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Title:
SUBSTRATE PROCESSING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2024/085489
Kind Code:
A1
Abstract:
A substrate processing apparatus according to an embodiment of the present invention comprises: a chamber provided with a side wall; a susceptor which is provided with an inclined side surface and on which a substrate is mounted in the chamber; an upper dome covering the upper surface of the chamber and formed of a dielectric material; a lower dome covering the lower surface of the chamber and formed of a dielectric material; and a liner disposed inside the chamber and disposed between the upper dome and the lower dome. The liner comprises an inclined portion provided with an inclined inner surface facing the inclined side surface of the susceptor.

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Inventors:
KIM DO HYUNG (KR)
Application Number:
PCT/KR2023/014609
Publication Date:
April 25, 2024
Filing Date:
September 25, 2023
Export Citation:
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Assignee:
JUSUNG ENG CO LTD (KR)
International Classes:
C30B25/12; C30B25/08; C30B25/10; H01L21/687
Foreign References:
KR20220048921A2022-04-20
KR20020003011A2002-01-10
KR20100049024A2010-05-11
KR20160016477A2016-02-15
US20220325400A12022-10-13
Attorney, Agent or Firm:
NURY PATENT LAW FIRM (KR)
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