Title:
COLLOIDAL SILICA AND PRODUCTION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2023/219004
Kind Code:
A1
Abstract:
The present invention provides colloidal silica in which fine particles are reduced and a production method therefor. Provided is colloidal silica wherein the number distribution ratio of fine particles having a particle diameter such that the median value of particle diameter is not more than 50% on the basis of an equivalent circle diameter (Heywood diameter) found by image analysis using an electron microscope is not more than 1%. Also provided is a method for producing said colloidal silica in which a readily hydrolyzable organosilicate is supplied to a reaction liquid containing a hydrolysis catalyst comprising an organic amine or a mixture of two or more organic amines and then a reaction is performed, wherein the supply is carried out in a state where a supply port for the readily hydrolyzable organosilicate is immersed below the liquid level of the reaction liquid.
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Inventors:
OHYAMA RYUICHI (JP)
YASHIRO AKIHITO (JP)
NISHIMORI TSUKASA (JP)
MIZUTA KOTARO (JP)
AYABE TAKANARI (JP)
YASHIRO AKIHITO (JP)
NISHIMORI TSUKASA (JP)
MIZUTA KOTARO (JP)
AYABE TAKANARI (JP)
Application Number:
PCT/JP2023/016818
Publication Date:
November 16, 2023
Filing Date:
April 28, 2023
Export Citation:
Assignee:
TAMA CHEMICALS CO LTD (JP)
International Classes:
C01B33/141; B24B37/00; C09K3/14; H01L21/304
Foreign References:
| JP2007153732A | 2007-06-21 | |||
| JP2004016956A | 2004-01-22 | |||
| JP2004267991A | 2004-09-30 | |||
| JP2003221222A | 2003-08-05 | |||
| JP2004196915A | 2004-07-15 | |||
| JP2009286645A | 2009-12-10 | |||
| JP2017507876A | 2017-03-23 |
Attorney, Agent or Firm:
SASAKI Kazuya et al. (JP)
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