed by the gate valve plate, and can be fully closed, said control valve being configured so that the gate valve plate of the gate valve and the butterfly valve can be driven independently from each other.
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Inventors:
OHNO MIKIO (JP)
TANIYAMA TOMOSHI (JP)
TANIYAMA TOMOSHI (JP)
Application Number:
PCT/JP2020/004116
Publication Date:
August 12, 2021
Filing Date:
February 04, 2020
Export Citation:
Assignee:
KOKUSAI ELECTRIC CORP (JP)
International Classes:
F16K3/00; F16K1/44; F16K51/02
Domestic Patent References:
| WO2017022366A1 | 2017-02-09 |
Foreign References:
| US20050150559A1 | 2005-07-14 | |||
| JP2001032951A | 2001-02-06 | |||
| JP2016176544A | 2016-10-06 |
Attorney, Agent or Firm:
TAIYO, NAKAJIMA & KATO (JP)
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