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JP4540327B2 |
In an exposure step, a combination of a first photomask and a second mask is used. The first mask has a real pattern corresponding to the pattern actually formed on the film to be processed, and a dummy pattern added for controlling patt...
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JP4535243B2 |
A light shielding film, a halftone film, an etching stopper film and a transparent substrate are dry etched to form a hole penetrating the films and extending in the substrate through a main surface thereof to a prescribed depth. The etc...
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JP4536713B2 |
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JP4521144B2 |
A CsX:Eu phosphor produced by heating a cesium halide with a Europium compound containing one or more halides selected from the group consisting of F, Cl, Br and I. Preferably the Europium compound is selected from the group consisting o...
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JP4522412B2 |
A positive-working photosensitive composition containing one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hyd...
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JP4516963B2 |
A negative resist composition is disclosed, wherein the resist composition includes a polymer having at least one fluorosulfonamide monomer unit having one of the following two formulae: wherein: M is a polymerizable backbone moiety; Z i...
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JP4512395B2 |
An exposure process monitoring method capable of performing quantitative monitoring of an exposure amount and a focusing position which are major process parameters during exposure using a Levinson phase shift mask in semiconductor litho...
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JP4512535B2 |
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JP4488521B2 |
The present invention provides systems and methods for improved lithographic printing with polarized light. In embodiments of the present invention, polarized light (radially or tangentially polarized) is used to illuminate a phase-shift...
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JP4470330B2 |
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JP4469657B2 |
A dummy capacitor drive potential VDC is given to one electrode of a dummy capacitor, and a reference potential for determining a data value of a memory cell is generated in the other electrode thereof. A potential generator circuit for ...
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JP4461975B2 |
A method of forming an image using a photothermographic material containing a support having thereon an image forming layer which contains an organic silver salt, silver halide grains, a binder and a reducing agent, the method including ...
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JP4457772B2 |
A silver salt photothermographic dry imaging material including a support provided thereon a light-sensitive layer containing an organic silver salt, light-sensitive silver halide particles and a reducing agent, wherein the dry imaging m...
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JP4458322B2 |
An exposure apparatus for exposing a substrate in a vacuum atmosphere includes vibration absorbing mounts that are disposed in a vacuum chamber in order to make it possible to support at least one exposure structure in the vacuum atmosph...
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JP4442120B2 |
A liquid composition containing at least water, a photopolymerization initiator, a water-soluble organic solvent and a polymerizable compound that can cause a polymerization reaction due to the photo polymerizing initiator, wherein the p...
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JP2010066315A |
To provide an inexpensive rewritable paper which can be repeatedly used many times and in which fixability and color developing property of a photochromic material are good.The rewritable paper is surface-coated with the inorganic photoc...
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JP4440689B2 |
(Problem) It is to provide a stripper having excellent ability to suppress corrosion or damage to the copper wiring or the low-k film, and having excellent photoresist residue removability after ashing. (Solution) The invention provides ...
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JP4439956B2 |
After the resist stripping liquid is supplied to the surface of the substrate which is being rotated at a first rotational speed, the rotational speed of the substrate is reduced from the first rotational speed to a second rotational spe...
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JP4433918B2 |
A method of forming an image comprising the steps of: (a) exposing a photothermographic material comprising a support having thereon an image forming layer comprising organic silver salt grains, silver halide grains, a reducing agent, a ...
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JP4435543B2 |
A radiographic imaging assembly comprises a radiographic silver halide film having a film speed of at least 100 and a single fluorescent intensifying screen that has a screen speed of at least 200. This imaging assembly is particularly u...
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JP4417218B2 |
A method and system are provided of using a patterning device. An exemplary method includes defining a first region on a surface, the first region being associated with a first element of the patterning device, defining a second region o...
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JP4414733B2 |
A method for evaluating planographic printing plates according to the present invention includes: a step (A) of exposing a planographic printing plate precursor by irradiating a thin-line image of a one-pixel line and at least one thin-l...
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JP4411915B2 |
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JP4412300B2 |
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JP4411394B2 |
The present invention relates to a multi-layer body which is a paper document with a hot stamping film embossed thereon. The hot stamping film has a laser-sensitive layer in which a laser-induced color image is produced by laser treatmen...
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JP4409362B2 |
A reticle manufacturing method comprises a step of retreating side surfaces of a lift-off pattern to reduce an area of a wide pattern portion, a step of forming a wide convex pattern and a narrow convex pattern by etching a glass substra...
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JP4404697B2 |
The invention provides a photothermographic material having, on both sides of a support, an image forming layer including at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, ...
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JP4403644B2 |
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JP2010501893A |
Incorporating a combination of phenolic reducing agents provides thermally developable materials with improved silver efficiency and hot-dark print stability without loss in other sensitometric properties. Both photothermographic and the...
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JP4400139B2 |
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JP4401244B2 |
Provided are a photothermographic material which includes, on at least one side of a support, an image forming layer containing at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a bi...
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JP4400531B2 |
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JP4387776B2 |
Thermally developable materials that comprise a support have at least two backside layers. One of these layers can be a protective layer comprising a film-forming polymer. The materials also includes a non-imaging backside conductive lay...
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JP2009294431A |
To provide a silver salt heat developable photosensitive material having low fogging and high sensitivity and excellent in light resistance and silver tone of an image, a method for producing an organic solvent dispersion of a photosensi...
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JP4379175B2 |
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JP4377650B2 |
A sensitometry control (12) is formed on each range (21-24) of film (10), by exposing ranges with energies modulated using spatial modulation profile. The sensitometry curve portions are formed in regions corresponding to same value of p...
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JP4376807B2 |
A method and apparatus for correcting overlay errors in a lithography system. During lithographic exposure, features being exposed on the wafer need to overlay existing features on the wafer. Overlay is a critical performance parameter o...
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JP4372576B2 |
An exposure mask which is capable of reducing non-uniformity in a display such as a liquid crystal display device. A first mask pattern having pattern-forming portions and shield portions mosaically arranged therein is formed in one end ...
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JP4371891B2 |
A method for evaluating a pattern formation process includes applying a photoresist on a substrate, transferring a first pattern and a second pattern adjacent to or at least partly overlapped with each other to the photoresist, wherein t...
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JP4368622B2 |
To provide an optical memory element in which recorded information is not lost even by irradiation with record readout light, with respect to a photon mode optical memory element using a photochromic compound as a recording material. The...
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JP4369203B2 |
There is disclosed an anti-reflection film material used in lithography containing at least a polymer compound having repeating units for copolymerization represented by the following general formula (1), or those containing a polymer co...
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JP4359467B2 |
Provided are sulfonyldiazomethane compounds and photoacid generators suited for resist materials which generate less foreign matters after application, development and peeling, and in particular, are excellent in the pattern profile afte...
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JP4358612B2 |
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JP4356455B2 |
A mask capable of alignment by the TTR system and complementary division and having a high strength, a method of production of the same, and a method of production of a semiconductor device having a high pattern accuracy are provided. A ...
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JP4357803B2 |
A phase mask comprises a transparent substrate having one surface provided with a pattern of a plurality of grooves. A diffraction grating is formed in an object for an optical medium, including a photosensitive part by exposing the obje...
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JP2009244806A |
To provide a versatile heat developable photosensitive material which is usable in common by various different thermal developing devices, and to provide an image forming method using the same.The heat developable photosensitive material...
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JP2009245748A |
To provide a method of manufacturing a conductive material for stably manufacturing a uniform conductive material with high surface resistivity.In the method of manufacturing the conductive material for manufacturing a conductive materia...
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JP4346467B2 |
The invention teaches how to image and etch very narrow and isolated features without resorting to expensive OPC measures. Assist features are placed close to the main feature so that the local pattern density becomes semi-dense or dense...
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JP4349104B2 |
A substrate is subjected to holographic exposure to a sinusoidal or half-sinusoidal resist pattern corresponding to grating groove thereon. Thereafter, the substrate and the resist pattern are subjected to a first etching step at which t...
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JP4350315B2 |
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