COMPOSITE POLISHING PAD INCLUDING HIGHLY ABRASION-RESISTANT THIN FILM COATING BOUND WITH CARBON NANOTUBES, AND METHOD FOR PRODUCING SAME

Title:

COMPOSITE POLISHING PAD INCLUDING HIGHLY ABRASION-RESISTANT THIN FILM COATING BOUND WITH CARBON NANOTUBES, AND METHOD FOR PRODUCING SAME

Document Type and Number:

WIPO Patent Application WO/2023/085470

Kind Code:

A1

Abstract:

The present invention provides a composite polishing pad for CMP, and a method for producing same. The composite polishing pad for CMP comprises: a soft polymer substrate layer including a plurality of protrusions formed on the upper surface thereof; a carbon nanotube layer including carbon nanotubes embedded in and bound to the upper portion of the substrate layer; and a hard polymer coating layer in which carbon nanotubes protruding outwardly are embedded in and bound to the upper portion of the carbon nanotube layer.

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Inventors:

MIN BYUNG JU (KR)
HONG SEOK JI (KR)
KIM SEUNG GEUN (KR)
CHOI JUNG HEE (KR)
KANG MIN WOO (KR)
OH NAM GUE (KR)
KIM SAN HA (KR)
JEONG JI HUN (KR)
RYU HYUN JUN (KR)
KANG SUK KYUNG (KR)
KIM SEONG JAE (KR)

Application Number:

PCT/KR2021/016560

Publication Date:

May 19, 2023

Filing Date:

November 12, 2021

Export Citation:

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Assignee:

KPX CHEMICAL CO LTD (KR)
KOREA ADVANCED INST SCI & TECH (KR)

International Classes:

B24B37/24; B24B37/22; B24D11/00; C08J7/04

Foreign References:

KR20210130629A	2021-11-01
JP2019178223A	2019-10-17
JP2009190155A	2009-08-27
KR20180066126A	2018-06-18
KR20150044238A	2015-04-24
KR20210002429A	2021-01-08

Other References:

RYU HYUN JUN, KIM DONG GEUN, KANG SUKKYUNG, JEONG JI-HUN, KIM SANHA: "Mechanical Abrasion by Bi-layered Pad Micro-Asperity in Chemical Mechanical Polishing", CIRP ANNALS., ELSEVIER BV, NL, CH, FR, vol. 70, no. 1, 1 January 2021 (2021-01-01), NL, CH, FR , pages 273 - 276, XP093065327, ISSN: 0007-8506, DOI: 10.1016/j.cirp.2021.04.012

Attorney, Agent or Firm:

KIM, Sung Ho (KR)

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