Title:
回折格子形成用の位相マスクとその製造方法、および回折格子の形成用方法
Document Type and Number:
Japanese Patent JP4357803
Kind Code:
B2
Abstract:
A phase mask comprises a transparent substrate having one surface provided with a pattern of a plurality of grooves. A diffraction grating is formed in an object for an optical medium, including a photosensitive part by exposing the object to UV light containing diffracted light rays to cause the refractive index of the photosensitive part of the object to change by interference fringes produced by interference of diffracted light rays of different orders of diffraction. The pattern of the grooves has a duty ratio adjusted according to the positions of the grooves so that apodization exposure can be achieved when the object is exposed to the UV light through the phase mask.
Inventors:
Masaaki Kurihara
Nobuto Climbing
Nobuto Climbing
Application Number:
JP2002200558A
Publication Date:
November 04, 2009
Filing Date:
July 09, 2002
Export Citation:
Assignee:
Dai Nippon Printing Co.,Ltd.
International Classes:
G02B5/18; G02B6/02; G02B6/10; G03C5/00; G03F1/26; G03F1/68; G03F7/20; G03F9/00
Domestic Patent References:
| JP2001242313A | ||||
| JP2000089014A | ||||
| JP11223714A |
Foreign References:
| WO1998036297A1 | ||||
| WO2000049437A1 |
Attorney, Agent or Firm:
Satoshi Kanayama